Hitachi Chemical Company, Ltd.

Takeshi Oohashi

Atsushi Takahashi

Tomoaki Shibata

Masatoshi Yamaguchi

Chikara Ishikawa

The invention provides an optical waveguide including a resin substrate containing an inorganic filler, and at least a UV-absorbing layer, a lower cladding layer, a patterned core layer, and an upper cladding layer laminated above the resin substrate in this order, wherein the core layer has been patterned through light exposure and development, and the UV-absorbing layer has a thickness of 10 to 50 &#x3bc;m, and a method for producing an optical waveguide, including a step of forming a UV-absorbing layer on a resin substrate containing an inorganic filler; a step of forming a lower cladding layer on the UV-absorbing layer; a step of forming a core layer on the lower cladding layer; a step of subjecting the core layer to light exposure to thereby transfer a pattern having a given shape to the core layer; a step of developing the core layer to thereby form a core pattern; and a step of forming an upper cladding layer on the patterned core layer. According to the present invention, an optical waveguide having a high-resolution core pattern can be produced.

Optical waveguide and method for manufacturing the same

A photosensitive resin composition comprising (A) a carboxyl group-containing binder polymer which contains styrene or a styrene derivative as a copolymerized constituent, (B) a photo-polymerization initiator, and (C) a photo-polymerizable compound which has in its molecule at least one polymerizable ethylenically unsaturated bond and comprises a compound represented by the general formula (I)wherein Ris a hydrogen atom or a methyl group, A is an alkylenoxy group, Zis a halogen atom, an alkyl group, a cycloalkyl group, an aryl group, an amino group, an alkylamino group, a dialkylamino group, a nitro group, a cyano group, a mercapto group, an alkylmercapto group, an allyl group, a hydroxyalkyl group, a carboxyalkyl group, an acyl group, an alkoxy group or a group containing an heterocyclic group, m is an integer of 4 to 20, and n is an integer of 0 to 5.

Photosensitive resin composition, photosensitive element using the same, process for producing resist pattern, and process for producing printed wiring board

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Ibaraki, Japan

Takeshi Oohashi