Kimoto Co, Ltd.

Takeo Moriya

Toshio Yamagata

Yasunori Sugiyama

Yamagata Toshio

Ogura Masako

The present invention relates to a photosensitive masking element for plate making including a support made of a transparent film; a metal thin film layer formed on the support; and a photosensitive masking layer formed on said metal thin film layer and strongly adhering thereto. In preparing masks for various colors, the photosensitive masking material of the present invention makes it unnecessary to fill and retouch ditches corresponding to unnecessary enclosing lines with a correction liquid, resulting in a marked improvement in the efficiency of plate making.

Process for preparation of a masking element for forming a multicolor

The photosensitive recording material of the invention includes a substrate, an active ray-shielding layer formed on the substrate and a photosensitive composition layer formed on the actinic ray-shielding layer, wherein the binder used for the actinic ray-shielding layer, a material which is swellable or soluble in aqueous neutral salt solution and also and the binder used for the photosensitive composition layer is a material which is soluble in aqueous neutral salt solution. The product is provided a non-silver-salt type photosensitive recording material superior in both workability and stability with time.

Photosensitive recording material developable with aqueous neutral salt

A positive-working photosensitive material and a process for developing the same are disclosed. The positive-working photosensitive material is obtained by forming on a base material a layer of a photosensitive composition containing (A), 100 weight parts of a resin binder including a vinylic polymer compound having phenolic hydroxyl groups and (B), 3-30 weight parts of an aromatic diazonium salt having only a single diazo group. The positive-working photosensitive material is developed by using an aqueous alkali solution.

Photosensitive material and process for developing the same

A photosensitive material and a process for developing the same are disclosed. The photosensitive material is obtained by forming on a base material a layer of photosensitive composition comprising (A), 100 weight parts of a water soluble resin binder containing at least 60 weight % of acrylamide-diacetoneacrylamide copolymer, the copolymerization ratio of acrylamide and diacetoneacrylamide being 8:2-5:5 and average polymerization degree being 300-1500, and (B), 5-20 weight parts of a water soluble diazonium salt. The photosensitive material is developed by using an aqueous alkali solution.

Photosensitive positive diazo material with copolymer of acrylamide and

There is disclosed a dry system image producing element comprising a substrate, a thin metal layer and a photosensitive layer. After exposing the element to light through a desired pattern, the photosensitive layer is peeled off to obtain a light barrier pattern made from the metal on the substrate corresponding to the photosensitized portion.

Growing community of inventors

Kawagoe, Japan

Takeo Moriya