Toyo Seikan Group Holdings, Ltd.

Toyo Seikan Kaisha, Ltd.

Toyo Seikan Co., Ltd.

Takeshi Aihara

Takashi Sato

Takeshi Murase

Akira Kobayashi

Hideo Kurashima

Satoshi Tanaka

Yoichi Ishizaki

Takahiko Totani

Yasunori Onozawa

Tomomi Kobayashi

Kentarou Ichikawa

Tsunehisa Namiki

Nobuhisa Koiso

Kouji Yamada

Naoya Matsumoto

Nobuhiro Sasajima

Tomohiko Nakamura

Masaomi Tamura

Toshiyuki Hasegawa

A culture container for culturing lymphocytes includes an immobilized surface and a non-immobilized surface, wherein the culture container is formed of a gas permeable film, the immobilized surface and the non-immobilized surface are container inner surfaces facing each other, and anti-CD3 antibodies are immobilized in the immobilized surface at a concentration of 10 to 300 ng/cm.

Culture container, method for culturing lymphocytes, culture-container production method, and solid-phasing apparatus

A method for manufacturing a metal bottle having a mouthpiece in an upper part of a bottomed cylindrical bottle body, including forming a screw part on the mouthpiece and then forming a curl at a tip of the mouthpiece. During formation of the screw part, a height of the first-stage screw thread from a tip side in a complete screw part and a height of the second-stage screw thread from the tip side are substantially equal and a distance between an apex part of the first-stage screw thread and a bottle axis is smaller than a distance between the apex part of the second-stage screw thread and the bottle axis. After formation of the curl, a distance between the apex part of the first-stage screw thread and the bottle axis and a distance between the apex part of the second-stage screw thread and the bottle axis are substantially equal.

Method for manufacturing metal bottle, and metal bottle

Provided is a polygonal in which a decoration effect equivalent to that of a cylindrical base-can is obtained without causing folding or deformation in a can body-part. Bottom-part outer-peripheral parts (A-) of a cylindrical base-can that are expected to form linear parts (B-) of a polygonal can (B) are moved inward in a radial direction, while bottom-part outer-peripheral parts (A-) of the cylindrical base-can that are expected to form corner parts (B-) of the polygonal can are moved outward in the radial direction. Thus, the polygonal can is molded such that the body-part cross-section peripheral length of the cylindrical base-can and the body-part cross-section peripheral length of the molded polygonal can have a substantially isometric relationship.

Polygonal can and method for forming thereof

A microwave plasma processing device includes a fixing device for fixing a substrate as a processing target on a central axis in a plasma processing chamber, a exhausting device for depressurizing an inside and outside of the substrate, a metal processing gas supply member which is present in the substrate and forms a reentrant cylindrical resonating system along with the plasma processing chamber, and a microwave introducing device for introducing a microwave into the plasma processing chamber to perform processing. A microwave sealing member is provided at a substrate-holding portion of the fixing device, and a connection position of the microwave introducing device is located at a node of an electric field intensity distribution formed on the processing gas supply member by introducing the microwave.

Microwave plasma processing device

A microwave plasma processing device can form a uniform thin film on a substrate to be processed. The microwave plasma processing device includes a fixing device for fixing a substrate to be processed onto the center axis in a plasma processing chamber, an exhaust device for depressurizing the inside and outside of the substrate, a metal processing gas supply member present in the substrate and forming a reentrant cylindrical resonating system along with the plasma processing chamber, and a microwave introducing device for introducing a microwave into the plasma processing chamber to process it. A microwave sealing member is provided in a specified position of the substrate-holding portion of the fixing device, and the connection position of the microwave introducing device is set to a specified weak-field position out of a field intensity distribution formed in the interior of the plasma processing chamber.

Microwave plasma processing device and plasma processing gas supply member

Growing community of inventors

Yokohama, Japan

Takeshi Aihara