Hitachi High-tech Corporation

Kabushiki Kaisha Toshiba

Hitachi-high-technologies Corporation

Fujifilm Business Innovation Corp.

Fujitsu Corporation

Toshiba Lifestyle Products & Services Corporation

Takuma Yamamoto

Nao Mishima

Mitsuru Sato

Toru Takahashi

Kenji Tanimoto

Masakazu Ketsuka

Yasunori Goto

Kohei Kaibara

Takahiro Nishihata

Mayuka Osaki

Tomohiro Tamori

Nobuyuki Matsumoto

Yasunori Taguchi

Hiroya Ohta

Yusuke Abe

Yuji Takagi

Takashi Hiroi

Makoto Suzuki

Yasutaka Toyoda

Toshiyuki Ono

Tomohiro Funakoshi

Fumihiko Fukunaga

Yusuke Iida

Masaaki Nojiri

Wei Sun

Aya Kuwano

Akira Hamaguchi

Maki Tanaka

Toshimitsu Kaneko

Chie Shishido

Satoru Yamaguchi

Hiroyuki Shindo

Yusuke Ominami

Makoto Sakakibara

Taku Ninomiya

Kei Sakai

Shinichi Shinoda

Susumu Kubota

Tsuyoshi Minakawa

Yasutoyo Takeyama

Shinya Yamada

Satoshi Kawata

Tatsuma Sakurai

Keiichiro Hitomi

Junji Otsuka

Tsunehiro Sakai

Ayumi Doi

Takeyuki Yoshida

Chihiro Ida

Shuuichirou Takahashi

Long Zhang

The purpose of the present disclosure is to provide a pattern measurement device that can accurately measure positional deviation between a center of gravity of a top surface of a pattern and a center of gravity of a bottom surface of the pattern, even when an incidence angle of a charged particle beam varies for each irradiation position of the charged particle beam. The pattern measurement device according to the present disclosure acquires an angular deviation amount corresponding to coordinates in a visual field of a pattern in accordance with a relationship between the coordinates in the visual field of the pattern and an angular deviation amount of the charged particle beam, and acquires a positional deviation amount corresponding to the coordinates in the visual field of the pattern in accordance with a relationship between the angular deviation amount and the center of gravity positional deviation amount (see FIG.).

Pattern measurement device

A non-transitory computer-readable recording medium stores an information processing program for causing a computer to execute a process including: extracting a first feature from an image; detecting, from the extracted first feature, a plurality of visual entities included in the image; generating a second feature in which the visual entities in at least one combination of the plurality of detected visual entities are combined, in first feature, with each other; generating, based on the first feature and the second feature, a first map that indicates relation of each visual entity; extracting a fourth feature based on the first map and a third feature obtained by converting the first feature; and estimating the relation from the fourth feature.

Computer-readable recording medium storing information processing program, method of processing information, and information processing apparatus

A method, an apparatus, and a program for more appropriately determining a condition for appropriately recognizing a semiconductor pattern are provided. A method for determining a condition related to a captured image of a charged particle beam apparatus including: acquiring, by a processor, a plurality of captured images, each of the captured images being an image generated by irradiating a pattern formed on a wafer with a charged particle beam, and detecting electrons emitted from the pattern, each of the captured images being an image captured according to one or more imaging conditions, the method further including: acquiring teaching information for each of the captured images; acquiring, by the processor, one or more feature determination conditions; calculating, by the processor, a feature for each of the captured images based on each of the feature determination conditions, at least one of the imaging condition and the feature determination condition being plural.

Method, apparatus, and program for determining condition related to captured image of charged particle beam apparatus

A non-transitory computer-readable recording medium stores an inference program for causing a computer to execute processing including: acquiring a background image in which a target area in which an object is arranged is captured, and a target image in which the object and the area are captured; generating an intermediate feature by inputting the background image and the target image to a feature extraction model; generating a mask image that indicates a region of an object that does not exist in the background image but exists in the target image by inputting the intermediate feature to a generation model; and specifying the object that does not exist in the background image but exists in the target image by inputting the generated mask image and intermediate feature to an estimation model.

Computer-readable recording medium storing inference program, computer-readable recording medium storing learning program, inference method, and learning method

A non-transitory computer-readable recording medium stores a program for causing a computer to execute a learning process including: obtaining training data that uses a background image in which an area where an object is to be arranged is imaged and a target image in which the object and the area are imaged as input data and uses information associated with the object not present in the background image but present in the target image as ground truth; and executing machine learning for a machine learning model on a basis of a result output from the machine learning model when the background image and the target image are input to the machine learning model on a basis of the training data and the ground truth.

Computer-readable recording medium storing learning program, learning method, and information processing apparatus

In the present invention, an overlay misalignment is quickly measured. An image generation unit generates an image on the basis of signals from a detector. A matching processing unit identifies, by means of matching processing with a template image, the position of an overlay measurement pattern in the image generated by the image generation unit. A line profile generation unit generates, by scanning the overlay pattern, a first line profile pertaining to a secondary electron signal and a second line profile pertaining to a backscattered electron signal. An overlay misalignment measurement unit identifies the position of a first pattern in the overlay measurement pattern from the first line profile, identifies the position of a second pattern in the overlay measurement pattern from the second line profile, and measures an overlay misalignment in a sample on the basis of the position of the first pattern and the position of the second pattern.

Charged particle beam system and overlay misalignment measurement method

From a reference waveformand a BSE signal waveformthat is extracted from a backscattered electron image and indicates a backscattered electron signal intensity from a pattern along a first direction, a difference waveform indicating a relationship between the backscattered electron signal intensity and a difference between a coordinate of the BSE signal waveform and a coordinate of the reference waveform which have the same backscattered electron signal intensity is generated, and presence or absence of a shielded regionthat is not irradiated with a primary electron beam on a side wall of the pattern is determined based on the difference waveform. The reference waveform indicates a backscattered electron signal intensity from a reference pattern along the first direction in which the side wall is formed perpendicularly to an upper surface and a bottom surface of the pattern when the reference pattern is scanned with the primary electron beam.

Pattern inspecting device

A computation device is provided for measuring the dimensions of patterns formed on a sample based on a signal obtained from a charged particle beam device. The computation device includes a positional deviation amount calculation unit for calculating the amount of positional deviation in a direction parallel to a wafer surface between two patterns having different heights based on an image acquired at a given beam tilt angle; a pattern inclination amount calculation unit for calculating an amount of pattern inclination from the amount of positional deviation using a predetermined relational expression for the amount of positional deviation and the amount of pattern inclination; and a beam tilt control amount calculation unit for controlling the beam tilt angle so as to match the amount of pattern inclination. The pattern measurement device sets the beam tilt angle to a calculated beam tilt angle, reacquires an image and measures the patterns.

Pattern measurement device and pattern measurement method

A charged particle beam deviceincludes: a plurality of detectorsfor detecting a signal particleemitted from a sampleirradiated with a charged particle beamand converting the detected signal particleinto an output electrical signal; an energy discriminatorprovided for each detectorand configured to discriminate the output electrical signalaccording to energy of the signal particle; a discrimination control blockfor setting an energy discrimination condition of each of the energy discriminators; and an image calculation blockfor generating an image based on the discriminated electrical signal. The discrimination control blocksets energy discrimination conditions different from each other among the plurality of energy discriminators

Charged particle beam device

An information processing device includes a processor configured to acquire: when an electronic document is posted to a message exchange service, information on a person who has posted the electronic document and information on update history of the electronic document; specify, based on the acquired information on the person who has posted the electronic document and the acquired information on the update history, a notification destination to whom a notification indicating that the electronic document has been posted is to be provided; and perform control for providing notification information containing at least information indicating the specified notification destination to the notification destination.

Information processing device, information processing system, and non-transitory computer readable medium

An information processing apparatus includes a processor configured to: extract, if a facsimile document is received, information indicating a contact associated in advance with a telephone number of a person who has transmitted the facsimile document; and perform control for posting an electronic document, which is obtained by digitizing the facsimile document, to a message exchange service including the contact as a member while determining the contact as a notification target of the electronic document.

Information processing apparatus, information processing system, and non-transitory computer readable medium for notifying contacts of receipt of a facsimile document

Even when the amount of overlay deviation between patterns located in different layers is large, correct measurement of the amount of overlay deviation is stably performed. The charged particle beam device includes a charged particle beam irradiation unit that irradiates a sample with a charged particle beam, a first detection unit that detects secondary electrons from the sample, a second detection unit that detects backscattered electrons from the sample, and an image processing unit that generates a first image including an image of a first pattern located on the surface of the sample based on an output of the first detection unit, and generates a second image including an image of a second pattern located in a lower layer than the surface of the sample based on an output of the second detection unit. A control unit adjusts the position of a measurement area in the first image based on a first template image for the first image, and adjusts the position of a measurement area in the second image based on a second template image for the second image.

An information processing device includes a processor configured to: perform a control for displaying on an operation screen a candidate for a thread on a service screen for a message exchange service in which information for accessing an electronic document generated by scanning a document is displayed in such a manner that a thread is able to be selected; and receive, on the operation screen, an operation for selecting a candidate for a thread and an operation for posting the electronic document into the message exchange service.

Information processing device and non-transitory computer readable medium for updating electronic document posted in thread of electronic chat conference

An information processing apparatus includes a processor configured to: generate an identification image in response to at least one of a thread and a digital document posted on the thread being specified, the thread being displayed on a service screen of a message exchange service, the identification image being linked with information for accessing the thread; and perform control to output the generated identification image in a readable format.

Information processing apparatus and system and non-transitory computer readable medium

Provided is a charged particle beam device capable of focusing with high accuracy even when a charged particle beam has a large off-axis amount. The charged particle beam device generates an observation image of a sample by irradiating the sample with a charged particle beam, and includes: a deflection unit that inclines the charged particle beam; a focusing lens that focuses the charged particle beam; an adjustment unit that adjusts a lens strength of the focusing lens based on an evaluation value calculated from the observation image; a storage unit that stores a relationship between a visual field movement amount and the lens strength; and a filter setting unit that calculates the visual field movement amount based on an inclination angle of the charged particle beam and the relationship, and sets an image filter to be superimposed on the observation image based on the calculated visual field movement amount.

Growing community of inventors

Tokyo, Japan

Takuma Yamamoto