Canon Kabushiki Kaisha

Takumi Tokimitsu

Yoshiyuki Kuramoto

Tsuyoshi Kitamura

Yuhei Sumiyoshi

Hiroyuki Yuuki

A measurement apparatus which measures a distance between a reference surface and a test surface, comprises a light source unit including a plurality of light sources each corresponding to one of a plurality of wavelength scanning ranges and each continuously scans a wavelength of generated light in the corresponding wavelength scanning range, an interferometer unit which splits light emitted by each of the plurality of light sources into reference light and test light, and detects, as an interference signal, an interference fringe formed by the reference light and the test light, and a processor which determines a slope of a phase of the interference signal with respect to wave number of the light based on the interference signal detected by the interferometer unit for each of the plurality of wavelength scanning ranges, and determines the distance from the slope of the phase.

Measurement apparatus

A detection apparatus which illuminates a sample and detects light reflected by the sample, comprises a light source, a columnar reflecting member having a columnar reflecting surface which reflects light having entered a first end of the columnar reflecting member by a plurality of number of times, and emits the light from a second end of the columnar reflecting member, a mirror which reflects light radiated by the light source so as to guide to the first end and a detector, wherein the sample is illuminated with the light emitted from the second end, and the detector is configured to detect the light which has been reflected by the sample and has passed through the columnar reflecting member, and a reflecting surface of the mirror is a concave surface, and a shape of a reflecting surface of the mirror on a section perpendicular to an axis of the columnar reflecting member is concave.

Detection apparatus

The present invention provides an optical element which is used for light having a wavelength not more than 250 nm, and receives a light beam at a maximum incident angle not less than 55&#xb0;, wherein the optical element includes an optical thin film in an effective aperture thereof, and a film thickness distribution of the optical thin film in the effective aperture includes a distribution in which a thickness of the optical thin film in an outermost periphery of the effective aperture is 1.10 times (inclusive) to 1.25 times (inclusive) a thickness of the optical thin film at a midpoint between an optical axis and the outermost periphery of the effective aperture.

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Moka, Japan

Takumi Tokimitsu