Shimadzu Corporation

Osaka University

Takuro Izumi

Toshinori Yoshimuta

Satoshi Sano

Takahiro Doki

Kenji Sato

Akira Horiba

Taro Shirai

Koichi Tanabe

Kenji Kimura

Yukihisa Wada

Hiroyuki Kishihara

Susumu Adachi

Tetsuya Yoneda

Satoshi Tokuda

Heiji Watanabe

Takayoshi Shimura

Takuji Hosoi

Shinji Miyauchi

Takashi Omori

Asaka Kohiyama

An X-ray fluorescence analyzer is provided inside an analysis chamber covered with a housing with: an X-ray tube; an analyzing crystal for spectrally dispersing X-ray fluorescence emitted from a sample; an X-ray detector for detecting the X-ray fluorescence spectrally dispersed by the analyzing crystal; a warm air generator for generating warm air to maintain a temperature of the analyzing crystal at a target temperature; and a Peltier element for cooling the X-ray detector.

X-ray fluorescence analyzer

A spectroscopic element and a detector are disposed along a circumference of one Rowland circle. The spectroscopic element has a spectral surface whose length, measured along the Rowland circle, is shorter than a length in the Rowland circle plane, of an irradiation surface irradiated with excitation beams emitted to a sample holder. The spectroscopic element and the sample holder are disposed to separate a group of characteristic X-rays within a common spectral range of the spectroscopic element.

X-ray spectroscopic analysis apparatus and elemental analysis method

A dispersive element is provided with a dispersive crystal for spectrally dispersing X-rays, a first support layer supporting the dispersive crystal, and a second support layer supporting the first support layer. The first support layer is greater in a thermal expansion coefficient than the dispersive crystal. The second support layer is smaller in a thermal expansion coefficient than the first support layer and is greater in rigidity than the first support layer.

Dispersive element

A chemical state analysis apparatusincludes: an excitation sourceconfigured to irradiate an irradiation region A of a predetermined surface in a sample S containing a battery material with an excitation rays for generating characteristic X-rays of the battery material; an analyzing crystalof a flat plate arranged so as to face the irradiation region A; a slitarranged between the irradiation region A and the analyzing crystal, the slit being arranged in parallel to the irradiation region A and a predetermined crystal plane of the analyzing crystal; an X-ray linear sensorin which linear detecting elementseach having a length in a direction parallel to the slitare arranged in a direction perpendicular to the slit; a wavelength spectrum generation unitconfigured to generate a wavelength spectrum based on intensity of the characteristic X-rays detected by the X-ray linear sensor; a peak wavelength determination unitconfigured to determine a peak wavelength which is a wavelength in a peak of the wavelength spectrum; and a chemical state specification unitconfigured to specify a value for specifying a chemical state of the battery material in the sample S from the peak wavelength determined by the peak wavelength determination unitand a standard curve representing a relation between a value representing the chemical state and the peak wavelength.

Apparatus and method for analyzing chemical state of battery material

An X-ray spectrometer is provided with: an excitation source configured to irradiate excitation rays onto an irradiation area of a sample, a diffraction member provided to face the irradiation area; a slit member provided between the irradiation area and the diffraction member, the slit member having a slit extending parallel to the irradiation area and a prescribed surface of the diffraction member; an X-ray linear sensor having a light-incident surface in which a plurality of detection elements are arranged in a direction perpendicular to a longitudinal direction of the slit; a first moving mechanism configured to change an angle between the sample surface and the prescribed surface, and/or a distance between the sample surface and the prescribed surface by moving the diffraction member within a plane perpendicular to the longitudinal direction; and a second moving mechanism configured to position the X-ray linear sensor on a path of characteristic X-rays passed through the slit and diffracted by the prescribed surface by moving the X-ray linear sensor within a plane perpendicular to the longitudinal direction.

X-ray spectrometer

Provided is a radiation imaging apparatus capable of performing precise imaging without performing pre-imaging in the absence of a subject. According to the present invention, it is possible to provide a radiation imaging apparatus capable of performing precise imaging without performing pre-imaging in the absence of a subject immediately before. That is, the apparatus of the present invention is provided with a phase gratingprovided with a subject area and a reference area. Both areas each have a predetermined pattern that absorbs radiation, but the patterns are different from each other. In this area, an image of the phase gratingis observed in a moire pattern of a long period. This moire image of a long period changes in the positions due to the minute change in the relative position between the phase gratingand the absorption grating, so it becomes possible to detect the minute change of the relative position between the radiation source, the phase grating, and the absorption gratingfrom the image of the reference area.

X-ray phase contrast imaging apparatus

This X-ray phase contrast imaging apparatus () includes an X-ray source () that radiates continuous X-rays, a first grating () that forms a self-image, a second grating (), a detector () that detects the continuous X-rays, and a third grating () arranged between the detector () and the first grating. The first grating (), the second grating (), and the third grating () are arranged so as to satisfy conditions of predetermined formulas.

An X-ray phase contrast imaging device of the present invention can change an arrangement pitch of slits related to a multi-slit and an arrangement pitch of phase shift sections related to a phase grating. A positional relationship among the multi-slit, the phase grating, and an FPD is determined based on the arrangement pitch of the slits related to the multi-slit, the arrangement pitch of the phase shift sections related to the phase grating, and an arrangement pitch of detection elements related to the FPD. Among these arrangement pitches, by changing the arrangement pitch of the slits and the arrangement pitch of the phase shift sections, the present invention can change the positional relationship among the multi-slit, the phase grating, and the FPD.

Growing community of inventors

Kyoto, Japan

Takuro Izumi