Japan Aviation Electronics Industry, Limited

Mitsubishi Electric Corporation

Konica Minolta, Inc.

Kabushiki Kaisha Toshiba

Hitachi High-tech Corporation

Nippon Paper Industries Co., Ltd.

Tokai Carbon Company, Ltd.

Takuya Takahashi

Kazuhiro Yamamoto

Toshiyuki Taniguchi

Minoru Ohara

Shinya Obara

Satoshi Uchino

Yoshitaka Otsubo

Junya Ueda

Ryuzo Shimeno

Futoshi Kadonome

Ikuko Sakurada

Osamu Hashiguchi

Takayuki Nishimura

Atsushi Kobayashi

Hiroshi Akimoto

Toshiro Kobuchi

Masashi Fukaya

Seiya Takahashi

Yoshiaki Ishiyama

Noriyuki Kimpara

Takeshi Takahashi

Hiroshi Endo

Akihiro Kasahara

Akiko Saito

Tadahiko Kobayashi

Tetsuya Komoto

Katsumi Hisano

Akihiro Koga

Koji Shibata

Yasutaka Shimizu

Yasuaki Yoshida

Hideo Iwasaki

Eiichiro Takada

Takeo Suzuki

Mituharu Tabata

Akira Kuwahara

Mitsuo Koguchi

Masaomi Miyazawa

Yusuke Sugiyama

Takashi Ino

Tetsuo Takahashi

Atsushi Narazaki

Hitoshi Tokieda

Kazuomi Sato

Yoshiaki Ichimura

Hideyuki Tsuji

Takumi Ito

Shinji Azuma

Yuki Akiyama

Tetsuo Yamashita

Tomohiro Hieda

Toshihiro Kume

Tadaharu Hashiguchi

Kengo Kurisu

Narihiro Iio

Syunji Sekiguchi

Narihiro Ilo

Connector

A connector includes a housing extending in a predetermined direction intersecting the fitting direction, a plurality of contacts held by the housing and arrayed along the predetermined direction, and a reinforcing member held at an end portion of the housing in the predetermined direction and made of a metal material, the reinforcing member having a first member and a second member, the first member including a first reinforcing portion extending in a U-shape along the end portion of the housing when viewed in the fitting direction, and a connecting portion connected to the first reinforcing portion and electrically connected to a counter reinforcing member of the counter connector, the second member being formed as a separate component from the first member and including a second reinforcing member extending in a U-shape along the first reinforcing portion when viewed in the fitting direction.

Connector with a reinforcing member

A carbon black is disclosed which can exert excellent abrasion resistance while suppressing heat generation when incorporated into a rubber composition. A carbon black in which the total number of active sites represented by a product of a full width at half maximum of a Raman scattering peak appearing in a range of 1340 to 1360 cmwhen an excitation wavelength is 532 nm and a specific surface area when nitrogen gas is adsorbed is 3.60×10to 8.20×10(cm·m/g), and when a nuclear magnetic resonance signal of a spin-spin relaxation process observed by a solid echo method is represented by a sum of a first signal and a second signal having a time constant larger than that of the first signal, an amount of hydrogen represented by a signal intensity per unit mass at time 0 of the first signal is 50.0 to 250.0 (/g).

Carbon black, method for producing carbon black, and rubber composition

The present invention provides a hard coat film having excellent adhesion to a hard coat layer when a cycloolefin polymer film is used as a base material. The hard coat film of the present invention comprises a hard coat layer containing an ionizing radiation curable resin laminated on at least one surface of a cycloolefin polymer base film through a primer layer. This primer layer contains a modified polyolefin resin in which a polyolefin resin is graft-modified with an α,β-unsaturated carboxylic acid or a derivative thereof, and a (meth)acrylic acid ester. In this modified polyolefin resin, the graft weight of the α,β-unsaturated carboxylic acid or derivative thereof is 0.4 to 7 wt. % when the amount of the modified polyolefin resin is taken as 100 wt. %.

Hard coat film and method for producing same

A hard coat film having excellent adhesion (particularly adhesion over time) to a hard coat layer when a cycloolefin polymer film is used as a base material. The hard coat film comprises a hard coat layer containing an ionizing radiation curable resin laminated on at least one surface of a cycloolefin polymer base film via a primer layer. The primer layer has an arithmetic average surface roughness (Ra) in the range of 0.5 nm to 15.0 nm, and a surface of the primer layer has a static friction coefficient in the range of 0.6 to 2.0.

A semiconductor apparatus includes: an insulating substrate including a circuit pattern; a semiconductor device mounted on the insulating substrate and electrically connected to the circuit pattern; a case storing the insulating substrate and the semiconductor device; and an electrode attached to the case, wherein a tip surface of the electrode is jointed to the circuit pattern with solder, the electrode is brought into contact with and pushed against the circuit pattern by the case, and a projection is provided on the tip surface.

Semiconductor apparatus and manufacturing method of semiconductor apparatus

A cleaning water flow velocity during nozzle cleaning is momentarily changed by using a pressure changing mechanism, for example, a syringe. That is, after the start of cleaning, a solenoid valve is opened, and an aspirating operation of the syringe is momentarily performed by a fixed amount in a state where a flow of cleaning water in a nozzle is developed, whereby a nozzle flow velocity is momentarily decelerated. Immediately thereafter, the syringe is pushed back to a home position again, and the flow velocity in the nozzle is accelerated again. A cleaning effect can be improved by performing transition of velocity distribution to various states. Flow velocity control by the pressure changing mechanism can be realized without inhibiting a dispensing cycle, and the cleaning effect of the nozzle can be improved without changing the pressure of a liquid feeding pump or extending the cleaning time.

Automatic analyzer

An automatic analyzer controls a sequence including optical measurement and cleaning and includes a discharge mechanism including a discharge nozzle for discharging a liquid into a reaction vessel; and an overflow suction mechanism including an overflow suction nozzle for sucking an overflow amount of the liquid in the reaction vessel. In a liquid discharge step included in a cleaning process and interposed between a preceding step using a detergent and a succeeding blank value measurement step, the automatic analyzer establishes a first state where a lower end of the discharge nozzle is located in a height-wise lower part of the reaction vessel and a lower end of the overflow suction nozzle is located in an upper part of the reaction vessel, and provides control to carry out the discharge of liquid from the discharge nozzle and the suction of the overflow amount of liquid through the overflow suction nozzle.

Automatic analyzer and automatic analysis method

An automatic analyzer capable of controlling an interval between the tip of a sample nozzle and the bottom of a reaction container regardless of individual differences between reaction containers and sample nozzles and suppressing adhesion of a sample to the sample nozzle is disclosed. Sample nozzlesandare moved toward the bottom surface of a reaction container, the movement of the sample nozzles is stopped at a point in time when a stop position detectordetects a stop position detection plate, the sample nozzles are ascended from the stop position to a position where the stop position detection plateseparates from a detection range of the stop position detector, and an armis moved upward by a moving distance stored in a memory.

To provide a two-component developer for electrostatic charge image development, the two-component developer enabling a high image quality to be kept and enabling the occurrence of fogging to be suppressed even in continuous printing of an image high in coverage rate. The two-component developer for electrostatic charge image development includes a toner particle including a toner base particle and an external additive disposed on the surface of the toner base particle, and a carrier particle including a core material particle and a covering section disposed on the surface of the core material particle, wherein the external additive includes an alumina particle, and the percentage of exposed area of the core material particle is 4.0% or more and 15.0% or less.

Two-component developer for electrostatic charge image development

Provided is an electrostatic latent image developing toner including toner mother particles having an external additive on a surface of the toner mother particles, wherein the external additive contains inorganic particles and aliphatic acid metal salt particles; the inorganic particles have a number average particle diameter in the range of 10 to 50 nm, and have a Mohs hardness of 8 or more; and the aliphatic acid metal salt particles have a number average particle diameter in the range of 0.4 to 2.0 &#x3bc;m.

Electrostatic latent image developing toner and image forming method

Provided is an electrostatic image developing toner containing toner mother particles having external additives on a surface of the mother particle, wherein the external additives contains calcium titanate particles having an average primary particle size in the range of 50 to 150 nm, and alumina particles; and an average primary particle size of the alumina particles is less than the average primary particle size of the calcium titanate particles.

Electrostatic image developing toner and image forming method

The disclosure concerns an electrostatic latent image developer including: a toner having toner base particles and an external additive; and a carrier, wherein the external additive contains silicone oil-treated silica and titanium oxide, Net intensity of titanium (Ti) in the toner to be measured by X-ray fluorescence analysis is 0.5 to 5 kcps, the carrier has a resin coating layer coating core material particles, and the resin coating layer has a constituent unit formed from an alicyclic (meth)acrylic acid ester.

Electrostatic latent image developer and method for producing electrostatic latent image developer

Provided is a technique of reducing detachment of a sealing resin in a semiconductor device, thereby achieving an increased improvement in lifetime of the semiconductor device. The semiconductor device includes the following: an insulating substrate; a metal block disposed on the upper surface of the insulating substrate; a semiconductor element mounted on the upper surface of the metal block; a case enclosing the semiconductor element, the metal block, and the insulating substrate; and a sealing resin sealing the semiconductor element and the metal block. The metal block includes at least one groove on a surface of the metal block, the surface being in contact with the sealing resin. The opening of the at least one groove has a width narrower than a width of the bottom surface of the at least one groove.

Semiconductor device

Growing community of inventors

Tokyo, Japan

Takuya Takahashi