Gigaphoton Inc.

Takuya Ishii

Yutaka Shiraishi

Toru Suzuki

Takayuki Yabu

Yoshifumi Ueno

Tsukasa Hori

Toshihiro Nishisaka

Hiroshi Someya

Fumio Iwamoto

Hirokazu Hosoda

Toshiyuki Hirashita

Kotaro Miyashita

Takashi Ito

Hisashi Nara

Ryota Kujira

A laser chamber apparatus may include a pipe, an inner electrode extending along a longitudinal direction of the pipe and disposed in a through hole in the pipe, an outer electrode including a contact plate extending along the longitudinal direction of the pipe and being in contact with an outer circumferential surface of the pipe and a ladder section formed of bar members each having one end connected to the contact plate and juxtaposed along a longitudinal direction of the contact plate, and a leaf spring extending along the longitudinal direction of the pipe and configured to press the outer electrode against the pipe. The leaf spring may include leaf spring pieces separated by slits, and the leaf spring pieces may each include a bent section bent along the edge and are configured to press the bar members in a position shifted from the bent sections toward the edge.

Laser chamber apparatus, gas laser apparatus, and method for manufacturing electronic device

An extreme ultraviolet light sensor unit according to one aspect of the present disclosure includes a mirror configured to reflect extreme ultraviolet light, a filter configured to transmit the extreme ultraviolet light reflected by the mirror, an optical sensor configured to detect the extreme ultraviolet light having passed through the filter, a purge gas supply unit disposed to supply purge gas to a space between the mirror and the filter, and a pipe part configured to allow plasma light including the extreme ultraviolet light entering from an opening to pass therethrough toward the mirror and allow the purge gas flowing to the space between the mirror and the filter to flow out of the opening.

Extreme ultraviolet light sensor unit and extreme ultraviolet light generation device

A target storage device may include a tank configured to store a target that generates extreme ultraviolet light when being irradiated with laser light, a heater connected with the tank and configured to heat the tank, and a radiation member disposed to cover at least a part of the tank connected with the heater and configured to reflect heat radiation from the tank and the heater toward the tank.

Target storage device

An extreme ultraviolet light generation apparatus may include: a chamber in which extreme ultraviolet light is generated from plasma generated by irradiating a target supplied into the chamber with a laser beam; a target generator that supplies the target into the chamber as a droplet; a droplet measurement unit that measures the droplet supplied from the target generator into the chamber; and a shielding member that shields the droplet measurement unit from electromagnetic waves emitted from the plasma, the droplet measurement unit including: a light source that emits continuous light to the droplet; a window provided in the chamber to allow the continuous light to transmit therethrough; and an optical sensor that receives the continuous light via the window. The shielding member includes a shielding body provided on the chamber side with respect to the window and configured to cover an optical path of the continuous light.

Extreme UV light generator

Output timing of laser light is controlled with high accuracy. An extreme ultraviolet light generation device may include a chamber in which plasma is generated to generate extreme ultraviolet light, a window provided in the chamber, an optical path pipe connected to the chamber, a light source disposed in the optical path pipe and configured to output light into the chamber via the window, a gas supply unit configured to supply gas into the optical path pipe, and an exhaust port configured to discharge the gas in the optical path pipe to an outside of the optical path pipe.

Extreme ultraviolet light generation device

An extreme ultraviolet light generation apparatus may include: a chamber in which extreme ultraviolet light is generated when a target is irradiated with a laser beam inside the chamber; a target supply part configured to supply the target into the chamber; and a target collector configured to collect the target which is supplied by the target supply part but is not irradiated with the laser beam in a collection container, by receiving the target on a receiving surface having a contact angle of greater than 90 degrees with the target.

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Oyama, Japan

Takuya Ishii