Gigaphoton Inc.

Komatsu Corporation

Takeshi Ohta

Osamu Wakabayashi

Hiroaki Tsushima

Takahito Kumazaki

Tooru Abe

Takashi Matsunaga

Masanori Yashiro

Keisuke Ishida

Hiroshi Furusato

Akihiko Kurosu

Hiroyuki Masuda

Masato Moriya

Toru Suzuki

Shinji Nagai

Tatsuo Enami

Yuji Minegishi

Yutaka Igarashi

Natsuhiko Kouno

Hirokazu Kubo

Takashi Kusama

Nowak Krzysztof

The line narrowed laser apparatus configured to perform a plurality of burst oscillations including a first burst oscillation and a second burst oscillation next to the first burst oscillation to output a pulse laser beam. The line narrowed laser apparatus comprises a laser resonator, a chamber provided in the laser resonator, a pair of electrodes provided in the chamber, an electric power source configured to apply pulsed voltage to the pair of electrodes, a wavelength selecting element provided in the laser resonator, a spectral width varying unit provided in the laser resonator, and a controller. The controller is configured to measure a duty in a predetermined period before starting the second burst oscillation and a length of a suspension period from a time of ending the first burst oscillation to a time of starting the second burst oscillation, and perform a first control of the spectral width varying unit based on the duty and the length of the suspension period.

Line narrowed laser apparatus

A laser unit management system may include a server configured to hold first information provided with access limitation that allows an access with a first access authorization, second information provided with access limitation that allows an access with a second access authorization, and third information provided with access limitation that allows both an access with the first access authorization and an access with the second access authorization; and a laser unit including a laser output section and a controller, the laser output section being configured to output pulsed laser light toward an exposure unit that is configured to perform wafer exposure, the controller being configured to store the first information, the second information, and the third information in the server. The second information may include wafer-exposure-related information on the exposure unit and laser-control-related information on the laser unit that are in association with each other.

Laser unit management system

The line narrowed laser apparatus configured to perform a plurality of burst oscillations including a first burst oscillation and a second burst oscillation next to the first burst oscillation to output a pulse laser beam. The line narrowed laser apparatus comprises a laser resonator, a chamber provided in the laser resonator, a pair of electrodes provided in the chamber, an electric power source configured to apply a pulsed voltage to the pair of electrodes, a wavelength-selecting element provided in the laser resonator, a spectral width varying unit provided in the laser resonator, a wavelength variable unit configured to change a selected wavelength selected by the wavelength-selecting element, and a controller. The controller is configured to control the wavelength variable unit based on an amount of control of the spectral width varying unit in a period from a time of ending the first burst oscillation to a time of starting the second burst oscillation.

There may be provided a laser unit including a display configured to display one or both of electric power consumed by the laser unit and electric energy consumed by the laser unit.

Laser unit and non-transitory computer-readable storage medium

Problem: to suppress the number of times complete gas replacement in a laser chamber. Solution: this excimer laser apparatus may include a gas supply unit, connected to a first receptacle that holds a first laser gas containing halogen gas and a second receptacle that holds a second laser gas having a lower halogen gas concentration than the first laser gas, that supplies the first laser gas and the second laser gas to the interior of the laser chamber. Then, gas pressure control in which the gas supply unit supplies the second laser gas to the interior of the laser chamber or a gas exhaust unit partially exhausts gas from within the laser chamber, and partial gas replacement control in which the gas supply unit supplies the first laser gas and the second laser gas to the interior of the laser chamber and the gas exhaust unit partially exhausts gas from within the laser chamber sequentially, may be selectively performed.

Excimer laser apparatus and excimer laser system

A narrow band laser apparatus may include: a laser resonator; a pair of discharge electrodes; a power supply; a first wavelength measurement device configured to output a first measurement result; a second wavelength measurement device configured to output a second measurement result; and a control unit. The control unit calibrates the first measurement result, based on a difference between the second measurement result derived when the control unit controls the power supply to apply a pulsed voltage to the pair of discharge electrodes with a first repetition frequency and the second measurement result derived when the control unit controls the power supply to apply the pulsed voltage to the pair of discharge electrodes with a second repetition frequency, the second repetition frequency being higher than the first repetition frequency.

Narrow band laser apparatus

An excimer laser apparatus includes a gas supply unit, connected to a first receptacle that holds a first laser gas containing halogen gas and a second receptacle that holds a second laser gas having a lower halogen gas concentration than the first laser gas, that supplies the first laser gas and the second laser gas to the interior of the laser chamber. Gas pressure control in which the gas supply unit supplies the second laser gas to the interior of the laser chamber or a gas exhaust unit partially exhausts gas from within the laser chamber, and partial gas replacement control in which the gas supply unit supplies the first laser gas and the second laser gas to the interior of the laser chamber and the gas exhaust unit partially exhausts gas from within the laser chamber sequentially, may be selectively performed.

A laser apparatus comprises an amplifier including at least one of a MOPA and a MOPO each of which amplifies a single-longitudinal or multiple-longitudinal mode laser light, an amplifiable agent of the amplifier being a molecular gas, a master oscillator constructed from a semiconductor laser being able to oscillate a single-longitudinal or multiple-longitudinal mode laser light of which wavelength is within one or more amplification lines of the amplifier; and a controller executing a wave shape control adjusting a pulse shape and/or a pulse output timing of a single-longitudinal or multiple-longitudinal mode laser light outputted from the master oscillator.

Laser apparatus and extreme ultraviolet light source apparatus

A laser device capable of efficiently oscillating laser light and always obtaining a stable beam form is provided. For this purpose, in the laser device including an amplifying section () in which a laser medium is amplified to oscillate laser light (), and an optical element for separating part of the laser light () oscillated, and shaping a beam form of the laser light () into a desired form to output the same, wherein the optical element has at least either one of a partial reflecting portion () for partially reflecting the laser light () or a non-reflective portion () for transmitting the laser light () at high transmissivity, each of which is provided on approximately a center portion, and a total reflecting portion () which is provided outside a perimeter of the partial reflecting portion () or the non-reflective portion (), and which reflects the laser light () at high reflectivity.

Laser device

A laser device capable of efficiently oscillating laser light and always obtaining a stable beam form is provided. For this purpose, in the laser device including an amplifying section ( ) in which a laser medium is amplified to oscillate laser light ( ), and an optical element for separating part of the laser light ( ) oscillated, and shaping a beam form of the laser light ( ) into a desired form to output the same, wherein the optical element has at least either one of a partial reflecting portion ( ) for partially reflecting the laser light ( ) or a non-reflective portion ( ) for transmitting the laser light ( ) at high transmissivity, each of which is provided on approximately a center portion, and a total reflecting portion ( ) which is provided outside a perimeter of the partial reflecting portion ( ) or the non-reflective portion ( ), and which reflects the laser light ( ) at high reflectivity.

The present invention can accurately detect a wavelength of a light to be detected, which is output from a source of light to be detected, without an error even if there is a change in the characteristic of a spectroscope due to an individual difference among the spectroscopes or a change in the measuring environment. The device according to the invention emits at least two reference lights (Ln, La) having different wavelengths (&lgr;n, &lgr;a) as the reference lights by reference light source. And, actual characteristic value (D) of spectroscope is calculated on the basis of detection positions (Sn, Sa) of the at least two reference lights (Ln, La) on a sensor and the known wavelengths (&lgr;n, &lgr;a) of the at least two reference lights (Ln, La) (D&equals;(&lgr;a&minus;&lgr;n)/(Sa&minus;Sn)). And, on the basis of the detection positions (Sn, SO) of the reference light (Ln) and the light to be detected (LO) on the sensor (,), the calculated actual characteristic value (D) of the spectroscope and the known wavelength (&lgr;n) of the reference light (Ln), wavelength (&lgr;O) of the light to be detected (LO) is calculated (&lgr;O&equals;&lgr;n&plus;(SO&minus;Sn)&middot;D).

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Oyama, Japan

Takeshi Ohta