Osaka University

Takayoshi Norimatsu

Noriaki Miyanaga

Yasukazu Izawa

Katsunobu Nishihara

Hiroaki Nishimura

Keiji Nagai

Hiroyuki Furukawa

Yoshinori Shimada

Masakatsu Murakami

Tatsuhiko Yamanaka

Atsushi Sunahara

Mitsuo Nakai

Shinsuke Fujioka

Qincui Gu

Masahiro Nakatsuka

Keisuke Shigemori

Shigeaki Uchida

Vasilli Zhakhovski

Ryouji Matsui

Takahiro Hibino

Tomoharu Okuno

The present invention is made to provide an extreme ultraviolet light source target or an X-ray source target having a good operationality. An extreme ultraviolet light source target in accordance with an aspect of the present invention is obtained by including a heavy metal such as tin into a matrix made of a polymeric material such as hydroxylpropylcellulose (HPC). The target can be manufactured by mixing the heavy metal and the polymeric material with a solvent, and evaporating the solvent. Since the target uses the polymeric material as a matrix, the target can be easily deformed to have a desired shape. For this reason, the target can be easily attached to a target holder irrespective of the shape of the holder, resulting in a good operationality of the target. Furthermore, an emission efficiency can be improved by including the heavy metal at a low density.

Extreme ultraviolet light and X-ray source target and manufacturing method thereof

An object of the present invention is to provide an extreme ultraviolet light source target which can emits extreme ultraviolet light with high emission efficiency. A solid target made of heavy metal or heavy-metal compound and having a density 0.5 to 80% that of the crystal density is used. When the target is irradiated with a laser beam, plasma of the heavy metal contained in the target is generated, and extreme ultraviolet light having a predetermined wavelength which corresponds to the kind of the heavy metal is emitted from the plasma. When the density of the target is made to be smaller than the crystal density as described above, space distribution of the density of the generated plasma can be controlled, and the region in which plasma absorbs energy of the laser beam overlaps the region in which the plasma emits the extreme ultraviolet light. Thus, emission efficiency can be improved, preventing energy loss. For example, in a case where the SnOtarget having a density 24% of the crystal density is used, the emission efficiency at around 13.5 nm wavelength is higher than in the case where a Sn crystal target is used.

Extreme ultraviolet light source and extreme ultraviolet light source target

Growing community of inventors

Minoh, Japan

Takayoshi Norimatsu