Ushio Denki Kabushiki Kaisha

Energetiq Technology, Inc.

Energetio Technology, Inc.

Engergetiq Technology, Inc.

Taku Sumitomo

Yukio Yasuda

Toshio Yokota

Hironobu Yabuta

Masaki Inoue

Kiyoyuki Kabuki

Makoto Kimura

Tatsumi Hiramoto

Masaki Kato

Kyohei Seki

Masaki Yoshioka

Akimichi Morita

Tatumi Hiramoto

A light source device that irradiates a discharge vessel with a laser beam to produce radiant light that is reflected by an ellipsoidal reflecting surface efficiently utilizes the light produced by directing the laser beam through an unirradiated region where reflected light from the ellipsoidal reflector is blocked by the discharge vessel, through an opening side of the ellipsoidal reflector to the discharge vessel. The discharge vessel has an emission substance enclosed inside which is excited by the laser beam and produces radiant light, is arranged at a focal point of the ellipsoidal reflector. A planar mirror, with which radiant light reflected by the ellipsoidal reflector is reflected in a different direction has a window in an unirradiated region where reflected light from the ellipsoidal reflector is blocked by the discharge vessel through which the laser beam passes to the discharge vessel.

Light source device

A phototherapy device using excimer radiation in which, by skillful use of the individual peak wavelength of 308 nm and of the emission range of shorter wavelengths than 308 nm, the therapy effect is enhanced, and in which, at the same time, harm can be reduced is achieved using a XeCl excimer lamp and in which diseased sites of skin disorders are irradiated with UV-B radiation with an optical filter being used for changing the spectral shape of the UV-B radiation with which the diseased sites are irradiated.

Phototherapy apparatus using excimer radiation

A method of lighting a light source apparatus that has a discharge lamp, a reflection mirror for reflecting light emitted from the discharge lamp, a light emission optical system for irradiating a work piece with light, one or more laser oscillator for emitting a laser beam to the discharge lamp, and a discharge starting unit for starting discharge. The method includes removing deposits adhering to an inner face of the discharge lamp by irradiating a discharge vessel with the laser beam from the first laser oscillator, starting discharge in the discharge vessel by the discharge starting unit, and condensing the laser beam from a second laser oscillator, into the discharge vessel.

Lighting method of light source apparatus

In a light source device provided with a light emission tube in which a light emitting element is enclosed and at least one laser oscillator part for radiating a laser beam towards said light emission tube, for focusing a beam within a light emission tube with a large solid angle and for preventing that the beam with a high energy density impinges upon the wall of the light emission tube, the light emission tube has a tube wall, part of which is made to function as a focusing means, or the light emission tube has a focusing means at the inner surface thereof.

An exposure device for producing semiconductors and liquid crystals has an optical system capable of effectively using light generated without making a hole in a lamp discharge vessel when high energy laser light is supplied to it for emitting light, such as ultraviolet light. The exposure device has a light source for emitting ultraviolet light, a laser device for emitting laser light, an elliptical reflector for reflecting ultraviolet light emitted from the light source, and an optical system for directing light reflected by the elliptical reflector to an article to be treated via optical elements including a collimator lens and an integrator lens, and a beam splitter having a wavelength selecting ability provided in the optical path for light reflected by the elliptical reflector to allow laser light to be incident on the light source from and opening side of the elliptical reflector.

Exposure device

An laser driven light source comprises a bulb that encloses a discharge medium, a laser beam unit for emitting a laser beam, wherein the laser beam is focused in the bulb for generating a discharge, and a beam shield element that is provided in the bulb to shield peripheral devices from the laser beam, which passes through the discharge generated in the bulb.

Laser driven light source

A light source is provided. The light source includes: an elliptical reflection mirror having first and second focal points; a discharge chamber in which a luminescent substance is enclosed and which is disposed on the first focal point; a laser light generator which emits the laser light; and a laser light guide which guides the laser light from an opening side of the elliptical reflection mirror into the discharge chamber. The luminescent substance is excited by providing the laser light to the luminescent substance so as to emit light, and the light is reflected by the elliptical reflection mirror. The laser light guide is disposed in a shade area in which the light reflected by the elliptical reflection mirror is blocked by the discharge chamber.

Light source

An extreme UV radiation producing device in which adhesion of solid tin in the vacuum pump of an evacuation device is restricted, so that the maintenance period and the replacement period of the pump is prolonged is achieved by the provision of a treatment unit between a radiation source chamber and the evacuation device. The treatment device has a hydrogen radical producing part in which tin and/or a tin compound in the evacuated gas from the radiation source chamber is/are made into a tin hydride; and a heat treatment part in which the tin hydride is thermally decomposed and in which the tin produced liquefied and separated from the evacuated gas. The liquid tin is fed into a collecting/storage vessel and the evacuated gas from which the tin and/or a tin compound has been removed fed to the evacuation device.

Device for producing extreme UV radiation

To suppress the adherence of debris as a result of a radiating fuel, such as tin or the like, within a vessel for forming high density and high temperature plasma of an extreme UV radiation source device, and to eliminate deposited tin and/or tin compounds with high efficiency, hydrogen radical producing parts are provided in the vessel; and hydrogen radicals are produced in the vessel so that deposition of tin and/or a tin compound is suppressed in the area with a low temperature of the device, such as a focusing mirror or the like, and the deposited tin and/or tin compound is eliminated.

Growing community of inventors

Himeji, Japan

Taku Sumitomo