Tokyo Ohka Kogyo Co., Ltd.

San-apro Limited

Sankyo Company, Limited

Takuya Ikeda

Masatoshi Arai

Yoshitaka Komuro

Takaya Maehashi

Issei Suzuki

Koshi Onishi

KhanhTin Nguyen

Junichi Miyakawa

Masahiro Shiosaki

Yoshiyuki Utsumi

Takahiro Kojima

Takahide Nishi

Hideto Nito

Takashi Nagamine

Tatsuya Fujii

Toshiaki Hato

Takaaki Kaiho

Hiroto Yamazaki

Takeshi Furuta

Yuki Fukumura

Masafumi Fujisaki

Toshiyasu Takemoto

Yusaku Takashima

Nobuhiro Michibayashi

Atsushi Shiraishi

Mari Murata

Hideo Seike

A resist composition containing a polymeric compound having a constitutional unit (a01) derived from a compound represented by General Formula (a0-1). In the formula, Wrepresents a polymerizable group-containing group, Crepresents a tertiary carbon atom, Xrepresents a group that forms a monocyclic or polycyclic hydrocarbon group together with C, provided that part or all of hydrogen atoms contained in this monocyclic or polycyclic hydrocarbon group may be substituted with a substituent, and part of carbon atoms constituting a ring may be substituted with a hetero atom, and Rarepresents a linear, branched, or cyclic aliphatic hydrocarbon group

Resist composition and method of forming resist pattern

A resist composition containing a polymeric compound having a constitutional unit (a01) derived from a compound represented by General Formula (a0-1). In the formula, Wrepresents a polymerizable group-containing group, Rarepresents a linear or branched hydrocarbon group, and Raand Raeach independently represents a hydrocarbon group which may have a substituent

Resist composition, method of forming resist pattern, compound, and resin

A resist composition containing a base material component (A) of which solubility in a developing solution is changed due to an action of an acid and a compound represented by Formula (bd1); in the formula, Rto Reach independently represent an aryl group which may have a substituent, provided that at least two of Rto Rare aryl groups having one or more fluorine atoms as substituents, and at least one of the fluorine atoms of the aryl group is bonded to a carbon atom adjacent to a carbon atom that is bonded to the sulfur atom in the formula, and the total number of the fluorine atoms is 4 or more; Xrepresents a counter anion. 

Resist composition, method of forming resist pattern, and compound

A resist composition containing a base material component of which solubility in a developing solution is changed due to an action of an acid and a compound represented by Formula (bd1); in the formula, Rto Reach independently represent an aryl group which may have a substituent, provided that one or more of Rto Rare aryl groups having a fluorinated alkyl group which may have a substituent, and at least one of the fluorinated alkyl groups which may have a substituent in these aryl groups is bonded to a carbon atom adjacent to a carbon atom that is bonded to a sulfur atom in the formula, and a total number of the fluorinated alkyl groups which may have a substituent is 2 or more; Xrepresents a counter anion. 

A resist composition containing a resin component having a structural unit containing a group which is dissociated under the action of an acid and compound represented by the general formula (bd1). In the formula (bd1), Rxto Rxrepresent a hydrocarbon group or a hydrogen atom or may be mutually bonded to form a ring structure, Ryto Ryrepresent a hydrocarbon group or a hydrogen atom or may be mutually bonded to form a ring structure, and Rzto Rzrepresent a hydrocarbon group or a hydrogen atom or may be mutually bonded to form a ring structure. At least one of Rxto Rx, Ryto Ryand Rzto Rzhas an anion group, the entire anion moiety may be an n-valent anion, and Mrepresents an m-valent organic cation 

Resist composition, and method of forming resist pattern

A resist composition containing a compound represented by the general formula (bd1-1), (bd1-2) or (bd1-3); in the formula, Rxto Rxrepresent a hydrocarbon group or a hydrogen atom or may be mutually bonded to form a ring structure; Ryto Ryrepresent a hydrocarbon group or a hydrogen atom or may be mutually bonded to form a ring structure, Rzto Rzrepresent a hydrocarbon group or a hydrogen atom or may be mutually bonded to form a ring structure. At least one of Rxto Rx, Ryto Ryand Rzto Rzhas an anion group, Mrepresents a sulfonium cation having a sulfonyl group, Rto Reach independently represent a monovalent organic group; provided that at least one of Rto Ris an organic group having an acid dissociable group; and Mrepresents an m-valent organic cation having an electron-withdrawing group. 

Resist composition, method of forming resist pattern, compound, and acid generator

A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, and which includes a polymeric compound having a structural unit represented by general formula (a0-1) (wherein R represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms; Varepresents a divalent hydrocarbon group; nrepresents an integer of 0 to 2; Rarepresents an acid dissociable group represented by general formula (a0-r1-1); Raand Rarepresents a hydrocarbon group; Raand Ramay be mutually bonded to form a ring; Yarepresents a quaternary carbon atom; Ra, Raand Raeach independently represents a hydrocarbon group, provided that at least one of Ra, Raand Rais a hydrocarbon group having a polar group). 

Resist composition, method of forming resist pattern, polymeric compound, and copolymer

A resist composition including a resin component having a structural unit derived form a compound represented by formula (a0-1) (in the formula, W represents a polymerizable group-containing group; Rais a group which is bonded to Rato form an aliphatic cyclic group, or bonded to Rato form an aliphatic cyclic group; Rarepresents a hydrocarbon group which may have a substituent; Rais a hydrogen atom or a monovalent organic group in the case where Rais not bonded thereto; Rais a hydrogen atom or a monovalent organic group in the case where Rais not bonded thereto; and Rato Raeach independently represents a hydrogen atom or a monovalent organic group). 

Resist composition, method of forming resist pattern, polymeric compound, and compound

A resist composition including a resin component having a structural unit derived from a compound represented by formula (a0-1), in which W represents a polymerizable group-containing group; Rarepresents an alkyl group or an aromatic heterocyclic group containing an oxygen atom or a sulfur atom; in the case where Rais an aromatic heterocyclic group containing an oxygen atom or a sulfur atom, Rais a group which forms an aliphatic cyclic group containing an electron-withdrawing group, together with the tertiary carbon atom (*C) to which Rais bonded; and when Rais an alkyl group, Rais a group in which an aliphatic cyclic group containing an electron-withdrawing group forms a condensed ring together with an aromatic heterocyclic group containing an oxygen atom or a sulfur atom. 

A resist composition including a base component which exhibits changed solubility in a developing solution under action of acid, and a compound (B1) having an anion moiety and a cation moiety and being represented by general formula (b1) (wherein Rto Reach independently represents a hydrogen atom or a hydrocarbon group which may have a substituent, or two or more of Rto Rmay be mutually bonded to form a ring structure, provided that at least two of Rto Rare mutually bonded to form a ring structure, and at least one of Rto Rhas an anion group, and the anion moiety as a whole forms an anion having a valency of n; n represents an integer of 1 or more; represents an integer of 1 or more; and Mrepresents an organic cation having a valency of m). 

A method for preparing a polymer compound including copolymerizing a monomer (m0-1) and a monomer (m0-2) to obtain a first polymer compound and causing the first polymer compound and an acid component to react with each other to obtain a second polymer compound. In the formulae, Rand Rare each a hydrogen atom, an alkyl group having 1 to 5 carbon atoms and a halogenated alkyl group having 1 to 5 carbon atoms, Vais a divalent hydrocarbon group which may have an ether bond, nis an integer of 0 to 2, Rais a tertiary alkyl ester-type acid dissociable group, Vais a divalent linking group containing a heteroatom, or a single bond, Rais a monovalent organic group, nis an integer of 0 to 3, Rais an acid dissociable group, and nis an integer of 1 to 3. 

Method of preparing polymer compound

Provided are a photobase generator having higher sensitivity to light than do conventional photobase generators, and a photosensitive resin composition containing the photobase generator. The present invention is a photobase generator characterized in containing a salt represented by general formula (1). (In formula (1), R-Rare mutually independent groups represented by general formula (2), C1-18 alkyl groups, or Ar, with at least one being a group represented by general formula (2); in formula (2), (D) is a divalent group bonded on at least one side to elemental boron, and Aris the same as the aforementioned Ar; and Qis a monovalent onium cation.) 

Photobase generator

Provided is a novel sulfonium salt that has high solubility in a solvent and has high light sensitivity to, especially, light having a wavelength not longer than deep-UV (254 nm) and a novel photo-acid generator comprising the sulfonium salt. The invention relates to a sulfonium salt represented by the following general formula (1) and a novel photo-acid generator comprising the sulfonium salt. wherein Rrepresents an electron withdrawing group; Rand Reach independently represent an alkyl group having 1 to 5 carbon atoms, an alkoxy group, an acyl group, a halogenated alkyl group, a halogen atom, a hydroxyl group, a cyano group, or a nitro group; p and q each independently represent an integer of 0 to 5; and Xrepresents a monovalent counter anion.

Sulfonium salt and photo-acid generator

The present invention provides a compound having the following general formula (I) which is useful as a neurokinin receptor antagonist: (wherein,

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Kawasaki, Japan

Takuya Ikeda