Canon Kabushiki Kaisha

International Business Machines Corporation

Takeo Ono

Masato Yamanobe

Hitoshi Oda

Hidetoshi Suzuki

Ichiro Nomura

Toshikazu Ohnishi

Yoshikazu Banno

Masanori Mitome

Hisaaki Kawade

Masao Majima

Eiji Yamaguchi

Yasuyuki Todokoro

Akira Shinmi

Kou Yoneda

Toshihiko Ouchi

Mitsutoshi Hasegawa

Hideaki Mitsutake

Toshihiko Miyazaki

Shuji Yamada

Fumihiko Saito

Mamoru Miyawaki

Yasuhiro Hamamoto

Toyoshige Sasaki

Tetsuya Kaneko

Takeo Tsukamoto

Keisuke Yamamoto

Tatsuya Iwasaki

Yasue Sato

Hajime Sakata

Yoshinobu Sekiguchi

Masahiro Okuda

Nobuo Watanabe

Toru Sugeno

Toshihiko Takeda

Keishi Saito

Masataka Yamashita

Yoshiyuki Osada

Jun Nitta

Kazuya Matsumoto

Aoji Isono

Masao Sugata

Katsuhiko Shinjo

Tokihiko Ogura

Hiroaki Toshima

Masaaki Matsushima

Noritake Suzuki

Nobuo Kawase

Kuniji Osabe

Kazuhito Fujii

Osamu Iketa

An image formation apparatus comprising a rear plate on which a plurality of wires for connecting electron emission devices are placed; a faceplate arranged in parallel to the rear plate in a frame, on which an image formation material for forming images by radiation of electrons emitted from the electron emission devices is placed; spacers placed between the rear plate and the faceplate and placed on the wires of the rear plate; and getters provided on the wires on which a spacer is not placed but not provided on the wires on which the spacer is placed.

Image formation apparatus having getters spacers and wires

An electron-emitting device includes a pair of oppositely disposed electrodes and an electroconductive film arranged between the electrodes and including a high resistance region. The high resistance region has a deposit containing carbon as a principal ingredient. The electron-emitting device can be used for an electron source of an image-forming apparatus of the flat panel type.

Electron-emitting device, electron source, and image-forming apparatus

A patterning method forms a pattern including a lyophilic region and a lyophobic region. The method includes treating the surface of an object by exposing an atmosphere containing at least one gas selected from the group consisting of hydrogen, deuterium, deuterated hydrogen, and tritium; partially exposing the treated surface to light to form an exposed region and an unexposed region; and applying a liquid onto one of the exposed region and the unexposed region.

Patterning method and methods for producing electro-optic device, color filter, illuminant, and thin-film transistor

An electron-emitting device comprises a pair of oppositely disposed electrodes and an electroconductive film arranged between the electrodes and including a high resistance region. The high resistance region has a deposit containing carbon as a principal ingredient. The electron-emitting device can be used for an electron source of an image-forming apparatus of the flat panel type.

Electron-emitting devices provided with a deposit between electroconductive films made of a material different from that of the electroconductive films

An image formation apparatus is disclosed which includes, within an enclosure configured by a pair of substrates placed face to face and an external frame placed between the substrates, an electron source placed on one of the pair of substrates, an image formation material placed on the other substrate, and spacers placed between the substrates, characterized in that the spacers and the external frame is conductive and device is provided for electrically connecting the spacers and the external frame so that the equipotential surfaces between the spacers and the external frame are quasi-parallel when driven.

Image formation apparatus having fluorescent material and black material

Image formation apparatus having electrically conductive spacer and external frame

Electron-emitting device, electron source, and image forming apparatus

Image formation apparatus

Method of manufacturing electron emitting device

Uniformity of the electron emission characteristics of electron emitting devices is improved. A substrate is formed with row-directional wires and column-directional wires electrically connected to electron emitting devices disposed in a matrix shape and each having electrodes and an electroconductive film. A pseudo row-directional wire is formed at a position X between a position X of a row-directional wire and a periphery of the substrate, and a pseudo column-directional wire is formed at a position Y between a position Y of a column-directional wire and a periphery of the substrate. Pseudo electrodes and are electrically connected to the pseudo row-directional wire and pseudo column-directional wire.

Electron source, image forming apparatus, and manufacture method for electron source

A method for producing an electron-emitting device having an electroconductive film with an electron-emitting region extending between plural electrodes, includes a step of forming the electron-emitting region in the electroconductive film, including a step of heating the electroconductive film, and a step of energizing the electroconductive film in an atmosphere in which a gas for promoting cohesion of the electroconductive film exists.

Methods for producing electron-emitting device, electron source, and image-forming apparatus

An electron-emitting device comprises a pair of oppositely disposed electrodes and an electroconductive film inclusive of an electron-emitting region arranged between the electrodes. The electric resistance of the electroconductive film is reduced after forming the electron-emitting region in the course of manufacturing the electron-emitting device.

Method of manufacturing electron-emitting device as well as electron source and image-forming apparatus

Growing community of inventors

Machida, Japan

Takeo Ono