Nihon Micro Coating Co., Ltd.

Mipox International Corporation

Takuya Nagamine

Yuji Horie

Takehiro Watanabe

Sanaki Horimoto

Noriyuki Kumasaka

Ichiro Kodaka

Masahiro Hosoi

Fumi Murokawa

Jun Watanabe

Jun Tamura

Mitsuru Saito

Toshihiro Kobayashi

Takashi Arahata

Hisatomo Ohno

Claughton Miller

Toshihiro Izumi

An oxide superconductor member is composed of a tape-shaped substrate, an intermediate layer formed on this substrate and an oxide superconductor thin film layer formed on this intermediate layer. A surface of the tape-shaped substrate is polished by continuously running the tape-shaped substrate. The polishing step includes initial polishing process and finishing process which are carried out such that the average surface roughness Ra of the substrate becomes 2 nanometers or less and the in-plane directionality of the intermediate layer becomes 5&#xb0; or less after the polishing step.

Method for polishing tape-shaped substrate for oxide superconductor, oxide superconductor, and base material for oxide superconductor

A polishing system and a method are presented for uniformly polishing efficiently at a fast rate the surface of a tape-like metallic base material of several hundred meters in length. The polishing system is provided not only with devices for causing the base material to travel continuously and applying a specified tension in the base material but also with a first polishing device for randomly polishing the target surface and a second polishing device for carrying out a final polishing on the target surface in the direction of travel of the base material. Polishing marks are formed in the direction of travel on the target surface by the final polishing.

System and method for polishing surface of tape-like metallic base material

A polishing pad has a resin sheet having a flat surface and abrading particles fixed inside and on the surface of this resin sheet. Its tensile strength is in the range of 30 MPa or greater and 70 MPa or less and preferably in the range of 40 MPa or greater and 60 MPa or less. Its tensile tear elongation is in the range of 50% or less, preferably 20% or less and more preferably 5% or less. The average diameter of the primary particles of the abrading particles is in the range of 0.005 &#x3bc;m or greater and less than 0.5 &#x3bc;m, and preferably in the range of 0.005 &#x3bc;m or greater and 0.2 &#x3bc;m or less. The content of the abrading particles fixed to the resin sheet is 10 volume % or greater and 50 volume % or less, or preferably 10 volume % or greater and 24 volume or less.

Polishing pad, method of producing same and method of polishing

A transparent pad having a polishing surface with an average surface roughness of 5 &#x3bc;m or less is used as a polishing pad. An indentation is formed on the back surface of the transparent pad such that its rate of light transmission is locally changed. The transparent pad has a rate of light transmission equal to or greater than 10% or preferably 30% for light of at least one wavelength in the range of 350 nm&#x2013;900 nm.

Polishing pad and method of producing same

A cutting tool for simultaneously carrying out a facing operation and a grooving operation on a target surface has a facing part and a grooving part that protrudes from and may be integrally formed with the facing part. The facing part has a facing surface for carrying out the facing operation and the grooving part has a grooving surface and is for cutting a groove of a specified depth and width on the target surface simultaneously as the cutting tool is moved in a specified forward direction parallel to the target surface. The dimensions of the facing and grooving parts, the roughness of their surfaces, the angles of their cutting edges and the sloping angles of the facing and grooving surfaces with respect to the forward direction are each required to be within a specified range. Where the grooving part protrudes from the facing part, the corners at which the facing surface joins the side surfaces of the grooving part are formed such that each corner has a beveled surface portion.

Cutting tool for simultaneous facing and grooving of CMP pad

Growing community of inventors

Tokyo, Japan

Takuya Nagamine