Mitsubishi Electric Corporation

Mitsubishi Denki Kabushiki Kaisha

Takayuki Hisaka

Koichiro Nishizawa

Tasuku Sumino

Takahiro Nakamoto

Kazuhiro Maeda

Hitoshi Kurusu

Toshihiko Shiga

Naohito Yoshida

Masahiro Totsuka

Kenji Hosogi

A device () is provided on an upper surface of the device substrate (). A sealing frame () made of a non-electrolytic plating reactive catalyst metal is provided on the upper surface of the device substrate () and surrounds the device (). An upper surface of the device substrate () and a lower surface of the cap substrate () are joined in a hollow state through the sealing frame (). A plurality of electrodes () are connected to the device () and extended out of the device substrate () and the cap substrate (). A metal film () is provided on an outer surface of the sealing frame () and not provided on the device substrate () and the cap substrate ().

Semiconductor device and method for manufacturing the same

A semiconductor device, a leak detection device, an outer wall, and a separation wall are provided on a substrate. A first hollow structure in contact with the semiconductor device and a second hollow structure in contact with the leak detection device are separated by the separation wall and formed in a hermetically sealed state. At least a part of a portion of the leak detection device in contact with the second hollow structure is made of a corrodible metal or an alloy containing a corrodible metal. At least a part of the outer wall is in contact with the second hollow structure.

Semiconductor apparatus and semiconductor apparatus leak inspection method

A multi-finger transistor including plural control electrodes (), plural first electrodes (), and plural second electrodes () is provided on a semiconductor substrate (). A resin film () covers the transistor. A first wiring () electrically connecting the plural first electrodes () to one other is provided on the resin film (). The resin film () covers contact portions between the first wiring () and the plural first electrodes (). A first hollow structure () sealed with the resin film () is provided around the plural control electrodes () and the plural second electrodes ().

Semiconductor device and method for manufacturing same

A gate electrode () is provided on the semiconductor layer () and a least includes a lowermost layer () in contact with the semiconductor layer (), and an upper layer () provided on the lowermost layer (). The upper layer () applies stress to the lowermost layer () to cause both edges of the lowermost layer () to curl up from the semiconductor layer ().

A semiconductor device includes: a semiconductor substrate; a gate electrode on the semiconductor substrate; a SiN film on the semiconductor substrate and the gate electrode; and an oxide film on the SiN film, wherein the oxide film is an atomic layer deposition film including atomic layers alternately deposited.

Semiconductor device and method of manufacturing the same

Airtightness of a hollow portion is maintained, and yield and durability are improved. A semiconductor deviceincludes a device substrate, a semiconductor circuit, a sealing frame, a cap substrate, via portions, electrodesand, and a bump portionor the like. A hollow portionin which the semiconductor circuitis housed in an airtight state is provided between the device substrateand the cap substrate. The bump portionconnects all the via portionsand the cap substrate. Thus, the via portionscan be reinforced using the bump portionA.

Semiconductor device

A method of manufacturing a semiconductor device includes: forming lower-layer wirings for a transistor, a circuit element and a plurality of contact pads on a substrate independently of each other; forming a first feed layer over an entire surface of the substrate on which the lower-layer wirings are formed; patterning the first feed layer to form a test pattern connecting terminals of the transistor to the separate contact pads independently of the circuit element; making a test on the transistor in a stand-alone state by using the contact pad and the test pattern; and after the test, connecting the transistor and the circuit element to form a circuit.

Method of manufacturing semiconductor device

A semiconductor device includes: a semiconductor substrate; an underlying wiring on the semiconductor substrate; a resin film extending to the semiconductor substrate and the underlying wiring, and having a first opening on the underlying wiring; a first SiN film on the underlying wiring and the resin film, and having a second opening in the first opening; an upper layer wiring on the underlying wiring and part of the resin film; and a second SiN film on the upper layer wiring and the resin film, and joined to the first SiN film on the resin film. The upper layer wiring includes a Ti film, connected to the underlying wiring via the first and second openings, and an Au film on the Ti film. The first and second SiN films circumferentially protect the Ti film.

A semiconductor device includes a semiconductor substrate, a channel layer, a Schottky layer, a first layer having a narrow band gap than the Schottky layer, a second layer having band discontinuity with the Schottky layer, a gate electrode, an n+ layer, a source electrode, and a drain electrode. The first and second layers are within the Schottky layer, and the second layer is disposed on the first layer.

A method of producing a semiconductor device includes preparing a semiconductor ingot having a (100) surface orientation and an orientation flat in a �011! direction; cutting the semiconductor ingot in a plane which is obtained by tilting the (100) surface by an angle .theta. about an axis of the tilting, obtained by rotating the �011! direction by an angle .phi. with the center of the (100) surface as an axis of the rotation, thereby producing a semiconductor wafer having a surface; producing a channel region in the semiconductor wafer; producing a refractory metal gate on the surface of the semiconductor wafer; and using the refractory metal gate as a mask, implanting dopant impurity ions into the semiconductor wafer in a direction perpendicular to the surface of the semiconductor wafer, thereby producing impurity-implanted regions in the semiconductor wafer. Channeling is prevented and the short-channel effect is suppressed.

Method of fabricating semiconductor device

An airbridge wiring structure includes a substrate having a surface; a first wiring layer disposed on the surface of the substrate; and a second wiring layer disposed partially on the surface of the substrate and including an airbridge wiring layer crossing the first wiring layer, the first and second wiring layers being electrically insulated from each other and separated by an air gap wherein the airbridge wiring layer includes at least one longitudinal groove.

Growing community of inventors

Tokyo, Japan

Takayuki Hisaka