Shiseido Company, Limited

Fujitsu Corporation

Takayuki Miyazaki

Takashi Minami

Yasushi Takahashi

Yoshikazu Soyama

Noriko Tomita

Kenzo Ito

Hajime Matsuda

Akio Nasu

Yohei Hamano

Hideyuki Sumiyoshi

Takashi Matsumoto

Koichi Kobayashi

Tomiyuki Nanba

Yuko Suzuki

Hiroyuki Kakoki

Kenichi Kawashima

Hirotaka Takada

Haruo Tsuchikawa

Kinya Hosokawa

Kunihiko Yoshida

Sumire Suzuki

Yoriko Mune

Provided is a makeup cosmetic which has a good feeling of use, without showing tautness or stiffness as in the case of using a silicone-based resin film or an offensive odor as in the case of using polyisoprene, and exhibits a good effect of preventing color migration. This makeup cosmetic is characterized by comprising polyisobutylene having a relative mass of 30,000-100,000 and a volatile hydrocarbon oil. Also provided are a top coating agent, which can be appropriately applied on the aforesaid makeup cosmetic, imparts glossiness and shows little color migration or blurring, a makeup kit comprising the aforesaid makeup cosmetic and the top coating agent, and a makeup method using the makeup kit.

Makeup cosmetic and makeup kit comprising the makeup cosmetic and a top coating agent

The present invention provides a lipstick composition which drastically improves the color development and also is superior in terms of spreadability, gloss, and long-lastingness The present invention also provides a lipstick composition with superior a shape-retaining ability without using ceresin for the shape-retaining agent. The present invention is a lipstick composition comprising (a) 3-25 mass % of one, two or more types of polyethylene wax (average molecular weight 300-700) and (b) 0.1-50 mass % of one, two or more types of liquid oil having one &#x2014;OH group in the structure.

Composition for lipstick

A cholesterol ester clathrate comprising a cholesterol ester included in a hydroxyalkylated cyclodextrin; a hydrous composition comprising a hydroxyalkylated cyclodextrin, a cholesterol ester and water; a hydrous composition comprising a hydroxyalkylated cyclodextrin, a cholesterol ester, a hydrous stabilizer, and water; a hydrous composition comprising a hydroxyalkylated cyclodextrin, a cholesterol ester, a clay mineral, and water; cosmetics containing these hydrous compositions; and process for the preparation thereof. The clathrate exhibits an emulsifying effect in itself. Further, the hydrous compositions are excellent in water-holding capacity and are improved in hydration properties and separation stability at a high temperature.

Cholesterol ester clathrate, water-holding composition, hydrous compositions, cosmetics containing the same, and process for the preparation thereof

Cholesterol ester clathrate, water-holding composition, hydrous

A scanning electron beam exposure system includes two apertures (39a, 48a) for forming a rectangular beam (31). The cross section of the rectangular beam is changed by a deflection unit (47X, 47Y) arranged between the two apertures. The rectangular beam is refocused by a refocusing coil (51) to improve the peripheral sharpness of a projected image of the beam. The refocusing coil is controlled in accordance with the cross section (X.sub.1, Y.sub.1) of the beam.

Scanning electron beam exposure system

A method of correcting the aberration of an electron beam due to astigmatism and field curvature of focus by feeding a correction current through stigmator coils and a focus correction coil. The correction currents are determined by measuring a sharpness P of the electron beam. The sharpness P is defined as a product of p.sub.x, a sharpness measured when the electron beam is deflected in X direction, and p.sub.y, a sharpness measured when the electron beam is deflected in Y direction: P=p.sub.x .times.p.sub.y. The use of the sharpness P provides good convergence of the measurements and it becomes possible to calibrate the electron beam for many points in the scanning field. Thus, it is possible to attain maximum resolution over an entire scanning field. Optimum correction currents are determined from data obtained by varying each correction current while keeping the other correction currents constant to obtain several values of P and then using a least square approximation of the measured values of P with a quadrature curve.

Calibration method for electron beam exposer

A wafer having chips for determining the position of the wafer, at least one of the chips comprising a plurality of first-direction line groups formed on one side portion of the chip and a plurality of second-direction line groups formed on the other region of the chip, the first-direction line groups and the second-direction line groups being orthogonal to each other, each of the first-direction line groups comprising one first-direction main mark and one first-direction code mark expressing the position of the one first-direction main mark, each of the second-direction line groups comprising one second-direction main mark and one second-direction code mark, whereby, by scanning only one of the first-direction line groups and only one of the second-direction line groups by means of an electron beam, the position of the wafer is determined.

Wafer having chips for determining the position of the wafer by means of

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Kanagawa, Japan

Takayuki Miyazaki