Femto Deployments Inc.

M - Fsi Ltd.

Energyfront Inc

Takeji Ueda

Akira Watanabe

Tadashi Okuno

Masao Iga

Kousaku Matsuno

Satoshi Shikami

Koji Oka

Sanae Sumi

Jun Kanayasu

A terahertz-wave signal input unitconfigured to input a terahertz-wave signal from a spectroscopic apparatusfor detecting a terahertz wave acting on a photoresist, and a terahertz-wave signal analysis unitconfigured to analyze a terahertz-wave signal input by the terahertz-wave signal input unitto acquire characteristic information of the photoresist are included, and spectroscopic processing using a terahertz wave is performed on a photoresist to acquire characteristic information of the photoresist (a characteristic value or a correlation characteristic indicating a relationship between a plurality of elements including the characteristic value). Even though the characteristics of the photoresist change depending on the light, since the characteristic change is not caused by the terahertz wave, it is possible to acquire characteristic information of the photoresist without changing the characteristics of the photoresist, and to properly evaluate the characteristics of the photoresist from the characteristic information.

Photoresist characteristics analysis method and characteristics analysis device

The invention is configured to include a spectroscopy cellas a container including one or more spaces, each of which has a plate shape and contains a to-be-measured object that transmits or reflects a terahertz wave; and a holderincluding one or more first holder through-holesanddisposed at positions corresponding to the spaces of the spectroscopy cell, each of the spaces containing the to-be-measured object. A body portionof the spectroscopy cellis made of a resin material that transmits the terahertz wave, and the spectroscopy cellis loaded into the holderand is used. The holderhas a function of holding the spectroscopy cell, and a function of correcting one or more of a distortion, a twist, and a bending of the spectroscopy cell

Measuring jig, and calibration method and terahertz wave measuring method using same

An electromagnetic signal analysis apparatus includes a frequency spectrum obtaining unitto obtain a frequency spectrum that is generated based on an electromagnetic signal obtained by a spectral deviceand represents a property value with respect to a frequency, a water vapor fitting processing unitto fit a waveform of a single fitting function or a composite waveform, of a plurality of fitting functions to a frequency spectrum at a frequency at which absorption of the electromagnetic waves by water vapor is increased, and a property analyzing unitto analyze a property of a liquid sample using at least two values that determine a characteristic of the fitting function used for the fitting, so that the frequency spectrum, at the frequency at which absorption of the electromagnetic waves by water vapor generated from surfaces of the liquid sample is increased is processed to analyze the property of the liquid sample.

Electromagnetic signal analysis apparatus and electromagnetic signal analysis program

A terahertz wave signal analysis device includes a fitting processing unitthat fits synthetic waveforms of a plurality of normal distribution functions which differ in at least one of a center frequency, an amplitude, and a width to a frequency spectrum obtained from a terahertz wave signal and a graph generating unitthat generates a graph using at least one of a center frequency, an amplitude, and a width of a plurality of normal distribution functions used in the fitting as parameters, and it is possible to visualize a feature corresponding to a characteristic of a sample in the form of a graph in an easy-to-understand manner by approximating a frequency spectrum which does not clearly appear because a difference in the characteristic of the sample becomes a feature of a waveform by synthetic waveforms of a plurality of normal distribution functions in a form in which the characteristic of the sample is taken over and generating a graph on the basis of parameters of a plurality of normal distribution functions used in the approximation.

Terahertz wave signal analysis device, terahertz wave signal analysis method, and terahertz wave signal analysis program

A device to provide assistance in transferring and standing includes a knee-fixing unit wrapped around and supporting either the knee area or at least the front and sides of the lower leg area from knee to ankle of a care-receiver; a pelvis support wrapped around at least the buttocks or a section from the pelvis to thighs of said care-receiver in a manner that prevents slippage from said pelvis support from slipping off; and left and right pulling bands. Each band having two connecting ends attached to the side of a thigh section and the side of a hip section of said pelvis support respectively so that said bands are positioned above and below the greater trochanter when said care-receiver is being pulled up during transfer/standing assistance and are positioned in front of and behind the greater trochanter when said care-receiver is seated.

Device to provide assistance in transferring, standing, and the like

A terahertz wave is spectrally dispersed into two waves which are caused to pass through a sample liquid filmand a reference liquid filmand are then collected, and the terahertz waves in an interference state are detected by a terahertz wave detecting semiconductorConsequently, only spectroscopic information related to a distinctive characteristic of the sample liquid filmis detected. In addition, a predetermined optical path length difference is provided between a path where the terahertz wave is transmitted through the sample liquid filmand a path where the terahertz wave is transmitted through the reference liquid filmby an optical delaying unitIna frequency spectrum obtained by performing Fourier transformation over a terahertz wave signal having an interference waveform by a terahertz wave signal analyzing deviceconsequently, a feature caused by an interaction of dissimilar molecules in the sample liquid filmappears in a spectral intensity at a frequency depending on the optical path length difference.

Terahertz time domain spectroscopic apparatus

There are provided a terahertz wave spectral dispersing unitfor spectrally dispersing a terahertz wave to be generated from a terahertz wave generating semiconductorinto two waves, a terahertz wave focusing unitfor focusing a terahertz wave transmitted through a sample liquid filmand a terahertz wave transmitted through a reference liquid film, and a terahertz wave detecting semiconductorfor detecting the focused terahertz wave, and it is possible to detect the terahertz wave transmitted through the sample liquid filmand the terahertz wave transmitted through the reference liquid filmin an interference state, thereby offsetting a noise made by a stripe-shaped wave generated on the sample liquid filmand a noise made by a stripe-shaped wave generated on the reference liquid film

Terahertz time domain spectroscopy device

A substrate cleaning apparatus comprises an outer shell constructed such that the outer shell is selectively openable or hermetically closable to form a sealed space, an inner shell enclosed within the outer shell and having a holding member for holding a substrate, and a dispenser unit for feeding at least one of gas and liquid into the inner shell. Within the sealed space formed by the outer shell, a highly gas-tight space is formed by the inner shell to permit cleaning of the substrate within the highly gas-tight space. Also disclosed are a dispenser, a substrate holding mechanism and a substrate cleaning chamber, which are suitable for use with the substrate cleaning apparatus, and substrate cleaning processes making use of these dispenser, substrate holding mechanism and substrate cleaning chamber, respectively.

Substrate cleaning apparatus

A wet treatment method useful in one of a chemical processing and a rinsing step performed upon fabrication of semiconductor devices. A substrate is treated with a desired liquid while revolving the substrate around an axis of rotation outside the substrate such that the liquid flowing on a surface of the substrate is maintained flowing under a centrifugal force greater than gravitation. The substrate is treated while supplying the liquid at a flow rate at least equal to a discharge rate of the liquid only in a direction conforming with that of the centrifugal force or with that of a flow of the liquid flowing on the surface of the substrate under the centrifugal force. The substrate surface is evenly treated with the liquid while avoiding flows of the liquid running against each other or a flow of the liquid stagnating on the surface of the substrate.

Growing community of inventors

Okayama, Japan

Takeji Ueda