Daikin Kogyo Co., Ltd.

Nippon Telegraph and Telephone Public Corporation

Takayuki Deguchi

Tsuneo Fujii

Hiroshi Inukai

Toshihiko Amano

Osamu Kogure

Masami Kakuchi

Hiroshi Asakawa

Takaomi Satokawa

A resist material of positive type having a high sensitivity, a high resolving power and an excellent adhesion property to substrates, which comprises a copolymer of a fluoroalkyl acrylate having the general formula: ##STR1## wherein R.sub.1 is methyl group, ethyl group, a halogen-substituted methyl or ethyl group, a halogen atom or hydrogen atom, R.sub.2 is a bivalent hydrocarbon group having 1 to 6 carbon atoms, and R.sub.f is a fluoroalkyl group having 1 to 15 carbon atoms, with an acrylic comonomer selected from the group consisting of a glycidyl acrylate, an acrylic acid, an acrylamide and an .alpha.-cyanoacrylate.

Fluoroalkyl acrylate resist material and process for forming fine resist

A resist film made of thiocarbonyl fluoride polymers which has excellent sensitivity, resolving power and adhesion property to a substrate and can provide a fine resist pattern. The resist pattern is produced by forming the resist film on a substrate, irradiating an ionizing radiation and developing with an organic solvent.

Patterned film of thiocarbonyl fluoride polymer

Resist material and process for forming fine resist pattern

Growing community of inventors

Ibaraki, Japan

Takayuki Deguchi