Kureha Kagaku Kogyo Kabushiki Kaisha

Takeo Ogiwara

Yoshikatsu Satake

Masaki Ohya

Akio Kobayashi

A graft copolymer is obtained by graft-polmerizing a vinyl or vinylidene monomer onto a rubber trunk polymer which comprises a polyalkylene oxide monomer comprising 4 to 500 alkylene oxide groups together with an ethylenic unsaturation, and a conjugated diene and/or an alkyl acrylate. This graft copolymer alone or in a mixture thereof with another thermoplastic resin, because of the presence of the polyalkylene oxide monomer unit incorporated in the rubber trunk polymer, provides a resin composition possessing excellent antistatic property, which, practically, is not lowered by washing.

Antistatic resin composition

A graft copolymer is obtained by graft-polymerizing a vinyl or vinylidene monomer onto a rubber trunk polymer which comprises a polyalkylene oxide monomer comprising 4 to 500 alkylene oxide groups together with an ethylenic unsaturation, and a conjugated diene and/or an alkyl acrylate. This graft copolymer alone or in a mixture thereof with another thermoplastic resin, because of the presence of the polyalkylene oxide monomer unit incorporated in the rubber trunk polymer, provides a resin composition possessing excellent antistatic property, which, practically, is not lowered by washing.

An antistatic resin composition comprises 100 parts of a nitrile copolymer comprising 7 to 100% of a nitrile graft copolymer with a graft ratio of 4 to 50% obtained by graft-polymerizing a monomer mixture of a specific composition onto a rubber trunk polymer predominantly comprising a conjugated diolefin and/or an acrylate, and 0 to 93% of a nitrile random copolymer of a specific composition; and 0.05 to 10 parts of a surfactant added thereto. This antistatic resin composition, wherein the rubber trunk polymer forms a bridge structure, not only has, per se, an excellent antistatic property but also an antistatic property which undergoes substantially no change upon washing, for example, with water.

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Iwaki, Japan

Takeo Ogiwara