Rigaku Corporation

Nec Corporation

Takeshi Osakabe

Tetsuya Ozawa

Kazuhiko Omote

Licai Jiang

Boris Verman

Yuriy Platonov

Toru Mitsunaga

Kazuki Omoto

Provided is an X-ray analysis apparatus including: a goniometer; a sample stage provided at a rotation center of the goniometer; an X-ray source configured to irradiate a sample with an X-ray, the sample being fixed on the sample stage; an X-ray detector configured to detect the X-ray diffracted by the sample; and an opening/closing mechanism configured to vary a width of a slit, which is formed between a pair of shielding members, by opening/closing the pair of shielding members, the opening/closing mechanism including an asymmetric control unit configured to control aperture widths of the pair of shielding members asymmetrically for one of the pair of shielding members on one side and another one of the pair of shielding members on another side depending on a rotation angle of the goniometer.

X-ray analysis apparatus

Provided is an X-ray analysis apparatus including: a goniometer including an incident-side arm extending in a first direction, a fixing portion, and a receiving-side arm; an X-ray source portion, which is arranged on the incident-side arm and generates an X-ray source extending in a second direction, which crosses the first direction; a support base, which is arranged on the fixing portion, and is configured to support a sample; a parallel slit, which is arranged on the fixing portion, and is configured to limit a line width along the second direction of the X-ray source generated by the X-ray source portion; and a detector, which is arranged on the receiving-side arm, and is configured to detect a scattered X-ray generated by the sample.

An X-ray diffraction apparatus including an X-ray detector that is configured to detect diffracted X-rays diffracted from a sample when a surface of the sample is irradiated with X-rays, a counter arm which rotates around a rotation center axis set within the surface of the sample while the X-ray detector is installed on the counter arm, and a plate-like X-ray shielding member that is installed on the counter arm and rotated together with the X-ray detector.

X-ray diffraction apparatus

An X-ray generator includes: a line X-ray source; a multilayer film mirror; and a side-by-side reflecting mirror including two concave mirrors joined together so as to share a join line. A cross section of a reflecting surface of the multilayer film mirror has a parabolic shape, and a focus of the parabolic shape is located at the line X-ray source. Cross sections of reflecting surfaces of the two concave mirrors of the side-by-side reflecting mirror each have a parabolic shape, and each of focuses of the parabolic shapes is located on a side opposite to the multilayer film mirror. An extended line of the join line of the side-by-side reflecting mirror passes through the multilayer film mirror and the line X-ray source as viewed in a plan view.

X-ray generator and x-ray analysis device

An X-ray diffraction apparatus includes: an X-ray source (); a first incident path letting the generated X-ray beam pass therethrough; a second incident path letting the generated X-ray beam be reflected by a multilayer film mirror and letting the reflected X-ray beam pass therethrough in parallel with the X-ray beam having passed through the first incident path. A movement mechanism is provided moving the X-ray source () between the first incident path and the second incident path while preserving respective relative positions thereof. An incident slit () allows an X-ray beam to be incident on a sample S pass therethrough; and a sample support stage () supports the sample S at a position fixed relative to the incident slit ().

Only X-rays having a specific wavelength, selected from a group of focusing X-rays diffracted from a sample, are reflected from a monochromator based on a Bragg's condition, passed through a receiving slit and detected by an X-ray detector. The monochromator is configured to be freely removable, and arranged between the sample and a focal point at which the wavelength-selected focusing X-rays diffracted from the sample are directly focused. At this time, the monochromator is moved so as to position the monochromator as close to the focal point as possible. The monochromator comprises a multilayer mirror having an internal interplanar spacing, wherein said internal interplanar spacing varies continuously from one end of the monochromator to the other end.

X-ray diffractometer with multilayer reflection-type monochromator

A bus controller connects to external devices having both a separate-type bus interface and a multiplexed-type bus interface simultaneously by providing a dedicated address terminal and a time-division-multiplexed address/data terminal in the same bus controller. A selector connects a first address bus (A0 through A7) to the combined address/data terminal. Additionally, the first address bus is connected to the dedicated address bus terminal. Hence, the bus controller can interface with external devices designed for either type of terminal without requiring an adapter.

Data processor having bus controller

A microcomputer includes a selector group, a priority control circuit and a CPU. The selector group selects an interrupt request signal from among interrupt request signals to be inputted thereto for every priority level in accordance with an input control data. The priority control circuit determines an interrupt request signal having the highest priority level from among the selected interrupt request signals for the priority levels and generating an interrupt signal. The CPU outputs the control data to the selector group and executes an interrupt processing corresponding to the interrupt request signal having the highest priority level.

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Tokyo, Japan

Takeshi Osakabe