Kaneka Corporation

Toyo Gosei Co., Ltd.

University of Hyogo

Hyogo Prefecture

Takeo Watanabe

Yoshitaka Komuro

Masamitsu Tachibana

Yuki Kawashima

Masamichi Hayakawa

Shuhei Ozaki

Tomotaka Yamanaka

Yosuke Osawa

Tetsuo Harada

Shinichi Yusa

Satoshi Ogi

Hiroo Kinoshita

The present disclosure relates to a pellicle that can achieve both a high EUV transmittance and a uniformity in EUV transmittance by including a graphite thin film having a film thickness of 5 nm or more and 30 nm or less and a surface roughness (Sa) of 0.1 nm or more and 500 nm or less.

Pellicle comprising graphite thin film

A photosensitive resin realizes formation of a pattern having a good shape, without introducing poor compatibility between an acid generator and a photoresist primary-component polymer having an acid-dissociable group, and a photosensitive composition containing the photosensitive resin. The photosensitive resin includes a repeating unit represented by formula (1): (wherein Rrepresents a C2-C9 linear or branched divalent hydrocarbon group; each of Rto Rrepresents a hydrogen atom or a C1-C3 linear or branched hydrocarbon group; each of Rand Rrepresents an organic group, wherein Rand Rmay together form a divalent organic group; and Xrepresents an anion); (wherein Rrepresents a C2-C9 linear or branched hydrocarbon group) and a repeating unit represented by formula ():   

Photosensitive resin, and photosensitive composition

Growing community of inventors

Hyogo, Japan

Takeo Watanabe