Ckd Corporation

Tokyo Electron Limited

Takeya Inagaki

Tsuneyuki Okabe

Yoji Mori

Akihito Sugino

A gas supply unit is configured such that when a first gas whose temperature has been controlled at a first temperature is supplied to a chamber through an upper device and then a second gas which starts a chemical reaction at a reaction start temperature lower than the first temperature is supplied to the chamber through the upper device, before cleaning gas is supplied to the chamber through the defined between a base plate and the upper device to cool the upper device down to the reaction start temperature or lower.

Gas supply unit and gas supply method

To provide a purge gas unit and a purge gas supply integrated unit having a smaller foot space, the purge gas unit comprises an input block for input of purge gas into the purge gas unit, the input block including a purge passage formed through the input block to provide an opening in a side surface of the input block and an input passage formed branching off from the purge passage; an output block for output of the purge gas from the purge gas unit; a communication block connected to the input block and the output block to provide communication between the input block and the output block.

Growing community of inventors

Kasugai, Japan

Takeya Inagaki