Daikin Industries, Ltd.

Daiki Industries, Ltd.

Takuji Ishikawa

Takayuki Araki

Takahiro Kitahara

Kazunobu Uchida

Tomoyuki Fukatani

Meiten Koh

Takashi Iguchi

Toshiki Ichisaka

Nobuhiko Tsuda

Katsuhiko Imoto

Akinori Yamamoto

Norimasa Uesugi

Takuji Kume

Tetsuo Shimizu

Hirokazu Aoyama

Yoshito Tanaka

Taku Yamanaka

Masayoshi Tatemoto

Manabu Fujisawa

Tadashi Ino

Kenji Ichikawa

Junpei Terada

Takuya Arase

Tetsuhiro Kodani

Yoshihiro Yamamoto

Kenji Ishii

Akira Chida

Hidenori Ozaki

Yoshinari Fukuhara

Atsuko Tanaka

An aqueous dispersion containing a particulate resin composite that contains a fluorine-containing resin and an inorganic polymer. The fluorine-containing resin contains a hydrolyzable silyl group-containing unsaturated monomer unit.

Aqueous dispersion, coating film, coated article, and method for producing aqueous dispersion

Provided is an aqueous dispersion capable of providing a coating film excellent in solvent resistance, stain resistance, and adhesion to a base material. The invention relates to an aqueous dispersion including a particulate polymer composite; a polyisocyanate compound; and water. The particulate polymer composite includes a fluoropolymer (A) and an acrylic polymer (B). Either or both of the fluoropolymer (A) and the acrylic polymer (B) contain a hydroxyl group and a hydrolyzable silyl group.

Aqueous dispersion, coating film, and coated article

The present invention aims to provide an electrode mixture which shows little change in viscosity even after 24 hours from the preparation of the mixture and enables production of an electrode having a high electrode density and excellent flexibility and is capable of giving excellent electric properties to the resulting cell. The present invention relates to an electrode mixture including a powdery electrode material; a binder; and an organic solvent, the binder including a fluorine-containing polymer including a polymer unit based on vinylidene fluoride and a polymer unit based on tetrafluoroethylene, the fluorine-containing polymer including the polymer unit based on vinylidene fluoride in an amount of 80.0 to 89.0 mol % based on all the polymer units, and the organic solvent being N-methyl-2-pyrolidone and/or N,N-dimethylacetamide.

Electrode mixture

The present invention aims to provide an electrode mixture which shows little change in viscosity even after 24 hours from the preparation of the mixture and enables production of an electrode having a high electrode density and excellent flexibility and is capable of giving excellent electric properties to the resulting cell. The present invention relates to an electrode mixture including a powdery electrode material; a binder; and an organic solvent, the binder including polyvinylidene fluoride and a fluorine-containing polymer including a polymer unit based on vinylidene fluoride and a polymer unit based on tetrafluoroethylene, the fluorine-containing polymer including the polymer unit based on vinylidene fluoride in an amount of 80.0 to 90.0 mol % based on all the polymer units, the polyvinylidene fluoride having a number average molecular weight of 150,000 to 1,400,000.

A binder, including a fluoropolymer, the fluoropolymer including a polymerization unit based on vinylidene fluoride and a polymerization unit based on a monomer having an amide group represented by &#x2014;CO&#x2014;NRR' (R and R&#x2032; are the same as or different from each other and each represent a hydrogen atom or an alkyl group optionally having a substituent group) or an amide bond represented by &#x2014;CO&#x2014;NR&#x2033;&#x2014; (R&#x2033; represents a hydrogen atom, an alkyl group optionally having a substituent group, or a phenyl group optionally having a substituent group) and having a solution viscosity of 10 to 20,000 mPa&#xb7;s. Also disclosed is a positive electrode mixture and a negative electrode mixture containing the binder, a positive electrode, a negative electrode and a lithium ion secondary cell.

Binder, cathode mixture and anode mixture

The present invention provides an organosol composition that is stable even in the case that the PTFE particle content is high. The present invention relates to an organosol composition of PTFE particles, comprising PTFE particles (A), a polymer (B), and an organic solvent (S), wherein (1) the polymer (B) is soluble in the organic solvent (S), (2) the amount of the PTFE particles (A) is not lower than 50% by mass of the total amount of the PTFE particles (A) and the polymer (B), and (3) the precipitation ratio of the PTFE particles after 48 hours is not higher than 60% when the total solids concentration of the PTFE particles (A) and the polymer (B) is 5% by mass.

Organosol composition of fluorine-containing polymer

The present invention provides a simple and efficient process for producing 2,3,3,3-tetrafluoropropene(HFC-1234yf), the process being useful for industrial production. More specifically, the present invention relates to:

Process for producing 2,3,3,3-tetrafluoropropene

The invention provides a fluoroethercarboxylic acid which is represented by the general formula (I):RfOCHFCFORfCOOM&#x2003;&#x2003;(I)wherein Rfrepresents a partially or fully fluorinated alkyl group, which may optionally be interrupted with one or more oxygen atoms, Rfrepresents a partially or fully fluorinated alkylene group, which may optionally be interrupted with one or more oxygen atoms, and M represents a monovalent alkali metal, NHor H. The fluoroethercarboxylic acid can be suitably used as a surfactant and is low in bioaccumulation. The invention is also a method of fluoropolymer production and an aqueous fluoropolymer dispersion, using the fluoroethercarboxylic acid as a surfactant.

Fluoroethercarboxylic acid and production method thereof, surfactant, method of producing fluoropolymer and aqueous dispersion used thereof

There are provided a novel norbornene derivative which is a material for a chemically amplifying type photoresist for Flaser, possesses excellent transparency and improved dry etching resistivity and has a fluorine-containing ketone unit or fluorine-containing tertiary alcohol unit directly bonded to the norbornene backbone; a fluorine-containing polymer obtained by using the norbornene derivative as a copolymerizable monomer; and a chemically amplifying type photoresist composition comprising the fluorine-containing polymer, a photoacid generator and a solvent.

Process for preparing fluorine-containing norbornene derivative

A fluorine-containing unsaturated cyclic compound represented by the formula (1)(a): wherein Zare the same or different and each is &#x2014;Rf-Z, in which Zis at least one functional group selected from the group consisting of OH group, COOH group, a derivative of carboxylic acid group and a functional group protected by a protective group which can convert the functional group to OH group by reaction with an acid; Rfis a fluorine-containing alkylene group which has 1 to 30 carbon atoms and may have ether bond; nis an integer of from 1 to 4.

Fluorine-containing polymer, resist composition prepared from same and novel fluorine-containing monomer

The present invention provides a process for producing a fluorinated ionomer, comprising copolymerizing, in the presence of a polymerization initiator, (i) a compound represented by Formula (I)(M)OSOCFY(CF)O(CFXCFO)CF&#x2550;CF&#x2003;&#x2003;(I)wherein M is H or a metal with a valence of L (L is 1, 2 or 3), X is F, Cl or CF, Y is halogen, m is 1 to 5, and n is 0 to 5, (ii) tetrafluoroethylene and (iii) at least one third monomer selected from the group consisting of hexafluoropropylene, chlorotrifluoroethylene, vinylidene fluoride, CF&#x2550;CFORf (Rf is Cto Cperfluoroalkyl) and ethylene. The present invention further provides a method for purifying and concentrating a fluorinated ionomer, comprising ultrafiltration or dialysis of a fluorinated ionomer solution or dispersion, and a method for forming a film of the fluorinated ionomer.

Process for producing fluoroionomer, method for purification and concentration of the ionomer, and method of film formation

There is provided a method of forming a fine pattern by using a practicable fluorine-containing polymer which has a high transparency to exposure light having a short wavelength such as Flaser and can undergo resolution of a fine pattern. The method comprises (I) a step for preparing a fluorine-containing polymer (A) having OH group which has a structural unit derived from a fluorine-containing norbornene derivative having OH group, (II) a step for preparing a fluorine-containing polymer (B) having a protective group by reacting a compound represented by X&#x2014;CHOR, wherein X is Cl, Br or I; R is a hydrocarbon group having 1 to 30 carbon atoms in which a part or the whole of hydrogen atoms may be substituted with fluorine atoms, with the above-mentioned fluorine-containing polymer (A) having OH group in the presence of a base, (III) a step for preparing a resist composition comprising (a) the above-mentioned fluorine-containing polymer (B) having a protective group, (b) a photoacid generator and (c) a solvent, (IV) a step for forming a resist film comprising the above-mentioned resist composition on a substrate or on a given layer on the substrate, (V) a step for exposing by selectively irradiating a given area of the resist film with energy rays, and (VI) a step for subjecting the exposed resist film to developing to selectively remove the exposed portion of the resist film, thus forming a fine pattern.

Process for preparing fluorine-containing polymer and method of forming fine pattern using same

There is provided a fluorine-containing copolymer having an aliphatic monocyclic structure in the polymer trunk chain which has a number average molecular weight of from 500 to 1,000,000 and is represented by the formula (Ma):-(M1)-(M2)-(N)&#x2014;&#x2003;&#x2003;(Ma)in whichthe structural unit M1 is a structural unit derived from an ethylenic monomer having 2 or 3 carbon atoms and at least one fluorine atom, the structural unit M2a is at least one structural unit which introduces an aliphatic monocyclic structure in the polymer trunk chain and is represented by the formula (a): wherein Ris at least one hydrocarbon group selected from the group consisting of a divalent hydrocarbon group having 1 to 8 carbon atoms and constituting a ring which may be further substituted with a hydrocarbon group or a fluorine-containing alkyl group and a divalent hydrocarbon group having ether bond which has the sum of carbon atoms and oxygen atoms of 2 to 8, constitutes a ring and may be further substituted with a hydrocarbon group or a fluorine-containing alkyl group; Ris an alkylene group which has 1 to 3 carbon atoms and constitutes a ring; Rand Rare the same or different and each is a divalent alkylene group which has 1 or 2 carbon atoms and constitutes a ring; n1, n2 and n3 are the same or different and each is 0 or 1, the structural unit N is a structural unit derived from a monomer copolymerizable with the monomers to introduce the structural units M1 and M2a, andthe structural units M1, M2a and N are contained in amounts of from 1 to 99% by mole, from 1 to 99% by mole and from 0 to 98% by mole, respectively. The fluorine-containing polymer possesses excellent dry etching resistance and transparency in a vacuum ultraviolet region.

There is provided a novel fluorine-containing polymer having an acid-reactive group which has a high transparency against energy rays (radioactive rays) in a vacuum ultraviolet region (157 nm), and further there are provided a material for fluorine-containing base polymer prepared from the polymer and suitable for a photoresist and a chemically amplifying type resist composition obtained therefrom. The polymer has a number average molecular weight of from 1,000 to 1,000,000 and represented by the formula: &#x2014;(M1)&#x2014;(M2)&#x2014;(A)&#x2014;, wherein M1 is a structural unit having an acid-labile or acid-degradable functional group, M2 is a structural unit of fluorine-containing acryl ester, A is a structural unit derived from other copolymerizable monomer, the percent by mole ratio M1/M2 is 1 to 99/99 to 1 and the polymer comprises from 1 to 99% by mole of the structural unit M1, from 1 to 99% by mole of the structural unit M2 and from 0 to 98% by mole of the structural unit A1. The material for fluorine-containing base polymer comprises a fluorine-containing polymer having an acid-reactive group such as the above-mentioned polymer and is suitable for a photoresist, and the chemically amplifying type resist composition is obtained from those polymer and material.

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Settsu, Japan

Takuji Ishikawa