Ube Industries, Inc.

Takuya Oka

Yukinori Kohama

Yoshiyuki Watanabe

Nobuharu Hisano

Kenji Hirotsu

Ryoichi Takasawa

Keiji Iwamoto

Miharu Nakagawa

A polyimide precursor including at least one repeating unit represented by the following chemical formula (1): 

Polyimide precursor and polyimide

A polyimide precursor comprising a repeating unit represented by the following chemical formula (1):   

Polyimide precursor, polyimide, varnish, polyimide film, and substrate

A polyimide precursor comprising at least one repeating unit represented by the following chemical formula (5): in which Ais a divalent group of an aromatic diamine or an aliphatic diamine, from which amino groups have been removed; and Xand Yare each independently hydrogen, an alkyl group having 1 to 6 carbon atoms, or an alkylsilyl group having 3 to 9 carbon atoms, and/or at least one repeating unit represented by the following chemical formula (6): in which Ais a divalent group of an aromatic diamine or an aliphatic diamine, from which amino groups have been removed; and Xand Yare each independently hydrogen, an alkyl group having 1 to 6 carbon atoms, or an alkylsilyl group having 3 to 9 carbon atoms.

Polyimide precursor, polyimide, polyimide film, varnish, and substrate

The present invention relates to a polyimide precursor comprising a repeating unit represented by the following chemical formula (1): wherein A is a tetravalent group having at least one aliphatic six membered ring and no aromatic ring in the chemical structure, and B is a divalent group having at least one amide bond and an aromatic ring in the chemical structure; or A is an aliphatic tetravalent group and B is a divalent group having at least one chemical structure represented by the following chemical formula (2) in the chemical structure: and Xand Xare each independently hydrogen, a Calkyl group or a Calkylsilyl group.

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Ube, Japan

Takuya Oka