Tokyo Electron Limited

Tokyo Electron Kyushu Limited

Tokyo Electron Saga Limited

Takayuki Tomoeda

Noriyuki Anai

Takami Satoh

Hiroshi Tanaka

Koji Harada

Hirofumi Shiraishi

Shinya Murakami

Sinichiro Izumi

Yuuji Kamikawa

Masaaki Murakami

Kenichi Nishioka

Kiyohisa Tateyama

Tatsuya Iwasaki

Masafumi Nomura

Kengo Mizosaki

Shinzi Kitamura

Kouichi Tanoue

Yuji Kamikawa

A develop processing apparatus is provided for processing an object with a developing solution, comprising a retaining member for rotatably retaining the object, a developing solution supply nozzle for supplying the developing solution to the object, a developing solution sucking nozzle for sucking the developing solution supplied to the object, a developing solution supply nozzle moving mechanism for moving the developing solution supply nozzle above the object, a developing solution sucking nozzle moving mechanism for moving the developing solution sucking nozzle above the object. After the developing solution is supplied to the object subsequent to moving the developing solution supply nozzle, the developing solution sucking nozzle is moved and the developing solution on the object is sucked.

Processing apparatus and processing method

Disclosed herein is a washing apparatus comprising a washing chamber, an opening/closing mechanism, and a nozzle. The chamber has an opening and is designed for washing the objects transported from outside through the opening. The opening/closing mechanism is designed to open and close the opening of the washing chamber. The nozzle is used to wash the opening/closing mechanism. The apparatus further comprises a washing vessel filled with a washing liquid, for washing the objects, and also a nozzle for applying a washing liquid to the objects located in the washing vessel when the objects are partly exposed as the washing liquid is discharged from the washing vessel.

Washing apparatus, and washing method

A washing method for washing objects includes the steps of supplying a washing liquid to a washing vessel and immersing objects in the washing liquid contained in the washing vessel. The method also includes the steps of discharging the liquid at least once from the washing vessel, and starting to apply the washing liquid to the objects when the objects are partly exposed to air as the liquid is discharged from the washing vessel. The washing liquid application is continued during exposure of the objects to the air to prevent the surface of the objects from being dried and stained.

Method for washing objects

The present invention provides a resist processing method for an object to be processed, including the processing step of supplying a process solution onto the object to be processed to perform a process on the object to be processed, and the cleaning step of supplying a cleaning solution onto the object to be processed to clean the object to be processed, wherein the processing step at least partially overlaps the cleaning step. The present invention also provides a resist processing method for an object to be processed, including the steps of positioning a process solution supply means for supplying a process solution above a quadrilateral object to be processed having a pair of opposing edges, moving the process solution supply means toward one edge of the pair of edges of the object to be processed relative to the object to be processed while supplying the process solution onto the object to be processed by the process solution supply means, and moving the process solution supply means from one edge of the object to be processed toward the other edge of the pair of edges of the object to be processed relative to the object to be processed while supplying the process solution onto the object to be processed by the process solution supply means.

Resist processing method and apparatus

A invention provides a resist processing method for an object to be processed, including the processing step of supplying a process solution onto the object to be processed to perform a process on the object to be processed, and the cleaning step of supplying a cleaning solution onto the object to be processed to clean the object to be processed, wherein the processing step at least partially overlaps the cleaning step. The present invention also provides a resist processing method for an object to be processed, including the steps of positioning a process solution supply means for supplying a process solution above a quadrilateral object to be processed having a pair of opposing edges, moving the process solution supply means toward one edge of the pair of edges of the object to be processed relative to the object to be processed while supplying the process solution onto the object to be processed by the process solution supply means, and moving the process solution supply means from one edge of the object to be processed toward the other edge of the pair of edges of the object to be processed relative to the object to be processed while supplying the process solution onto the object to be processed by the process solution supply means.

A substrate scrubbing and cleaning method in which a substrate is carried to a rotatable scrubbing arrangement, and both surfaces of the substrate are scrubbed by the rotatable scrubbing arrangement while the substrate is maintained substantially horizontal. In addition, a cleaning solution is applied to both surfaces of the substrate while the substrate is substantially horizontal and is linearly reciprocated.

Method for scrubbing and cleaning substrate

A substrate scrubbing and cleaning device comprising a mechanism having an upper and a lower brush members for scrubbing both surfaces of an LCD glass substrate, a mechanism for rotating the upper and lower brush members, a mechanism for supplying pure water to the upper and lower brush members, a mechanism for carrying the substrate between the upper and the lower brush members to reciprocate it relative to the upper and lower brush members in a substrate carrying direction, and a controller for controlling the operation of the substrate carrying mechanism.

Growing community of inventors

Kumamoto-ken, Japan

Takayuki Tomoeda