Japan Display Inc.

Asahi Glass Company, Limited

Takuya Nakagawa

Kazuto Tsuruoka

Norio Oku

Masaaki Takata

Kei Iwata

Ryusuke Morita

Shoichiro Sakai

A display device including a first substrate including a display part arranged with a plurality of pixels and a terminal part arranged in an outside of the display part, the display part and the terminal part being on a first surface of the substrate, a second substrate facing the first surface, a first sealing layer arranged between the first substrate and the second substrate, and a buffer layer adjacent to the first sealing layer. A part of an end part of the first sealing layer is arranged between the display part and the terminal part, the part of the end part and an upper surface of the first sealing layer form a first step part, the buffer layer is located at the first step part and has a thickness which decreases as a distance from the first step increases.

Display device having buffer layer

A method of manufacturing a display device according to an embodiment of the present invention includes in order: forming a sacrificial layer in a predetermined position on a substrate; forming a base material containing resin on the substrate with the sacrificial layer therebetween; forming a display region including a plurality of pixels on the base material; irradiating the substrate with laser light from a side of the substrate on which the base material is not formed; and peeling the substrate from the base material. A region where the base material and the substrate are in contact with each other is present at least a part of an edge portion of the base material.

Display device and method of manufacturing display device

Provided is a display device and a manufacturing method of the same. The display device includes: a base substrate having a top surface and a side surface, a display region over the top surface, a terminal over the top surface and between the display region and the side surface, the terminal being electrically connected to the display region, and an anisotropic conductive film over the terminal. An edge portion of the anisotropic conductive film is spaced from the side surface, and its distance is equal to or larger than 10 &#x3bc;m and equal to or smaller than 1 mm.

Manufacturing method of a display device comprising a groove formed outside a terminal

A manufacturing substrate, on which a lamination is formed, is disposed on a first substrate. The lamination includes a first sheet substrate having flexibility and adhered to the first substrate, an organic layer that emits light such that brightness is controlled in each of a plurality of pixels forming an image in a display area, and a sealing layer. A light blocking area that does not overlap the display area in a plan view is formed on the first substrate, and after the first substrate is irradiated with light on a side that opposite to the sheet substrate, the first substrate is delaminated from the first sheet substrate.

Display device and manufacturing method of display device

A manufacturing method of a display device includes locating a base member on a support substrate; and removing a part of the support substrate by preventing a first surface portion having a predetermined region in a border plane between the support substrate and the base member from being irradiated with laser light through the support substrate, whereas irradiating a second surface portion, other than the predetermined region, in the border plane between the support substrate and the base member with the laser light through the support substrate.

Manufacturing method of display device, and display device

A display device includes a flexible insulating substrate, an insulating layer on the insulating substrate, and a plurality of terminals made of a conductive material on the insulating layer. The insulating layer is disposed outside the area located between the terminals. The insulating substrate has a groove between the terminals.

Display device

The present invention relates to an optical member for deep ultraviolet having a wavelength of 250 nm or shorter, containing a synthetic silica glass which does not substantially contain a halogen element, has a maximum OH group content of less than 10 ppm by weight, has contents of ODC (oxygen deficient centers) and E-prime center of each less than 1&#xd7;10cm, does not substantially contain SiH and peroxy linkage, and has a fictive temperature of 1,050&#xb0; C. or lower.

Growing community of inventors

Tokyo, Japan

Takuya Nakagawa