Hitachi Chemical Company, Ltd.

Takeshi Yoshida

Yasuo Kamigata

Ken Nanaumi

Susumu Konii

Tatsuya Uchida

Yukio Yoshimura

Hatsue Hiratsuka

Kohei Yasuzawa

Toyotaro Shinko

Yasushi Sugimoto

Kenzo Susa

Yoshitaka Minami

Masato Taya

Takehisa Yoshikawa

Masayuki Kyoi

Masahiko Itabashi

Toshikatu Shimazaki

Hidefumi Tsuboi

Naoto Okada

A transflective type liquid crystal display has display side members; rear side members which include a diffuse reflector layer with apertures, and a glass substrate; and a liquid crystal layer interposed between the display side members and the rear side members, wherein on the opposite side from the diffuse reflector layer, the glass substrate has aperture-forming lenses used for exposure and removal during formation of the apertures of the diffuse reflector layer, and a flattening layer used to flatten a concave and convex surface produced by the aperture-forming lenses. This makes it possible to implement a transflective type liquid crystal display with excellent visibility regardless of whether an external light or internal lighting source is used.

Method for producing apertures in a diffuse reflector layer having a metal reflection film

A lamination device for performing a lamination method for a dry film resist as a transfer layer, comprising a substrate transport part ( ), a substrate preheating part ( ), a lamination part ( ) and, ( ), an inter-substrate film processing part ( ), a film feed part ( ), a film accumulation part ( ), a base film continuous peeling part ( ), and a cover film continuous peeling part ( ), wherein a lamination is carried out by a pair of lamination rolls ( ) and ( ), part ( ) being transport rolls, a base film is peeled off from a substrate after lamination, a guide roll ( ) for peeling off the base film is located forward of the lamination rolls in the transport direction of the substrate, and the guide roll is free to move vertically or laterally, whereby an angle between a substrate surface and the base film being wound up, i.e., the peeling angle of the base film can be changed to any angle.

Device and method for lamination

Heat transmitting member and method of manufacturing the same

Method for producing porous bodies

An insulating film formed by a plasma CVD method at the substrate temperature of 350.degree. to 550.degree. C.l is good in electric properties and heat resistance without causing whitening phenomenon is suitable for use in a thin-film electroluminescent device.

Process for forming insulating film used in thin film electroluminescent

Internally plasticized phenolic resins suitable for use in preparing laminates and the like excellent in electrical properties, heat resistance, solvent resistance as well as punchability are produced by reacting a compound of the formula: ##STR1## wherein R.sub.1 is an alkylene residue having 1 to 3 carbon atoms; and R.sub.2 and R.sub.3 are independently hydrogen or a saturated or unsaturated hydrocarbon group having 1 to 3 carbon atoms, with an epoxidized vegetable oil with heating in the presence of one or more secondary and/or tertiary amines, and adding formaldehyde or one or more phenols and formaldehyde to the reaction system to further proceed the reaction.

Process for producing phenolic resins

Internally plasticized phenolic resins suitable for use in preparing laminates and the like excellent in electrical properties, heat resistance, solvent resistance as well as punchability are produced by reacting a phenol-formaldehyde resin containing less than 4% by weight of unreacted free monohydric phenol or phenols with an epoxidized vegetable oil, and if required with formaldehyde, with heating preferably in the presence of one or more secondary and/or tertiary amines.

Process for producing internally plasticized phenolic resins

Growing community of inventors

Tsukuba, Japan

Takeshi Yoshida