Hitachi, Ltd.

Renesas Electronics Corporation

Renesas Technology Corp.

Hitachi Ulsi Systems Co., Ltd.

Takayuki Oshima

Junji Noguchi

Hizuru Yamaguchi

Hideo Aoki

Tsuyoshi Tamaru

Noriko Miura

Kensuke Ishikawa

Tatsuyuki Saito

Kiyomi Katsuyama

Tomio Iwasaki

Shoji Hotta

Kazumasa Yanagisawa

Eiichi Murakami

Takashi Matsumoto

Kazuyuki Tsunokuni

Kan Takeuchi

Takako Funakoshi

Kousuke Okuyama

Nobuyoshi Kobayashi

Kazuo Nojiri

Shinichi Fukada

Takashi Yunogami

Toshihiko Onozuka

Toshihiro Tanaka

Kiyoshi Matsubara

Kazuyoshi Shiba

Yutaka Shinagawa

Masamichi Fujito

Kazufumi Suzukawa

Sonoko Abe

Kazutoshi Oomori

Tomio Iwaskai

Yohei Yanagida

Kenji Miyakoshi

Hiroyuki Ohta

Hiroshi Miyazaki

Osamu Inoue

Hiromi Shimazu

Shinichiro Wada

Hiroki Kimura

Tomoyuki Miyoshi

Hiroyuki Hayashi

Kazutoshi Ohmori

Keigo Kitazawa

The reliability of wirings, each of which includes a main conductive film containing copper as a primary component, is improved. On an insulating film including the upper surface of a wiring serving as a lower layer wiring, an insulating film formed of a silicon carbonitride film having excellent barrier properties to copper is formed; on the insulating film, an insulating film formed of a silicon carbide film having excellent adhesiveness to a low dielectric constant material film is formed; on the insulating film, an insulating film formed of a low dielectric constant material as an interlayer insulating film is formed; and thereafter a wiring as an upper layer wiring is formed.

Semiconductor device and manufacturing method thereof

Adverse effects can be hardly exerted on a current performance of an LDMOSFET to suppress the amount of carrier implantation from an anode layer of an LDMOS parasitic diode, and improve a reverse recovery withstand of the parasitic diode. The LDMOSFET includes a semiconductor substrate having a first semiconductor region formed of a feeding region of a first conductivity type at a position where a field oxide film is not present on a surface layer of a semiconductor region in which the field oxide film is selectively formed, and a second semiconductor region formed of a well region of a second conductivity type which is an opposite conductivity type, and feeding regions of the first conductivity type and the second conductivity type formed on an upper layer of the well region, and a gate electrode that faces the well region through a gate oxide film. The feeding region of the first semiconductor region is formed at a distance from the field oxide film near an end portion remote from the gate electrode, and desirably the feeding region is intermittently formed at intervals in the longitudinal direction.

Semiconductor device

In an LDMOS transistor, a channel length is reduced to increase a saturation current without causing an off-state breakdown voltage optimized in terms of trade-off between an on-resistance and the off-state breakdown voltage. A short channel region is selectively formed between an element isolation film and a low-concentration body region in which a channel is formed such that the short channel region is located immediately below a gate oxide film. The short channel region has a conduction type opposite to that of the low-concentration body region and has a carrier concentration higher than that of the low-concentration body region. The body region is retreated by the presence of the short channel region toward a high-concentration source region.

Semiconductor device and its manufacturing method

In a semiconductor device, capacitance between copper interconnections is decreased and the insulation breakdown is improved simultaneously, and a countermeasure is taken for misalignment via by a manufacturing method including the steps of forming an interconnection containing copper as a main ingredient in an insulative film above a substrate, forming insulative films and a barrier insulative film for a reservoir pattern, forming an insulative film capable of suppressing or preventing copper from diffusing on the upper surface and on the lateral surface of the interconnection and above the insulative film and the insulative film, forming insulative films of low dielectric constant, in which the insulative film is formed such that the deposition rate above the opposing lateral surfaces of the interconnections is larger than the deposition rate therebelow to form an air gap between the adjacent interconnections and, finally, planarizing the insulative film by interlayer CMP.

Semiconductor device and manufacturing method of the same

Provided is a method for manufacturing a semiconductor integrated circuit device which enables a timing optimization without giving additions to a manufacturing process and increasing cost and TAT. Existence of a timing constraint violation is determined, and when a timing constraint violation is detected, to dissolve the violation, a void formation inhibition zone is set up in a part or all of a spacing (inter-wiring spacing) between an optimization-target wiring which needs a further delay time of a signal and clock and an adjacent wiring adjacent to the optimization-target wiring having a spacing within a specified wiring spacing, and an insulating film is formed in a spacing (inter-wiring spacing) between the optimization-target wiring and the adjacent wiring in the void formation inhibition zone, and voids are formed in a spacing (inter-wiring spacing) between the optimization-target wiring and the adjacent wiring outside the void formation inhibition zone.

Delay adjusting method and LSI that uses air-gap wiring

In a semiconductor integrated circuit device having plural layers of buried wirings, it is intended to prevent the occurrence of a discontinuity caused by stress migration at an interface between a plug connected at a bottom thereof to a buried wiring and the buried wiring. For example, in the case where the width of a first Cu wiring is not smaller than about 0.9 &#x3bc;m and is smaller than about 1.44 &#x3bc;m, and the width of a second Cu wiring and the diameter of a plug are about 0.18 &#x3bc;m, there are arranged two or more plugs which connect the first wirings and the second Cu wirings electrically with each other.

Method of manufacturing a semiconductor integrated circuit device

Growing community of inventors

Ome, Japan

Takayuki Oshima