Hoya Corporation

Takeshi Mitsuishi

Kenichi Shinde

Hitoshi Kamura

Yukihiro Takahashi

Hiroshi Shirakawa

Yuko Watanabe

Ken-ichi Shinde

Hiroki Takei

Akinori Kobayashi

Hiroshi Kojima

Hiroshi Ohta

Yoshitaka Kitahara

Terufumi Hamamoto

Masanori Kadota

Takeshi Imizu

Ken-Ichi Shinde

A process for producing a thin film and an optical member which are free from discoloration of a lens and exhibit a good antistatic property and a good water repellency. The thin film is formed by a vacuum deposition of a water repellent solution which contains (a) a water repellent having a perfluoroalkyl group, (b) a mixture of a silane coupling agent, a modified silicone oil introduced with an organic group into its side chain and/or both terminal ends, and a perfluoroether compound, and (c) at least one conductive substance selected from the group consisting of fullerenes, carbon nanotubes and graphite compounds.

Processes for producing thin films and optical members

The present invention provides an optical member having a plastic substrate and a multilayered antireflection film formed by vapor deposition, wherein at least one layer in the antireflection film is a hybrid layer formed of at least one inorganic substance selected from silicon dioxide, aluminum oxide, titanium oxide, zirconium oxide, tantalum oxide, yttrium oxide, and niobium oxide and an organosilicon compound that is a liquid at normal temperature and at atmospheric pressure and/or an organic compound not containing silicon that is a liquid at normal temperature and at atmospheric pressure as vapor deposition raw materials.

Optical element having antireflection film

A process for forming a thin film is described that enables automatic formation of thin films having constant optical properties reliably and in large quantities with excellent reproducibility suitable for mass production. An apparatus for performing the process is also described. Generally, a material for vapor deposition is vaporized by an electron gun and an antireflection film forms by vapor deposition on lenses held by a coat dome. The electric power applied to the electron gun is controlled so that the amount of transmitted or reflected light continuously measured by an optical film thickness meter during thin film formation is compared to a reference amount of measured light stored in a means for storing data until the measured and reference amounts of measured light are close to, or the same as, one another.

Process for forming a thin film and apparatus therefor

Hybrid films, such as those having good abrasion-resistance and defogging properties, antireflection films including it, optical products, and methods for restoring the defogging property of the hybrid films are disclosed. The hybrid films having a defogging property may be obtained through vapor deposition of an organic compound having a hydrophilic group and a reactive group along with silicon dioxide or with silicon dioxide and aluminum oxide. The antireflection film may be formed on a substrate having the hybrid film as the outermost layer opposite to the substrate. The optical product may comprise a plastic substrate and the antireflection film having the hybrid film. A method for restoring the defogging property of the hybrid film of the optical product may include washing the hybrid film.

Hybrid film, antireflection film comprising it, optical product, and method for restoring the defogging property of hybrid film

A method for producing an optical element having a multi-layered antireflection film formed on a synthetic resin substrate, in which the antireflection film formed has good heat resistance, and its heat resistance lowers little with time. At least one high-refraction layer of the multi-layered anti-reflection film contains niobium oxide, zirconium oxide, yttrium oxide, and optionally aluminum oxide. High-refraction layers can be formed within a shorter period of time while not detracting from the good physical properties intrinsic to the layers.

Composition for vapor deposition, method for forming an antireflection film, and optical element

The present invention is directed to an optical element having an antireflection film formed on a plastic substrate, wherein the reflectance of the antireflection film is low while the transmittance thereof is high. The impact resistance, the adhesiveness, the heat resistance, the abrasion resistance and the alkali resistance of the antireflection film on the plastic substrate are superior. The optical element having an antireflection film has at least one layer of the antireflection film that is a hybrid layer made of an inorganic substance and an organic substance.

An optical element having a plastic substrate and an antireflection film provided on the plastic substrate, characterized in that the optical element has a basic layer comprising Nb between the plastic substrate and the antireflection film. The optical element has high adhesiveness between the plastic substrate and the antireflection film and is characterized by excellent resistance to heat, impact, alkali, and abrasion.

A method for producing a composition for vapor deposition comprising sintering a vapor source mixture prepared by mixing vapor sources that contain titanium dioxide and niobium pentoxide. The method is capable of forming a high-refraction layer even in low-temperature vapor deposition on a substrate. An antireflection film is formed having good scratch resistance, good chemical resistance and good heat resistance, of which the heat resistance decreases little with time, that is useful in a variety of optical elements.

Method for producing composition for vapor deposition, composition for vapor deposition, and method for producing optical element with antireflection film

An optical element having a plastic substrate and an antireflection film of a &lgr;/4-&lgr;/2-&lgr;/4 or &lgr;/4-&lgr;/4-&lgr;/2-&lgr;/4 type (&lgr;&equals;500 nm) provided in that order on the plastic substrate, wherein the layer of &lgr;/2 is a high-refraction equivalent film containing at least three layers and having a refractive index of from 1.80 to 2.40, and the even-numbered layer(s) of the equivalent film is an SiO layer or a layer in which SiO is a main component.

Growing community of inventors

Tokyo, Japan

Takeshi Mitsuishi