Nuflare Technology, Inc.

Kabushiki Kaisha Toshiba

Takuto Umetsu

Kunihiko Suzuki

Yoshiaki Daigo

Masayoshi Yajima

Yuki Furutani

Keiko Shiozawa

Shun Haruyama

Susceptor cover

Cover base for susceptors

Susceptor

Semiconductor wafer heater

According to one embodiment, a rectifying plate is opposed to a plurality of nozzles which are configured to inject a fluid. The rectifying plate is configured to rectify the fluid. The rectifying plate includes: a plurality of high flow path resistance areas, and a low flow path resistance area. Each of the high flow path resistance areas includes a nozzle-facing area which is opposed to one of the plurality of nozzles. The low flow path resistance area surrounds each of the plurality of high flow path resistance areas. The low flow path resistance area includes a plurality of first through-holes to allow the fluid to pass through and having a smaller flow path resistance of the fluid than that of the high flow path resistance area.

Rectifying plate, fluid-introducing apparatus, and film-forming apparatus

Cover ring of top plate for semiconductor manufacturing apparatus

Semiconductor wafer and susceptor heating

Top plate for semiconductor manufacturaing equipment

Growing community of inventors

Kanagawa, Japan

Takuto Umetsu