Hitachi Cable, Inc.

Sciocs Company Limited

Takeshi Meguro

Takayuki Suzuki

Takeshi Eri

Takeshi Tanaka

Yoshihiko Moriya

Yoshinobu Narita

Harunori Sakaguchi

Jiro Wada

Ken Ikeda

A nitride semiconductor epitaxial wafer includes a substrate, and a nitride semiconductor layer formed on the substrate, the nitride semiconductor layer including a (002) plane in an upper surface thereof. An in-plane dispersion of a full width half maximum (FWHM) of an X-ray rocking curve in the (002) plane or a (100) plane of the nitride semiconductor layer is not more than 30%. The wafer is not less than 100 &#x3bc;m in thickness and not less than 50 mm in diameter.

Nitride semiconductor epitaxial wafer and nitride semiconductor device

To provide a transistor device, which is composed of a compound semiconductor, having a multilayer structure in which a high electron mobility transistor (HEMT) and a heterojunction bipolar transistor (HBT) are overlapped on the same substrate and epitaxial-grown thereon, wherein a band gap energy of an indium gallium phosphide layer (InGaP) included in an epitaxial layer, is set to 1.91 eV or more.

Transistor device

A nitride semiconductor free-standing substrate includes a nitride semiconductor crystal and an inversion domain with a density of not less than 10/cmand not more than 600/cmin a section parallel to a surface of the substrate and inside the substrate. A method for making the nitride semiconductor free-standing substrate includes a nitride semiconductor crystal growth step of growing on a heterosubstrate a nitride semiconductor crystal including an inversion domain with a density of not less than 10/cmand not more than 600/cmby adjusting a growth condition at an initial growth stage of the nitride semiconductor crystal, and a separation step for separating the grown nitride semiconductor crystal from the heterosubstrate to form the nitride semiconductor free-standing substrate.

Nitride semiconductor free-standing substrate and method for making same

To provide a group-III nitride semiconductor freestanding substrate, with carrier concentration of a peripheral part of a n-type group-III nitride semiconductor freestanding substrate set to be lower than the carrier concentration inside of the peripheral part. In this freestanding substrate, preferably value &#x394;&#x3c3; obtained by dividing a difference between a maximum value of the carrier concentration and a minimum value of the carrier concentration in a surface of the freestanding substrate by the maximum value of the carrier concentration is greater than 0.05, and the carrier concentration in any place in the surface of the freestanding substrate exceeds 5.0&#xd7;10cm.

Group-III nitride semiconductor freestanding substrate and manufacturing method of the same

A nitride semiconductor substrate has a first surface forming a principal surface of the substrate. A first edge is formed by beveling at least a portion of an edge of the first surface of the substrate. A scattering region is formed in at least a portion of the first edge. The scattering region scatters more external incident light than the first surface.

Nitride semiconductor substrate

A method for manufacturing a nitride semiconductor substrate including the steps of: forming a nitride semiconductor layer on a sapphire substrate, and manufacturing a freestanding nitride semiconductor substrate by using the nitride semiconductor layer separated from the sapphire substrate, wherein variability of inclinations of the C-axes, being a difference between a maximum value and a minimum value of inclination of the C-axes in a radially-outward direction at each point on a front surface of the sapphire substrate is 0.3&#xb0; or more and 1&#xb0; or less.

Method of manufacturing nitride semiconductor substrate

A method of making a nitride semiconductor substrate having the steps of providing a free-standing substrate that is of a nitride semiconductor and has one of a penetrating pit and a penetrating crack that penetrate from a top surface to a back surface of the free-standing substrate, attaching a metal to the penetrating pit or the penetrating crack, the metal being adapted to be nitrided, and nitriding the metal to form a nitride that seals the penetrating pit or the penetrating crack. A nitride semiconductor substrate has a free-standing substrate that is formed of a nitride semiconductor and has one of a penetrating pit and a penetrating crack that penetrate from a top surface to a back surface of the free-standing substrate, and a metal nitride that seals the penetrating pit or the penetrating crack. The metal nitride is formed of GaN, InN and AlN.

Growing community of inventors

Kitaibaraki, Japan

Takeshi Meguro