Asahi Glass Company, Limited

Joshin Uramoto

Takuji Oyama

Koichi Suzuki

Kazuyoshi Noda

Eiichi Ando

Ken Moriwaki

Katsuaki Aikawa

Kouichi Osada

Nobuyoshi Sakurada

Toshihiro Ajikata

Akira Mitsui

Satoru Takaki

Yoshihito Katayama

Hisashi Osaki

Tomohiro Yamada

Tsunehiko Sugawara

Junichi Shimizu

Mamoru Mizuhashi

Noritoshi Horie

Shujiro Watanabe

Kiyoshi Matsumoto

Junichi Ebisawa

Eiji Shidoji

Hisashi Ohsaki

Hiroyasu Kojima

Kenichi Sasaki

Naoki Hashimoto

Atsushi Hayashi

Yukio Kimura

Otojiro Kida

Toshihiko Higuchi

Yasuhiko Akao

Kazuo Kadowaki

Yuko Tachibana

Eri Suzuki

Hiromichi Nishimura

Yuzo Shigesato

Toshikazu Ikezawa

Toshihisa Kamiyama

Junnosuke Mizukami

Takeshi Harano

Naoko Shin

A protective plate for a plasma display comprises conductive substrate for protecting a plasma display and an electrode in electrical contact with the conductive substrate.

Protective plate for a plasma display and a method for producing the same

A multilayer film-coated substrate having the stress of the film relaxed by depositing a multilayer film comprising a metal oxide film and a silicon oxide film on a substrate at a high speed by a sputtering method using a conductive sputtering material, and a process for producing a multilayer film-coated substrate having such a low stress, are presented. A multilayer film-coated substrate comprising a substrate and at least a metal oxide film and a silicon oxide film laminated thereon repeatedly at least once, wherein at least one layer of said metal oxide film is a metal oxide film deposited by sputtering by using, as the target material, a metal oxide MOwhich is deficient in oxygen than the stoichiometric composition, to have the oxygen deficiency resolved, and the stress of the multilayer film is from &#x2212;100 MPa to +100 MPa.

Multilayer film-coated substrate and process for its production

A high reflectance mirror having a high reflectance in a visible-light region, being excellent in durability such as a moisture resistance, a saltwater resistance, etc. and having small dependence on incident angle (i.e., the fluctuation of the reflectance depending on an incident angle of light is little) is provided. The high reflectance mirror comprises a substrate and a silver film, a low refractive index film and a high refractive index film laminated on the substrate in this order wherein an adhesion improving film is formed on the silver film surface on the opposite side of the substrate, the extinction coefficient of the low refractive index film is at most 0.01, the extinction coefficient of the high refractive index film is at most 0.01, the adhesion improving film is an oxide film and the extinction coefficient of the adhesion improving film is at most 0.1.

High reflectance mirror

A protective plate for a plasma display including a conductive substrate for protecting the plasma display. The conductive substrate includes a substrate having a glass plate and a conductive film formed on a resinous film bonded to the glass plate substrate. The plasma display also includes an electrode in electrical contact with the conductive substrate.

A panel glass wherein a surface treating film is formed on a substrate glass so that the surface treating film has a transmittance distribution reverse to the transmittance distribution of the substrate glass, thus providing a uniform-brightness image with a flattened panel glass.

CRT panel glass and production method thereof and CRT

A panel glass having a surface treating film formed on a substrate glass so that an overall transmittance distribution within an effective picture plane satisfies a specific mathematical expression, whereby, even with a flattened panel glass, a uniform-brightness image can be observed with a good contrast, and occurrence of a double image is suppressed.

An antireflection film for a window of a transport, which comprises a light absorbing film consisting essentially of a nitride and having a film thickness of from 3 to 12 nm, and an oxide film having a refractive index of from 1.45 to 1.70 and a film thickness of from 70 to 140 nm, formed in this order on a substrate, and which has adequately low reflection performance to the oblique incident light, an adequate abrasion resistance and a high transmittance of visible light, a glass provided with said film, a laminated glass and its production process.

Transportation equipment window antireflection film, glass with antireflection film, laminated glass and production method therefor

A CRT panel glass and a CRT wherein a surface treating film is formed on an outer surface of a CRT panel so that overall transmittance distribution and reflectance distribution within an effective picture plane satisfy specific mathematical expressions, whereby, even with a flattened panel glass, brightness and contrast are uniform over the entire surface of the image display plane, and their production method.

CRT panel glass and CRT, and their production methods

A method for producing a transparent conductive film composed mainly of an oxide by sputtering using a sputtering target capable of forming a transparent conductive film, wherein intermittent electric power is supplied to the target.

Methods for producing functional films

A protective plate for a plasma display includes conductive substrate for protecting a plasma display and an electrode in electrical contact with the conductive substrate.

A light absorptive antireflector provided with a titanium oxy-nitride film having a geometrical film thickness of from 5 to 25 nm, wherein O/Ti (atomic ratio)&equals;0.11 to 0.33, and a film composed mainly of silica and having a geometrical film thickness of from 70 to 130 nm, and a process for its production.

Light absorptive antireflector and process for its production

A light absorptive antireflector comprising a substrate, and a first layer of a light absorptive film, a second layer made of a material which has slight absorption within a visible light region and a third layer made of a material which has a refractive index smaller than 1.55, sequentially formed on the substrate, which has an adequate low reflection performance within a wide range of a wavelength region and which has an electromagnetic shielding ability and a low luminous transmittance suitable for improving the contrast of a display, has freeness in transmittance and reflection color and is excellent also in the productivity, and a method for its production.

Light absorption antireflective body and method of producing the same

A sputtering target comprising a substrate and a target material formed on the substrate, wherein the target material comprises a metal oxide of the chemical formula MO as the main component, wherein MO is a metal oxide which is deficient in oxygen as compared with the stoichiometric composition, and M is at least one metal selected from the group consisting of Ti, Nb, Ta, Mo, W, Zr and Hf, a process for its production, and a method for forming a film having a high refractive index.

Target and process for its production, and method for forming a film having a high refractive index

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Yokohama, Japan

Takuji Oyama