Fujifilm Corporation

Takehiro Kasahara

Hiroyuki Hirai

Naoki Koito

Takamichi Fujii

Hiroshi Matsuyama

Takayuki Naono

Naoyoshi Yamada

Naoya Shibata

Yoshikazu Hishinuma

Takuya Inoue

Hideki Kaneiwa

Yasukazu Nihei

Takami Arakawa

Kazuhiro Aikawa

Takashi Goto

Takashi Katou

Yoshiki Maehara

Yuya Hamaguchi

Akihiro Sugita

Takeshi Senga

Yuuichi Okamoto

Takashi Komiyama

Yumi Kato

Kiyohiko Tsutsumi

Kyohei Ogawa

An object of the present invention is to provide a laminate capable of preparing an image display device having excellent display performance and excellent discoloration resistance, and an image display device formed of the laminate. The laminate of the present invention is a laminate including two substrates, and a polarizer layer disposed between the two substrates, in which the polarizer layer contains one or more kinds of azo coloring agents having two or more azo bonds in a molecule, moisture permeabilities of the two substrates are 10g/m·day or less, and a content of moisture present between the two substrates is 0.9 g/mor less.

Laminate and image display device

The present invention provides: a laminate which has excellent moisture-heat resistance and includes a light-absorbing anisotropic layer sandwiched between pressure sensitive adhesive layers; and an image display device using the same. The laminate includes a pressure sensitive adhesive layer, a light-absorbing anisotropic layer, and a pressure sensitive adhesive layer in this order, in which the light-absorbing anisotropic layer contains an organic dichroic substance, a thickness of the light-absorbing anisotropic layer is 5 μm or less, the pressure sensitive adhesive layer and the pressure sensitive adhesive layer are each a pressure sensitive adhesive layer at a closest position as viewed from the light-absorbing anisotropic layer in the laminate, and H represented by Expression (I) is 10.0 or less. H=(thickness of pressure sensitive adhesive layer+thickness of pressure sensitive adhesive layer)/total thickness of layers on inner side than pressure sensitive adhesive layer and pressure sensitive adhesive layer.

Provided is a light absorption anisotropic film capable of preparing an image display device having excellent display performance and excellent durability, and a laminate and an image display device formed of the light absorption anisotropic film. The light absorption anisotropic film is used for an image display device, which is formed of a liquid crystal composition containing a liquid crystal compound and a dichroic substance, in which in a signal derived from the dichroic substance detected by time-of-flight secondary ion mass spectrometry, a relationship between a maximum intensity Imax of the light absorption anisotropic film in a thickness direction and an intensity Isur1 in a surface of the light absorption anisotropic film on a viewing side of the image display device satisfies Expression (I-1) 2.0≤Imax/Isur1.

Light absorption anisotropic film, laminate, and image display device

A piezoelectric device, including the following on a substrate in the order listed below: a lower electrode, a piezoelectric film which contains a Pb containing perovskite oxide represented by a general expression (P) below, and an upper electrode, in which the piezoelectric film has a layer of pyrochlore oxide on the surface facing the lower electrode, and the average layer thickness of the pyrochlore oxide layer is not greater than 20 nm.ABO&#x2003;&#x2003;(P)where, A: at least one type of A-site element containing Pb as a major component, B: at least one type of B-site element selected from the group consisting of Ti, Zr, V, Nb, Ta, Cr, Mo, W, Mn, Sc, Co, Cu, In, Sn, Ga, Zn, Cd, Fe, and Ni, and O: an oxygen element.

Piezoelectric device, piezoelectric device manufacturing method, and liquid discharge apparatus

A photoelectric conversion element comprises: a pair of electrodes; and an organic photoelectric conversion layer between the pair of electrodes, wherein one of the electrodes is a first electrode that collects electrons generated in the organic photoelectric conversion layer; the other one of the electrodes is a second electrode that collects holes generated in the organic photoelectric conversion layer; and the photoelectric conversion element further comprises a hole blocking layer that comprises silicon oxide and inhibits injection of holes into the organic photoelectric conversion layer from the first electrode while applying a bias voltage between the electrodes, the hole blocking layer being disposed between the first electrode and the organic photoelectric conversion layer, and an oxygen/silicon composition ratio of the silicon oxide is 0.5 or greater and 1.2 or less.

Photoelectric conversion element, solid-state image pickup device, and manufacturing method of the photoelectric conversion element

Growing community of inventors

Minami-ashigara, Japan

Takehiro Kasahara