Daikin Industries, Ltd.

Takeshi Hazama

Kouji Yokotani

Nobuyuki Komatsu

Mayuko Tatemichi

Akio Higaki

Tatsuya Higuchi

Keiko Yamazaki

Tomohiro Tanaka

Takashi Kanemura

Tetsuhiro Kodani

Eri Mukai

Hisako Nakamura

Keiko Koga

A fluororesin film contains a fluororesin. The fluororesin contains two fluororesin species having different composition ratios of polymerized units. The fluororesin film has on at least one surface thereof a ten-point average roughness of 0.100 to 1.200 μm and an arithmetic average roughness of 0.010 to 0.050 μm, and the fluororesin film has a breakdown strength of 400 V/μm or higher.

Fluororesin film

A radio wave absorbing material including a fluoropolymer. The fluoropolymer contains a vinylidene fluoride unit, and the radio wave absorbing material absorbs a radio wave having a frequency in a range of 1 MHz to 100 MHz.

Radio wave absorbing material and radio wave absorbing sheet

A film having a dielectric dissipation factor at a frequency of 1 kHz and 160° C. of 0.02% or lower and a dielectric breakdown strength at 160° C. of 400 V/μm or higher. Also disclosed is a film including at least one fluoropolymer selected from a tetrafluoroethylene/perfluoro(alkyl vinyl ether) copolymer and a tetrafluoroethylene/hexafluoropropylene copolymer, the fluoropolymer having a crystallinity of 65% or higher.

Film

The invention provides a film having a high relative permittivity, a high volume resistivity, and a high breakdown strength. The film has a relative permittivity of 9 or higher at a frequency of 1 kHz and 30&#xb0; C., a volume resistivity of 5E+15 &#x3a9;&#xb7;cm or higher at 30&#xb0; C., and a breakdown strength of 500 V/&#x3bc;m or higher.

Film including a fluoropolymer

A fluororesin film containing a fluororesin. The fluororesin film has on at least one surface thereof a ten-point average roughness of 0.100 to 1.200 &#x3bc;m and an arithmetic average roughness of 0.010 to 0.050 &#x3bc;m. Further, the fluororesin film has a breakdown strength of 400 V/&#x3bc;m or higher.

The present invention provides a film having excellent heat resistance and a small difference between the permittivity at low temperatures and the permittivity at high temperatures. The present invention provides a film having a relative permittivity of 8 or more at a frequency of 1 kHz at 30&#xb0; C., wherein the rate of change is &#x2212;8 to +8% as calculated from a relative permittivity A at a frequency of 1 kHz at 30&#xb0; C. and a relative permittivity B at a frequency of 1 kHz at 150&#xb0; C. according to the following formula:Rate of change(%)=()/100.

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Osaka, Japan

Takeshi Hazama