Mitsubishi Denki Kabushiki Kaisha

Takeo Nakamoto

Katsuya Kosaki

Masaru Kinugawa

Air trapped in a blind hole during processing of the blind hole with a liquid is eliminated by circulating the liquid along a surface-to-be-processed in substantially a single direction at all times and by setting a velocity gradient of the liquid over the surface to at least 300/second.

Chemical processing method, and method of manufacturing semiconductor device

An air trap in a blind hole is eliminated by circulating a liquid chemical along a surface-to-be-processed in substantially a given direction at all times and by setting a velocity gradient of the liquid chemical over the surface to 300/second or more thereby eliminating the air trap in the blind hole.

Growing community of inventors

Hyogo, Japan

Takeo Nakamoto