Tokyo Ohka Kogyo Co., Ltd.

Toyota Ohka Kogyo Co., Ltd.

Takumi Namiki

Kenji Seki

Takayuki Haraguchi

Tomoya Kumagai

Mai Sugawara

Yu-Geng Wu

Shinji Kumada

Yuriko Shirai

Emi Uchida

Jun Iioka

Kento Asoya

A surface treatment agent containing a silylating agent (A) and a compound (C) having an amide skeleton in a molecule, and a surface treatment method for subjecting an object to be treated to surface treatment using the surface treatment agent.

Surface treatment agent and surface treatment method

A surface treatment agent including a compound represented by the following general formula (P-1) and an acid. In the formula, Rrepresents a linear or branched alkyl group having 8 or more carbon atoms, a linear or branched fluorinated alkyl group having 8 or more carbon atoms, or an aromatic hydrocarbon group; Rand Reach independently represents a hydrogen atom, a linear or branched alkyl group having 8 or more carbon atoms, a linear or branched fluorinated alkyl group having 8 or more carbon atoms, or an aromatic hydrocarbon groupR&#x2014;P(&#x2550;O)(OR)(OR)&#x2003;&#x2003;(P-1).

Surface treatment agent, surface treatment method, and area selective deposition method

A method for imparting water repellency to a substrate; a surface treatment agent used in the method; and a method for suppressing collapse of an organic or inorganic pattern in cleaning the substrate surface with a cleaning liquid. The method includes exposing a surface of a substrate to a surface treatment agent, the surface treatment agent including a water-repelling agent and a nitrogen-containing heterocyclic compound, the water-repelling agent including an alkoxymonosilane compound having a hydrophobic group bonded to a silicon atom. A surface treatment agent including a water-repelling agent and a nitrogen-containing heterocyclic compound, the water-repelling agent (A) including an alkoxymonosilane compound having a hydrophobic group bonded to a silicon atom.

Method for imparting water repellency to substrate, surface treatment agent, and method for suppressing collapse of organic pattern or inorganic pattern in cleaning substrate surface with cleaning liquid

A surface treatment liquid capable of hydrophobizing a surface of a treatment target without including a silylation agent, a surface treatment method using the liquid, and a method for suppressing pattern collapse, including surface treatment by the surface treatment method. The liquid contains a nitrogen-containing heterocyclic compound as a water-repelling agent. A compound including one or more hydrocarbon groups which may be substituted with a halogen atom in which a total number of carbon atoms of the one or more hydrocarbon group is three or more, is used as the nitrogen-containing heterocyclic compound. The liquid may include only a nitrogen-containing heterocyclic compound having the above-described predetermined structure, as a water-repelling agent.

Surface treatment liquid, surface treatment method, and method for suppressing pattern collapse

A cleaning liquid having an excellent corrosion inhibition function, and a method for manufacturing the same. The cleaning liquid contains alkanol hydroxyamine represented by general formula (1), and a basic compound other than the alkanol hydroxyamine. In the formula, Rand Reach independently represents a C1-C10 alkyl group having one to three hydroxy groups, or a hydrogen atom, and Rand Rare not simultaneously a hydrogen atom. 

Cleaning liquid and method for manufacturing the same

A cleaning liquid and an anticorrosion agent having an excellent corrosion inhibition function, and a method for manufacturing the same. The cleaning liquid contains alkanol hydroxyamine represented by general formula (1), alkanolamine represented by general formula (2), a solvent, and a basic compound other than the alkanol hydroxyamine and the alkanolamine or an acidic compound. In the general formula (1), Rand Reach independently represents a C1-C10 alkyl group having one to three hydroxy groups, or a hydrogen atom, Rand Rare not simultaneously a hydrogen atom, and Rand Rare not simultaneously a hydrogen atom. 

Cleaning liquid, anticorrosion agent, and method for manufacturing the same

A coating agent for forming a fine pattern capable of simultaneously achieving slimming and roughness reduction of a positive-type resist pattern without deteriorating the cross-sectional shape of the slimmed positive type resist pattern and a method of slimming treatment of a positive-type resist pattern using the above coating agent for forming a fine pattern. A coating agent comprising a nitrogen-containing compound with a specific structure and an organic solvent is used as the coating agent for forming fine pattern used for a positive-type resist pattern. The coating agent may include a basic nitrogen-containing compound and/or a water-soluble polymer or an alkali-soluble polymer.

Coating agent for forming fine pattern

A coating agent for forming a fine pattern and a method for forming a fine pattern using the coating agent, in which the coating agent allows a resist pattern to be favorably fined, and can form a fined pattern having a suppressed deviation of CD. A coating agent for forming a fine pattern including (A) a water-soluble polymer is combined with a compound in which the compound has an alkyl group having 8 or more carbon atoms bound to a nitrogen atom, and is combined with 4 moles or more of ethylene oxide and/or propylene oxide with respect to 1 mole of a nitrogen atom bound with the alkyl group as (B) a nitrogen-containing compound.

A method for forming a fine pattern, including forming a resist film by applying, on a substrate, a resist composition containing a base material having a solubility, in a developer liquid including an organic solvent, that decreases according to an action of an acid, a compound which generates an acid upon irradiation, and an organic solvent; exposing the resist film; forming a resist pattern using the developer liquid; applying, on the resist pattern, a coating agent for pattern fining including a resin and an organic solvent; and heating the resist pattern on which a coating film is formed.

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Kawasaki, Japan

Takumi Namiki