Asml Netherlands B.v.

Takeshi Kaneko

Raymond Wilhelmus Louis Lafarre

Kornelis Tijmen Hoekerd

Koen Steffens

Gregory Martin Mason Corcoran

Thibault Simon Mathieu Laurent

Johan Gertrudis Cornelis Kunnen

Ruud Hendrikus Martinus Johannes Bloks

Robbert Jan Voogd

Bastiaan Andreas Wilhelmus Hubertus Knarren

Gerardus Adrianus Antonius Maria Kusters

Ramin Badie

Joost Jeroen Ottens

Erik Henricus Egidius Catharina Eummelen

Nina Vladimirovna Dziomkina

Nicolaas Ten Kate

Michel Riepen

Cornelius Maria Rops

Rogier Hendrikus Magdalena Cortie

Laurentius Johannes Adrianus Van Bokhoven

David Bessems

Matthias Kruizinga

Fabrizio Evangelista

Sandra Van Der Graaf

Adrianus Marinus Verdonck

Rene Compen

A table for a lithographic apparatus, the table having an encoder plate located on the table, a gap between the encoder plate and a top surface of the table, the gap located radially inward of the encoder plate relative to the periphery of the table, and a fluid extraction system with an opening in the surface of the gap to extract liquid from the gap.

Substrate table, a lithographic apparatus and a method for manufacturing a device using a lithographic apparatus

A substrate table to support a substrate on a substrate supporting area, the substrate table having a heat transfer fluid channel at least under the substrate supporting area, and a plurality of heaters and/or coolers to thermally control the heat transfer fluid in the channel at a location under the substrate supporting area.

Lithographic apparatus and method

An apparatus and method for cleaning a contaminated surface of a lithographic apparatus are provided. A liquid confinement structure comprises at least two openings used to supply and extract liquid to a gap below the structure. The direction of flow between the openings can be switched. Liquid may be supplied to the gap radially outward of an opening adapted for dual flow. Supply and extraction lines to respectively supply liquid to and extract liquid from the liquid confinement structure have an inner surface that is resistant to corrosion by an organic liquid. A corrosive cleaning fluid can be used to clean photo resist contamination.

Lithographic apparatus and surface cleaning method

A fluid handling structure for a lithographic apparatus, the fluid handling structure successively having, at a boundary from a space configured to comprise immersion fluid to a region external to the fluid handling structure: an extractor having at least one opening arranged in a first line that, in use, is directed towards a substrate and/or a table; and a liquid manipulator on a surface that, in use, faces the substrate and/or table to reduce the chance of droplets on the surface from coalescing.

Fluid handling structure, lithographic apparatus and device manufacturing method

Substrate table, a lithographic apparatus and a method involving an encoder plate

An immersion lithographic apparatus that includes a substrate table, a fluid handling structure and a swap table. The substrate table is configured to support a substrate. The fluid handling structure is configured to supply and confine immersion liquid to a space defined between a projection system and the substrate table, the substrate, or both. The swap table has a shutter surface configured to be under the fluid handling structure during, for example, swap of the substrate on the substrate table. In use, a transfer surface between a surface of the substrate table and a surface of the swap table is moved under the fluid handling structure to help stop escaping immersion liquid. A shutter member and a method are also disclosed.

Shutter member, a lithographic apparatus and device manufacturing method

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's-Hertogenbosch, Netherlands

Takeshi Kaneko