Asm Japan K.k.

Olympus Corporation

Teijin Limited

Japan Science and Technology Agency

Hamamatsu-photonics K.k.

Tokyo Institute of Technology

Nippon Roper Kk

Nippon Roper Co., Ltd.

Takeshi Watanabe

Takayuki Yamagishi

Masaei Suwada

Yataro Ichikawa

Yoshinori Iketaki

Masaaki Fujii

Akira Kudo

Toshio Suzuki

Yushi Nishimura

Kenichi Kimura

Makoto Igarashi

Hiroshi Miyajima

Yasunori Igasaki

Yoshihiko Sumi

Kimihisa Yamamoto

Hiroyoshi Yajima

Toshiyuki Takai

Satoshi Homma

Satoshi Nakamura

Takashige Omatsu

Masao Ono

Takae Yuasa

A medical apparatus includes a treatment device configured to be capable of treating a subject by applying energy to the subject, an optical fiber including a light emitting face for emitting light into the subject, the optical fiber being connected to the treatment device, and a shield portion that is disposed in front of the light emitting face of the optical fiber, the shield portion being configured to expose the light emitting face when the treatment device does not perform a treatment operation and to shield the light emitting face when the treatment device performs the treatment operation.

Medical apparatus

A super-resolution microscope includes an optical system for combining a part of a first coherent light from a first light source and a part of a second coherent light from a second light source and focusing the coherent lights onto a sample, scanning , unit for scanning the coherent lights, and a detecting unit for detecting an optical response signal from the sample. The microscope is configured so as to satisfy the following conditions:&#x3c3;Ip&#x3c4;&#x2266;1, and0.65(&#x3bb;)&#x2266;&#x3c4;&#x3c3;

Super-resolution microscope

A wafer transfer apparatus includes: (A) a mini environment that connects to a wafer storage part and a load lock chamber and is equipped with a transfer robot inside, in order to transfer wafers between the wafer storage part and load lock chamber in the presence of air flows; and (B) a cooling stage that opens and connects to the mini environment from the outside of the mini environment in the vicinity of the connection port of the load lock chamber, in order to temporarily hold a wafer so that the wafer is cooled by the air taken in from the mini environment.

Semiconductor-manufacturing apparatus equipped with cooling stage and semiconductor-manufacturing method using same

A three-dimensional analyzing device includes a first beam source for generating a first beam, a second beam source for generating a second beam, an optical system for spatially overlapping the first and second beams at least partly and irradiating the beams onto a specimen to three-dimensionally confine a photoactive region in a specimen, and a photo acceptance element for accepting a response light emitted from the photoactive region. Preferably, the device further includes an operation unit for calculating a correlation function of a response light in the time domain based on the output of the photo acceptance element to analyze a desired physical value of the specimen.

Three dimensional analyzing device

The present invention provides an experimental model animal which does not develop anaphylaxis, a type I allergy, can specifically induce Arthus reaction, a type III allergy, is not affected by type I allergy and evaluates type III allergy inflammation individually, and a method of screening a reaction accelerating or inhibitory substance in a type III allergy reaction through Fc&#x3b3;RIII by using said experimental model animal. In order to eliminate Fc&#x3b3;RIIB that demonstrates suppressive action to response through Fr&#x3b3;RIII, a mouse wherein the deletion mutation of both molecules of Lyn and Fc&#x3b3;RIIB are homozygotic (LynIIB) was generated by mating Lyn knockout mouse (Lyn) and Fc&#x3b3;RIIB knockout mouse (Fc&#x3b3;RIIB), and was used to measure and evaluate the deficiency of Fc&#x3b3;RIII function in systemic passive anaphylaxis and the reduction of Fc&#x3b3;RIII function in a bone marrow-derived mast cell, or the like.

Type III allergic inflammation model animal

A microscope capable of being shaped into a beam with complete hollow shape by removing the disorder of the wavefront to the erase light, particularly, and capable of improving the spatial resolution by inducing a super-resolution near the limit, is provided. In the microscope, wherein a first light to excite a molecule from a ground-state to first electron excited state or a second light to excite the molecule from the first electron excited state to the second electron excited state with higher energy level, for a sampleincluding the molecule with three electronic states including at least a ground-state, are spatial phase-modulated into the prescribed beam shape, and parts of these first light and the second light are overlapped and focused to detect luminescence from the sample, a wavefront compensation meansis provided in the optical path of the first light and/or in the optical path of the second light, and the wavefront aberration caused in the first light and/or in the second light, is removed by the wavefront compensation means

Microscope with wavelength compensation

Semiconductor processing equipment that has increased efficiency, throughput, and stability, as well as reduced operating cost, footprint, and faceprint is provided. Other than during deposition, the atmosphere of both the reaction chamber and the transfer chamber are evacuated using the transfer chamber exhaust port, which is located below the surface of the semiconductor wafer. This configuration prevents particles generated during wafer transfer or during deposition from adhering to the surface of the semiconductor wafer. Additionally, by introducing a purge gas into the transfer chamber during deposition, and by using an insulation separating plate, the atmospheres of the transfer and reaction chambers can be effectively isolated from each other, thereby preventing deposition on the walls and components of the transfer chamber. Finally, the configuration described herein permits a wafer buffer mechanism to be used with the semiconductor processing equipment, thereby further increasing throughput and efficiency.

Semiconductor processing apparatus comprising chamber partitioned into reaction and transfer sections

The equipment comprises a semiconductor-processing device in which a load-lock chamber, a transfer chamber and a reaction chamber are modularized into, a main frame, a stand-alone chamber frame on which the semiconductor-processing device is placed, a sliding mechanism for enabling attaching/removing of the chamber frame to/from the main frame smoothly, and a positioning mechanism for fixing a position of the chamber frame. This enables the processing device to be attached and removed at will. The method comprises pulling out from the main frame the chamber frame, on which the modularized semiconductor-processing device is placed; forming a maintenance space inside the main frame; maintaining the semiconductor-processing device and peripherals attached in the vicinity of the main frame, and putting the chamber frame with the processing device back into the main frame.

Semiconductor manufacturing equipment and maintenance method

Semiconductor processing equipment that has increased efficiency, throughput, and stability, as well as reduced operating cost, footprint, and faceprint is provided. Other than during deposition, the atmosphere of both the reaction chamber and the transfer chamber are evacuated using the transfer chamber exhaust port, which is located below the surface of the semiconductor wafer. This configuration prevents particles generated during wafer transfer or during deposition from adhering to the surface of the semiconductor wafer. Additionally, by introducing a purge gas into the transfer chamber during deposition, and by using an insulation separating plate 34, the atmospheres of the transfer and reaction chambers can be effectively isolated from each other, thereby preventing deposition on the walls and components of the transfer chamber. Finally, the configuration described herein permits a wafer buffer mechanism to be used with the semiconductor processing equipment, thereby further increasing throughput and efficiency.

A compact single-wafer-processing semiconductor-manufacturing apparatus for processing semiconductor substrates is characterized in that at least two units, each of which comprises a reactor for growing a film on a semiconductor substrate and a load lock chamber for having the semiconductor substrate wait in a vacuum and which is directly connected with the reactor via a gate valve, are modularized and these modularized reactor units can be configured as a cluster through an atmospheric front end (AFE). Inside the load lock chamber, a substrate transfer mechanism comprising a thin link arm for transferring a semiconductor substrate into the reactor is provided.

Semiconductor processing module and apparatus

The present invention provides an enhancer DNA segment, a gene fragment having (a) the enhancer DNA segment and (b) a structural gene such as human D, V and J gene, and a promoter. A hybrid DNA (1) having a phage DNA fragment from Charon 4A phage vector and human DNA fragments, a Charon 4A phage containing the hybrid DNA (1), a hybrid DNA (2) having a PBR322 fragment and human DNA fragment, a transformant of E. coli C600 strain transformed with the hybrid DNA (2), plasmid pSV2-H1G1 obtained by inserting a human DNA fragment into a vector pSV-2gpt, a transformant of E. coli MC 1000 strain transformed with the plasmid pSV2-H1G1 and a transformant of mouse myeloma cells J558L or NS-1 transformed with the plasmid pSV2-H1G1 are also provided.

Human immunoglobulin and enhancer gene fragments

A mouse-human chimaeric immunoglobulin heavy chain comprising (a) the amino acid sequence of a mouse immunoglobulin heavy chain variable region and (b) the amino acid sequence of a human immunoglobulin heavy chain constant region and reacting specifically with human common acute lympohocytic leukemia antigen and a chimaeric DNA fragment which encodes the amino acid sequence of the above mouse-human chimaeric immunoglobulin heavy chain.

Mouse-human chimaeric immunoglobulin heavy chain specific for the call

A DNA sequence comprising a polynucleotide segment consisting of a DNA sequence (A) shown below and a DNA sequence complementary thereto: ##STR1## wherein A represents deoxyadenosine-5'-phosphate, C represents deoxycytidine-5'-phosphate, G represents deoxyguanosine-5'-phosphate, and T represents deoxythymidine-5'-phosphate. The DNA sequence provided by this invention is derived from a rearranged immunoglobulin heavy chain variable (V.sub.H) region gene taken from the mouse hybridoma NL-1 cells which produce an antibody capable of commonly recognizing surface antigens of various human acute lyphocytic leukemia cells. Accordingly, if, for example, it is combined with a heavy chain constant (C.sub.H) region gene, a heavy chain can be produced which can recognize commonly various human acute lymphocytic leukemia cells in combination with a proper light chain. This would serve for the diagnosis and treatment of human acute lymphocytic leukemia.

Growing community of inventors

Tama, Japan

Takeshi Watanabe