Kioxia Corporation

Takeshi Higuchi

Kasumi Okabe

Hirokazu Kato

Anupam Mitra

Takahiro Iwasaki

A measuring method includes: placing resiston a surface of a test film; pressing a templateagainst the resistplaced on the surface of the test film; measuring a size of a void formed in the resistafter pressing the templateagainst the resist; and determining gas permeability of the test film based on the size of the void.

Measuring method and measuring apparatus

An imprint method includes supplying a first photocurable resist to a first region of an object; irradiating the first resist with first light; forming a second resist over the object; bringing a template into contact with the second resist; and irradiating at least the second resist with second light through the template while the template is in contact with the second resist.

Imprint method, imprint apparatus, and film formation apparatus

According to one embodiment, a template for nanoimprint lithography includes a substrate having a main surface and a mesa structure on the main surface. The mesa structure has an upper surface that can be patterned with recesses or the like. A film containing a quantum dot or quantum dots is on the main surface other than the upper surface of the mesa structure. The quantum dot can absorb ultraviolet light and emit visible light.

Template, method for producing template, and method for producing semiconductor device

An imprinting method includes dispensing a first liquid on a first region of a substrate. The first liquid is a photocurable resist precursor. A second liquid is dispensed on a second region of the substrate. The second region is adjacent to and surrounding the first region. The second liquid is non-photocurable as dispensed. The first region is then irradiated with light while a patterned template is being pressed against the first liquid. The light cures the first liquid and forms a resist pattern corresponding to the patterned template. The patterned template and the substrate are then separated from each other. The second liquid is then selectively removed from the substrate while leaving the resist pattern on the substrate.

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Yokohama Kanagawa, Japan

Takeshi Higuchi