Kansai Paint Company, Ltd.

Takeya Hasegawa

Genji Imai

Hideo Kogure

Chiaki Iwashima

A composition for activation energy rays comprising a specific vinyl ether group-containing compound (A) in which a vinyl ether group is bonded to a secondary or tertiary carbon atom, a polymer (B) having a carboxyl group and/or a hydroxyphenyl group, and a photo-acid generator compound (C) can form a resist pattern having an excellent sensitivity without carrying out any heat treatment at a temperature of 60&#xb0; C. or more after irradiation.

Composition for activation energy rays and method of forming pattern

A method of forming a resist pattern film. A positive type actinic ray decomposing and developing dry film is applied onto a surface of a coating substrate so that the surface of the coating substrate may face to the urethane resin layer of the dry film. Then, the dry film may be heat treated. The non-actinic ray-curable substrate of the dry film, then, is optionally stripped, and is heat treated if it has not already been heat treated. Then, an actinic ray is irradiated through a mask or directly onto the surface of the dry film so as to obtain an intended pattern and is optionally heat treated. The non-actinic ray-curable substrate which was not previously stripped is, then, stripped. Then, the positive type actinic ray-curable urethane resin layer is subjected to a developing treatment. Finally, an unnecessary area of the urethane resin layer to form a resist pattern film is removed.

Positive type actinic ray-curable dry film and pattern-forming method by use of the same

A positive type actinic ray-curable (dry film having, on the surface of a non-actinic ray-curable substrate, a solid positive type actinic ray-curable urethane resin layer formed from (1) a resin composition containing, as essential components, (A ) an ether linkage-containing olefinicaly unsaturated compound, (B ), an acid group-containing urethane resin having a weight average molecular weight of 1,000 to 200,000 and an acid group content in the range of 0.5 to 10 equivalents per one kg of the resin, and (C) a photo-acid generator; (2) a resin composition containing, as essential components, (A ) an ether linkage-containing, polyurethane based, olefinicaly unsaturated Compound, (B ) at least one resin selected from the group consisting of (a) a carboxyl group and hydroxyphenyl group-containing polymer, (b) a carboxyl group-containing polymer and (c) a hydroxyphenyl group-containing polymer, and (C) a photo-acid generator; or (3) a resin composition containing, as essential components, (A ) an ether linkage-containing, polyurethane based, olefinicaly unsaturated compound, (B ) an acid group-containing urethane resin having a weight average molecular weight of 1,000 to 200,000 and an acid group content in the range of 0.5 to 10 equivalents per one kg of the resin, and (C) a photo-acid generator; and a method of forming a pattern by use of the dry film.

A positive type actinic ray-developable dry film having, on the surface of a nonactinic ray-developable substrate, a solid positive type actinic ray-developable urethane resin layer formed by coating and heat-crosslinking (1) a resin composition containing (A ) an unsaturated compound, (B ) an acid group-containing urethane resin and (C) a photo-acid generator, (2) a resin composition containing (A ) an unsaturated urethane based compound, (B ) at least one resin selected from the group consisting of (a) a carboxyl group and hydroxyphenyl group-containing polymer, (b) a carboxyl group-containing polymer and (c) a hydroxyphenyl group-containing polymer, and (C) a photo-acid generator, or (3) a resin composition containing (A ) an unsaturated urethane based compound, (B ) an acid group-containing urethane resin, and (C) a photo-acid generator. A method of forming a pattern therefrom.

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Kanagawa-ken, Japan

Takeya Hasegawa