Ishikawajima-harima Heavy Industries Co., Ltd.

Other

Ihi Corporation

Takehito Yagi

Miyuki Masaki

Koichiro Tanaka

Atsushi Yoshinouchi

Norihito Kawaguchi

Kenichiro Nishida

Mikito Ishii

Setsuo Nakajima

Yoshiyuki Saito

Yoshikazu Sugiyama

Hidetoshi Takimoto

Tsuyoshi Terauchi

A film thickness measurement device, which measures the film thickness of an oil film of lubricating oil, formed in a gap between a piston ring and an electrode provided flush with a piston ring sliding surface of a cylinder liner, by detecting the electrostatic capacitance across the gap, employs an electrostatic capacitance detection portion, which charges the electrostatic capacitance by supplying a constant current to the electrode, detects the electrostatic capacitance based on changes in the charging voltage accompanying the charging, and outputs a detection signal indicating the electrostatic capacitance, and a film thickness computation portion, which calculates the film thickness of the oil film based on the electrostatic capacitance indicated by the detection signal input from the electrostatic capacitance detection portion.

Film thickness measurement device and method

An illumination optical system has superior image formation capabilities, and can radiate a linear beam with excellent illumination uniformity and a narrow line width having a large aspect ratio; the illumination optical system comprises an afocal beam expander system which expands an beam illuminated from a laser light source; a linear beam-forming lens system having at least refractive power in a second direction which is substantially at a right angle to at least a first direction, the linear beam-forming lens system converting the beam, illuminated from said beam expander system, to a linear beam having its long side in said first direction; a lens array section having a plurality of element lenses, arranged along said first direction; and a condenser optical system which illuminates a processed face by reconnecting images of said linear beam from each of said element lenses thereon.

Illumination optical system and laser processor having the same

An object of the present invention is to provide a laser annealing method and apparatus capable of performing uniform beam emission. By means of the present invention, uniform beam application to a sample can be achieved because a linear cross-sectional configuration can be created in an optical system with a beam having a Gaussian distribution while areas of strong light intensity are avoided by rotating the beam from a laser light source at a prescribed angle by means of rotating means even when the beam pattern of the beam from the laser light source has a non-uniform intensity distribution.

Method and apparatus for laser annealing configurations of a beam

A laser irradiation apparatus having a low running cost compared to the conventional, and a laser irradiation method using the laser irradiation apparatus, are provided. Crystal grains having a size in the same order as, or greater than, conventional grains are formed. The cooling speed of a semiconductor film is made slower, and it becomes possible to form crystal grains having a grain size in the same order as, or greater than, the size of grains formed in the case of irradiating laser light having a long output time to the semiconductor film. This is achieved by delaying one laser light with respect to another laser light, combining the laser lights, and performing irradiation to the semiconductor film in the case of irradiating laser light using a solid state laser as a light source, which has a short output time.

Laser irradiation apparatus and method of laser irradiation

Growing community of inventors

Odawara, Japan

Takehito Yagi