Central Glass Company, Limited

Other

Nippon Zeon Company, Ltd.

Sagami Chemical Research Center

Takeo Komata

Kaoru Mori

Takashi Kume

Shinya Akiba

Kei Matsunaga

Matsue Kawamura

Kiyoshi Suzuki

Tetsuo Takematsu

Makoto Matsuura

Yukio Ikeda

Nariaki Ii

Kazuhiko Maeda

Haruhiko Komoriya

Satoru Miyazawa

Hideaki Imura

Ryo Nadano

Kenji Hosoi

Yoshiki Hirotsu

Michitaka Ootani

Fuyuhiko Sakyu

Masatomi Kanai

Naoto Takada

Shinichi Sumida

Yumiko Shirakawa

Yumiko Kohda

Satoru Kobayashi

Masaki Fujiwara

Kiyosi Kondo

Daiei Tunemoto

Takayuki Nishimiya

Katsunori Kawamura

Kenji Motojima

Hideko Sakai

Yusuke Kuramoto

Mikio Ujiie

Matsue Minezaki

Takahisa Tada

Hiroshi Minesaki

Seiji Murata

Mitsutaka Otani

Tetsu Takematsu

Yumiko Koda

Shoji Yamaoka

Masahiro Watanabe

Yusuke Saito

Takanao Tarui

Disclosed is a process for producing &#x3b1;-substituted norbornanyl acrylates efficiently on an industrial scale while suppressing the formation of by-products derived from intramolecular cyclization, excessive addition to acrylic acid etc. The &#x3b1;-substituted norbornanyl acrylates are useful as norbornene resist monomers. In the disclosed process, an &#x3b1;-substituted acrylic acid is directly reacted with a substituted norbornene in the presence of at least one acid catalyst selected from methanesulfonic acid and camphorsulfonic acid. It is possible in this reaction to suppress the formation of the by-products derived from intramolecular cyclication, excessive addition of the acid to the reaction product etc.

Process for producing &#x3b1;-substituted norbornanyl acrylates

A method for forming a protective film of a fluorine-containing polymer composition excellent in smoothness and adhesiveness on a photoresist. Moreover, there is provided a means for removing the protective film without impairing the underlying photoresist. A polymer coating composition obtainable by dissolving a fluorine-containing polymer compound in a solvent comprising a fluorinated acetal having a specific structure is applied on a photoresist and dried to form a protective film. A fluorinated acetal having the specific structure is suitable as a solvent for being brought into contact with a fluorine-containing polymer film, peeling the film, and forming a photoresist or a lithographic pattern.

Fluorine-containing polymer coating composition, method for forming fluorine-containing polymer film using coating composition, and method for forming photoresist or lithographic pattern

The present invention relates to a fluorine-containing cyclic compound of formula (5): wherein R-Rand R-Rare independently a hydrogen atom, a halogen atom, or a C-Cstraight-chain, branched or cyclic alkyl group, and may contain fluorine atom, oxygen atom, sulfur atom, or nitrogen atom. Rand R, Rand R, or Rand Rmay be bonded together to form a ring. In such a case, it is a C-Calkylene group that may contain a hetero atom such as oxygen, sulfur and nitrogen, 'a' is 0 or 1, 'b' is an integer of 0-2 and &#x201c;c&#x201d; is an integer of 0-2.

Fluorine-containing cyclic compound, fluorine-containing polymer compound, resist material using same and method for forming pattern

A benzyl vinyl ether represented by the following formula is hydrolyzed in the presence of a catalyst selected among Arrhenius acids and Lewis acids to obtain 3,3,3-trifluoropropionaldehyde. Subsequently, the 3,3,3-trifluoropropionaldehyde is oxidized with an oxidizing agent. Thus, 3,3,3-trifluoropropionic acid can be more advantageously produced than in conventional techniques from an inexpensive starting material.

Process for producing 3,3,3-trifluoropropionic acid

There is provided a process for producing 3,3,3-trifluoropropionyl chloride, which is characterized in that 3,3,3-trifluoropropionaldehyde is chlorinated by a chlorinating agent selected from the group consisting of chlorine (Cl), sulfuryl chloride (SOCl) and organic N-chloro compounds.

Method for producing 3,3,3-trifluoropropionyl chloride

The present invention relates to a polymerizable acrylate compound represented by the general formula (1): (in the formula, Rrepresents a hydrogen atom, halogen atom, hydrocarbon group or fluorine-containing alkyl group, Rand Rmay be different or identical, and each of them independently is a hydrogen atom, fluorine atom, hydrocarbon group optionally branched, fluorine-containing alkyl group, aromatic group, or cyclic structure containing an aliphatic group and may contain oxygen or carbonyl bond) and a polymer compound obtained by using the same.

Polymerizable acrylate compound containing hexafluorocarbinol group and polymer made therefrom

The present invention relates to, for example, a fluorine-containing cyclic compound represented by the following general formula (1). In the general formula (1), R1a is a C-Ccyclic alkyl group, cyclic alkenyl group or cyclic alkynyl group; each of R2 and R3 is independently a hydrogen atom, a halogen atom, or a C-Cstraight-chain, branched or cyclic alkyl group; and each of R1a, R2 and R3 may contain fluorine atom, oxygen atom, sulfur atom, nitrogen atom or an atomic group containing a carbon-carbon double bond.

There is provided a process for producing a fluorine-containing alkylsulfonylaminoethyl &#x3b1;-substituted acrylate of the formula [3] by reaction of an aminoethyl &#x3b1;-substituted acrylate of the formula [1a] with a fluorine-containing alkylsulfonic fluoride of the formula [2], or by reaction of an aminoethyl a-substituted acrylate salt of the formula [1b] with a fluorine-containing alkylsulfonic fluoride of the formula [2] in the presence of a base, wherein a fluorine-containing compound is used as a reaction solvent: where Ris a hydrogen atom, methyl group, ethyl group, n-propyl group, isopropyl group, n-butyl group, sec-butyl group, tertbutyl group, fluoromethyl group, difluoromethyl group, trifluoromethyl group or perfluoroethyl group; Ris a fluorine-containing alkyl group having a carbon number of 1 to 6; Xis a counter anion (n is a positive integer); and Y is a fluorine atom, chlorine atom or bromine atom.

Process for producing fluorine-containing alkylsulfonylaminoethyl &#x3b1;-substituted acrylate

A process for producing N-(bicyclo[2.2.1]hept-5-en-2-ylmethyl)-1,1,1-trifluoromethanesulfonamide represented by formula [3]. The process includes the step of reacting trifluoromethanesulfonic anhydride with 1-bicyclo[2.2.1]hept-5-en-2-ylmethanamine in the presence of water and in the presence of a base selected from the group consisting of alkali metal hydroxides, alkaline-earth metal hydroxides and basic salts containing an alkali metal or an alkaline-earth metal. 

Process for producing N-(bicyclo[2.2.1]hept-5-en-2-ylmethyl)-1,1,1-trifluoromethanesulfonamide

There is provided a process for producing 3,3,3-trifluoropropionaldehyde, including the step of hydrolyzing a benzyl vinyl ether of the formula [1] in the presence of a catalyst selected from the group consisting of Arrhenius acids and Lewis acids, [Chem. 17] where R represents phenyl or phenyl having a substituent Rselected from the group consisting of alkyl groups, alkoxy groups, halogen atoms, nitro groups and amino groups.

Process for producing 3,3,3-trifluoropropionaldehyde

There is provided a process for producing a fluoroalkanesulfonamide derivative represented by the formula [3],R&#x2014;NH&#x2014;SO&#x2014;R&#x2014;R&#x2003;&#x2003;[3]including reacting a fluoroalkanesulfonic anhydride represented by the formula [1], with an organic primary amine represented by the formula [2], in the presence of water and in the presence of a base selected from the group consisting of (a) a hydroxide of an alkali metal or alkaline-earth metal or (b) a basic salt containing an alkali metal or alkaline-earth metal.

Process for producing fluoroalkanesulfonamide derivatives

A process for producing an &#x3b1;-substituted acrylic norbornanyl compound represented by the formula [3] includes reacting an &#x3b1;-substituted acrylic acid anhydride represented by the formula [1] with a substituted norbornanyl alcohol represented by the formula [2]. wherein Rrepresents a hydrogen atom, methyl group, ethyl group, n-propyl group, isopropyl group, n-butyl group, sec-butyl group, tert-butyl group, fluoromethyl group, difluoromethyl group, trifluoromethyl group, or perfluoroethyl group, and wherein one of R, Rand Ris a CFC(CF)(OH)CH&#x2014; group, and each of the other two of R, Rand Ris a hydrogen.

Process for producing &#x3b1;-substituted acrylic norbornanyyl compounds

A process for producing a fluorine-containing diol represented by the formula [2], includes reducing a hydroxy ketone represented by the formula [1], by hydrogen in the presence of a ruthenium catalyst. The ruthenium catalyst may be a solid-phase catalyst in which ruthenium is carried on an activated carbon, alumina or silica.

Process for producing fluorine-containing diol and its derivatives

A process for producing a fluorine-containing 2,4-diol represented by the formula [4], wherein Rrepresents a hydrogen atom or an acyclic or cyclic alkyl group having a carbon atom number of 1 to 7; Rrepresents an acyclic or cyclic alkyl group having a carbon atom number of 1 to 7; and Rand Rare optionally bonded to each other to form a ring, includes reducing a hydroxy ketone represented by the formula [3], wherein Rand Rare defined as above, by hydrogen in the presence of a ruthenium catalyst.

Processes for producing fluorine-containing 2,4-diols and their derivatives

The present invention provides a process for producing a fluorine-containing alkylsulfonylaminoethyl &#x3b1;-substituted acrylate represented by general formula [3]: which comprises reacting an aminoethyl &#x3b1;-substituted acrylate represented by general formula [1a] or a salt thereof: with a fluorine-containing alkylsulfonyl halide represented by general formula [2a] or a fluorine-containing alkylsulfonic anhydride represented by general formula [2b]: 

Growing community of inventors

Kawagoe, Japan

Takeo Komata