Average Co-Inventor Count = 3.95
ph-index = 1
The patent ph-index is calculated by counting the number of publications for which an author has been cited by other authors at least that same number of times.
Company Filing History:
1. Mitsubishi Gas Chemical Company, Inc. (13 from 2,248 patents)
2. A School Corporation Kansai University (1 from 40 patents)
13 patents:
1. 11911341 - Multilayer vessel, and application thereof
2. 11852970 - Material for lithography, production method therefor, composition for lithography, pattern formation method, compound, resin, and method for purifying the compound or the resin
3. 11572430 - Compound, resin, resist composition or radiation-sensitive composition, resist pattern formation method, method for producing amorphous film, underlayer film forming material for lithography, composition for underlayer film formation for lithography, method for forming circuit pattern, and purification method
4. 11480877 - Resist composition, method for forming resist pattern, and polyphenol compound used therein
5. 11256170 - Compound, resist composition, and method for forming resist pattern using it
6. 11243467 - Compound, resin, resist composition or radiation-sensitive composition, resist pattern formation method, method for producing amorphous film, underlayer film forming material for lithography, composition for underlayer film formation for lithography, method for forming circuit pattern, and purification method
7. 11143962 - Material for forming underlayer film for lithography, composition for forming underlayer film for lithography, underlayer film for lithography and production method thereof, pattern forming method, resin, and purification method
8. 11137686 - Material for forming underlayer film for lithography, composition for forming underlayer film for lithography, underlayer film for lithography and production method thereof, and resist pattern forming method
9. 11130724 - Compound, resin, composition, resist pattern formation method, and circuit pattern formation method
10. 10747112 - Compound, resin, and purification method thereof, material for forming underlayer film for lithography, composition for forming underlayer film, and underlayer film, as well as resist pattern forming method and circuit pattern forming method
11. 10745372 - Compound, resin, material for forming underlayer film for lithography, underlayer film for lithography, pattern forming method, and purification method
12. 10642156 - Resist base material, resist composition and method for forming resist pattern
13. 10437148 - Resist material, resist composition and method for forming resist pattern