Screen Holdings Co., Ltd.

Unitika Ltd.

Rohm Co., Ltd.

Shimadzu Corporation

Dainippon Screen Mfg. Co., Ltd.

Nippon Kayaku Kabushiki Kaisha

Takeshi Yoshida

Yoshiaki Echigo

Akira Shigeta

Nobuyuki Yamada

Yuki Yamada

Tatsuya Morikita

Kei Hayashi

Hiroaki Takahashi

Satoru Watanabe

Masahiro Sakuragi

Kazuki Inoue

Fuyuki Okamoto

Chihiro Yasui

Yosuke Sugimoto

Masahide Tanaka

Yuki Ishikawa

Makoto Uchida

Takashi Naiki

Yoshitsugu Uedaira

Hiroaki Kozawa

Hiroaki Sugimoto

Yoshihiro Tada

Toshinobu Yanagisawa

Takuya Kuroda

Junji Fujino

Yuichiro Nakata

Ryoichi Hasegawa

Hiroshi Kato

Tadashi Sasaki

Toshimitsu Namba

Yuji Katsuyama

Eiji Okuno

Atsushi Matsudaira

Koki Yamamoto

Minoru Noji

Kenji Amahisa

Jun-ichi Mori

Seiichi Hayashi

Teppei Kodama

Yuma Okabe

Okiyuki Kunihiro

Maki Fukui

Yasuo Kakude

Yoichi Hasegawa

Analysis control software is installed in an analysis control device. The analysis control software is the software for controlling an analysis device, and has a function of causing a display to display one or a plurality of operation images for receiving an operation for inspecting the analysis control software. In a validation device, operation commands for performing an operation on one or a plurality of operation images are sequentially generated by an inspection executor with the one or plurality of operation images displayed in the display, whereby an inspection is executed by the analysis control software.

Validation device, validation method and non-transitory computer readable medium

The automatic suitability determination system includes a check document storing part, a check document retrieving part, a determination test execution part, and a suitability determination part. The check document storing part stores suitability check documents. The check document retrieving part is configured to read out the suitability check document related to a determining target component of operational suitability from the check document storing part. The determination test execution part is configured to read information contained in the suitability check document read out by the check document retrieving part and to execute tests of suitability determination items specified in the suitability check document by making the determining target component of the operational suitability operate based on the information. The suitability determination part is configured to determine, based on results of the tests executed by the determination test execution part, suitability for the suitability determination items corresponding to the tests.

Automatic suitability determination system

An object is to provide a method for easily producing maleimide (MI) in which trace amounts of residual acid components as impurities in a crude MI are efficiently reduced, that is, the acid value is sufficiently reduced.

Production method of maleimide

A validation document while responding to a customer's demand is efficiently created. A server creates a first sample document upon receiving, from a terminal device, a request for creation of the first sample document including an inspection item targeted for a first device. The terminal device receives an operation of inputting the parameter value to the first sample document, and transmits the inputted parameter value to the server. The server creates a first validation document on the basis of the parameter value received from the terminal device and on the basis of the first sample document.

Document creation system, server, and method

A waveform processing assistance device includes an acquirer that acquires a plurality of waveform data obtained by an analysis of a sample, a selector that selects reference data among the waveform data, an extractor that extracts correct answer peaks and correct answer data from the reference data a determiner that determines each processing section including a correct answer peak and each parameter initial value, a waveform processor that performs waveform processing in each determined processing section based on each parameter initial value, an adjuster that generates a parameter adjustment value at which a waveform processing result obtained in each processing section matches or approximates corresponding correct answer data, and a program creator that creates a waveform processing execution program that includes an instruction to execute waveform processing using the parameter adjustment value in each processing section.

Waveform processing assistance device and waveform processing assistance method

A substrate processing apparatus includes a chamber body having an upper opening, a chamber lid part having a lower opening, and a shield plate arranged in a lid internal space of the chamber lid part. The radial dimension of the shield plate is greater than that of the lower opening. Covering the upper opening of the chamber body with the chamber lid part forms a chamber that internally houses a substrate. In the substrate processing apparatus, before the substrate is conveyed and the chamber is formed, the lid internal space of the chamber lid part is filled with the gas supplied from a gas supply part, in a state in which the shield plate overlaps with the lower opening. This allows the chamber to be quickly filled with the gas to achieve a desired low oxygen atmosphere after the formation of the chamber.

Substrate processing apparatus and substrate processing method

A substrate processing apparatus with efficient drying includes a chamber body having an upper opening, a chamber cover having a lower opening, and a shield plate disposed in a cover internal space of the chamber cover. With the upper opening of the chamber body covered by the chamber cover, a chamber is formed. In the cover internal space, a scanning nozzle for discharging a processing liquid toward a substrate is disposed and an inert gas is supplied and a gas is exhausted from the inside. When the processing liquid is supplied onto the substrate, the discharge part is disposed at a discharge position, and when the discharge part is dried while no processing liquid is supplied onto the substrate, the discharge part is disposed at a waiting position and the lower opening is closed by the shield plate.

Substrate processing apparatus

An object of the present invention is to provide a bismaleimide (D-BMI) modified product in which an amino group of dimer diamine (DDA) is maleimidized, which has the good heat resistance, and has the sufficiently enhanced processability, and a method for producing the same. There are provided:

Bismaleimide modified product and method for producing the same

A system for managing modular analyzing devices-includes: a meansfor acquiring the serial number of modules included in each analyzing device; a meansfor acquiring information on an expendable part included in each module; a storage sectionfor storing the acquired serial number and expendable-part information in the state of being associated with a system controller to which the module corresponding to the serial number is connected; a transfer detectorfor detecting a transfer of an operation module based on the serial numbers associated with each system controller; and an information managerfor changing the association of the expendable-part information in the storage section, from the state of being associated with the system controller on the giving end of the transfer, to the state of being associated with the system controller on the receiving end of the transfer, when the transfer is detected.

Analyzing device management system

A guard that receives a processing liquid removed off a substrate, is disposed so as to surround a substrate holding unit and a facing member in plan view. The guard forms, together with the substrate and the facing member having a facing surface facing an upper surface of the substrate, a space isolated from an ambient atmosphere. An inert gas supplying unit supplies an inert gas to the space to replace an atmosphere inside the space by the inert gas. A processing liquid supplying nozzle, which extends from an inner wall of the guard so as to be disposed inside the space in a state where the space is formed, supplies the processing liquid to the upper surface of the substrate.

A substrate processing apparatus with efficient drying includes a chamber body having an upper opening, a chamber cover having a lower opening, and a shield plate disposed in a cover internal space of the chamber cover. With the upper opening of the chamber body covered by the chamber cover, a chamber is formed. In the cover internal space, a scanning nozzle for discharging a processing liquid toward a substrate () is disposed and an inert gas is supplied and a gas is exhausted from the inside. When the processing liquid is supplied onto the substrate, the discharge part is disposed at a discharge position, and when the discharge part is dried while no processing liquid is supplied onto the substrate, the discharge part is disposed at a waiting position and the lower opening is closed by the shield plate.

In a substrate processing apparatus, gas is supplied from above a shield plate to a lid internal space within a chamber so that pressure in the lid internal space becomes higher than pressure in a chamber-body internal space and the gas in the lid internal space is sent to the chamber-body internal space. The gas flowing from the lid internal space is discharged through a body discharge port provided below a substrate in the chamber-body internal space. This forms a generally cylindrical current of gas in the chamber. The supply of processing liquids to an upper surface of the substrate is conducted on the inner side of the generally cylindrical current. This suppresses mists and fumes of processing liquids passing through the generally cylindrical current and entering into the lid internal space from the gap between the shield plate and the lid bottom part.

Growing community of inventors

Kyoto, Japan

Takeshi Yoshida