Hitachi, Ltd.

Hitachi-high-technologies Corporation

Biglobe Inc.

Takeshi Kawasaki

Tomonori Nakano

Masakuni Ezumi

Kotoko Hirose

Toshiaki Sagawa

Takaho Yoshida

Hideyuki Nakamura

Toshiaki Makino

Hideo Todokoro

Yoichi Ose

Kinya Aota

Yasuo Ishimaru

Akihiro Satou

Sumio Okuno

Kazusige Fukuyori

Makoto Ezumi

Noboru Moriya

Yoshihiko Ina

Kentaro Masai

Masaki Yono

Mitsugu Sato

Yutaka Kaneko

Takashi Yamaguchi

Hiroyuki Ito

Shigeto Isakozawa

Junji Endo

Masahiro Tomita

Kazufumi Yamaji

Haruo Yoda

Takashi Ohshima

Yuko Sasaki

Momoyo Enyama

Souichi Katagiri

Kyoji Hirata

Michio Hatano

Keigo Kasuya

Hidekazu Nakamoto

Akira Tonomura

Tetsuya Akashi

Michitaro Miyata

Seiichi Hayashi

Kotoko Urano

Yoshiya Higuchi

Kazuya Furukawa

Seijiro Todori

Takahisa Yamamoto

Toshiharu Miyamoto

Toshimitu Miyada

Toshihiko Mochida

Mochida Toshihiko

In a field emission electron source used in an electron optical device, a tip distal end portion of the field emission electron source includes a needle-shaped shunt having a diameter that is reduced toward a distal end, a substantially spherical protrusion formed at the distal end of the shunt, a coating that covers the shunt and the substantially spherical protrusion, and an opening through which a part of the substantially spherical protrusion is exposed, the shunt and the substantially spherical protrusion are formed by using first metal as a material, the coating is formed by using second metal as a material, and the second metal has a work function larger than a work function of the first metal.

Field emission electron source, electron optical device, and manufacturing method

An ion pump and a charged particle beam device each includes two opposite flat-plate cathodes, an anode with a cylindrical shape having openings that face the respective flat-plate cathodes, a voltage application unit configured to apply a potential higher than potentials of the flat-plate cathodes to the anode, a magnetic field application unit configured to apply a magnetic field along an axial direction of the cylindrical shape of the anode, and a cathode bar arranged within the anode. The surface of the cathode bar is formed with a material that forms a non-evaporative getter alloy film on the anode or the flat-plate cathodes.

Ion pump and charged particle beam device using the same

In object recognition using image information, countermeasures are taken for reducing erroneous judgment caused when the similarity between a visual feature of an object image and a visual feature of dictionary data of another object becomes high in association with a temporal change. In a dictionary update method for a computer for updating dictionary data in which a visual feature of an object which a user desires to recognize is registered: when there are a plurality of data pieces having a visual feature similar to the inputted inquiry image, visual features of a plurality of objects are concluded as being similar and hence the pair of objects are accumulated into a similar object accumulation section; and when the objects accumulated in the similar object accumulation section have reached a condition set forth in advance, data having the visual features of the objects having reached the condition is concluded as requiring update and hence update is recommended to a user having registered the object.

Dictionary update method, dictionary update system, and dictionary update program

In order to realize a multiple assembled easily with high accuracy, a multipole having assembly accuracy within 10 micrometer and within several seconds of angle is achieved by fixing multipole elements by being guided by grooves provided on an inner side of a cylindrical housing to form the multipole.

Multipole and charged particle radiation apparatus using the same

Disclosed is a scanning charged particle beam apparatus equipped with an aberration corrector, contrived to eliminate resolution degradation in tilt observation by a chromatic third-order aperture aberration without relying on a specific optical system. A controller of the scanning charged particle beam apparatus provides a chromatic third-order aperture aberration measurement method relevant to tilt observation of a specimen. Further, the controller has a chromatic aberration control function relevant to tilt observation of a specimen. By means of the chromatic aberration control function, the controller controls a chromatic aberration to be positive or negative, rather than remaining at 0, in order to eliminate an image blur which occurs in a direction parallel to the specimen surface due to a chromatic third-order aperture aberration and a chromatic aberration at a tilt angle (t1) under observation and another tilt angle (&#x2212;t1) axially opposite to the tilt angle.

Scanning charged particle beam device and method for correcting chromatic spherical combination aberration

Disclosed is a scanning charged particle microscope provided with an aberration measuring means that measures high-order geometrical aberration at high precision and high speed. An image obtained by a single-hole aperture and an image obtained by a multiple-hole aperture arranged in a region larger than that for the single-hole aperture are deconvoluted, an aberration quantity is determined based on the profiles of beams tilted in a plurality of directions and the obtained quantity is fed back to an aberration corrector.

Charged particle beam apparatus and geometrical aberration measurement method therefor

A focused charged particle beam apparatus including an aberration corrector, capable of finding the absolute value of the aberration coefficient at high speed, and capable of making high-accuracy adjustments at high speed. A deflection coil tilts the input beam relative to the object point, and measures the defocus data and aberration quantity at high speed while the beam is tilted from one image, and perform least squares fitting on these results to find the absolute value of the aberration coefficient prior to tilting the beam, and to adjust the aberration corrector.

Charged particle beam apparatus including aberration corrector

A tilted illumination observation method and observation device with easy adjustment, high speed, good reproducibility and low cost is provided. A high resolution tilt image of a specimen is obtained by extracting the blurring on the scanning spot occurring during beam tilt from the image (step) captured by the tilted beam, and the image (step) captured from directly above the standard specimen; and then deconvoluting (step) the tilted image of the target specimen (step) using the extracted scanning spot from the oblique beam.

Method and apparatus of tilted illumination observation

There is provided a charged particle radiation device provided with an aberration corrector capable of correcting aberration with high precision in a short time by automatically setting an aberration coefficient measuring condition to thereby realize measurement with high precision. The charged particle radiation device has a feature that a value of defocus and a value of astigma, occurring owing to aberration at the time of the beam tilting, are estimated on the basis of results of aberration measurement, thereby adjusting an electron optical system on the basis of these values.

Charged particle radiation device provided with aberration corrector

A charged particle beam apparatus having an aberration correction capability at high acceleration voltages. The charged particle beam apparatus comprises a charged particle beam source; an extraction electrode to extract charged particles from the charged particle beam source; a charged particle beam gun including a means for converging a charged particle beam; an acceleration means for accelerating a charged particle beam emitted from the charged particle beam gun; and an aberration correction means disposed between the charged particle beam gun and the acceleration means, in which an aberration enough to cancel out an aberration of a charged particle beam on the specimen surface is provided to an extraction electrical potential or an equivalent beam at the initial acceleration stage.

Charged particle beam apparatus

A method for estimation of a probe shape, in a scanning electron microscope provided with an aberration corrector, and the method is designed so as to obtain a probe image, by inputting to a computer an image taken in a just-focused state and an image taken in a de-focused state, as an image data; preparing a correlation window by automatically determining a size of a correlation window image, based on an input data size and an output data size; executing cross-correlation calculation between the correlation window and a reference area; and repeating this calculation while shifting the reference area, so as to obtain a cross-correlation matrix, in order to stably obtain the probe image, without receiving effects of use conditions or noises.

Method for estimation of probe shape in charged particle beam instruments

In a charged-particle beam apparatus having a high-accuracy and high-resolution focusing optical system for charged-particle beam, a group of coils are arranged along a beam emission axis to extend through the contour of radial planes each radiating from the beam emission axis representing a rotary axis and each having a circular arc which subtends a divisional angle resulting from division of a circumferential plane by a natural number larger than 2 so that a superposed magnetic field may be generated on the incident axis of the charged-particle beam and the trajectory of the charged-particle beam may be controlled by the superposed magnetic field.

Corrector for charged-particle beam aberration and charged-particle beam apparatus

The present invention provides an aberration corrector giving excellent assembly accuracy but having fewer parts and fewer adjustment locations in number. In order to achieve it, a multistage multipole is formed by arranging plural combinations of electrodes around an optical axis using alignment blocks, each combination of electrodes being made by brazing-integrating plural electrodes with a ceramic material interposed therebetween.

Aberration corrector and charged particle beam apparatus using the same

An electron beam apparatus with an aberration corrector using multipole lenses is provided. The electron beam apparatus has a scan mode for enabling the operation of the aberration corrector and a scan mode for disabling the operation of the aberration corrector and the operation of each of the aberration corrector, a condenser lens, and the like is controlled such that the object point of an objective lens does not change in either of the scan modes. If a comparison is made between the secondary electron images of a specimen in the two modes, the image scaling factor and the focus remain unchanged and evaluation and adjustment can be performed by distinctly recognizing only the effect of the aberration corrector. This reduces the time required to adjust an optical axis which has been long due to an axial alignment defect inherent in the aberration corrector and an axial alignment defect in a part other than the aberration corrector which are indistinguishably intermingled with each other.

Electron beam apparatus with aberration corrector

Growing community of inventors

Musashino, Japan

Takeshi Kawasaki