Sharp Kabushiki Kaisha Corporation

Takayoshi Nagayasu

Hiroaki Kato

Mikio Katayama

Yuzuru Kanemori

Hidenori Negoto

Akihiko Imaya

Kiyoshi Nakazawa

Toshihiko Hirobe

Mitsuaki Hirata

Tomohiko Yamamoto

Hiroshi Morimoto

Yasunori Shimada

Yoshitaka Hibino

Motokazu Inui

Masahito Goto

Toshiaki Fujihara

Toshio Fujii

Wataru Horie

Hiroshi Fujiki

Makoto Miyago

Hiroshi Oka

The liquid crystal display device of this invention includes a first substrate, a second substrate opposing the first substrate, and a liquid crystal layer sandwiched between the first and the second substrates, wherein the liquid crystal layer includes a polymer region and a liquid crystal domain surrounded by the polymer region in which liquid crystal molecules are oriented in an axial symmetrical manner, the first substrate includes a dry film having a concave portion on a surface facing the liquid crystal layer, and a symmetric axis in the liquid crystal domain substantially extends through the concave portion and is substantially perpendicular to the first substrate.

Liquid crystal display device and method for fabricating the same

The method for producing a metallic wiring board of this invention comprises the steps of: implanting nitrogen on a surface of a substrate; forming a metallic film including, as a main component, one of Ta and Nb on the surface of the substrate where nitrogen is implanted by a sputtering method to form a metallic wiring by patterning the metallic film; and forming an insulating film by anodic oxidation of a surface of the metallic wiring. In the step of forming a metallic wiring form Ta or Nb on a substrate or a protective layer including nitrogen to anodic-oxidize the surface of the metallic wiring, Ta ions or Nb ions do not enter the substrate. Further, the substrate or a protective layer is doped with nitrogen, and a Ta layer is formed by the sputtering method thereon. The sputtering method has a characteristic that a material contained in the substrate is mixed into a film formed in the initial stage of the coating. Therefore, the doped nitrogen enters the Ta film, and a thin .alpha.-Ta layer is formed on the substrate or the protective film. The Ta layer to be epitaxially grown thereon is an .alpha.-Ta layer including no impurity. Thus, a Ta layer with a specific resistance of about 25 .mu..OMEGA.cm is obtained.

Metallic wiring board and a method for producing the same

An active matrix board comprising pixel electrodes arranged in a matrix fashion on an insulating substrate, and scan lines each having an addition capacity electrode placed in a superposed relation with a portion of a corresponding one of the pixel electrodes, said scan lines each comprising a first scan line formed in an area other than the area in which said addition capacity electrode is held in a superposed relation with said pixel electrode, and a second scan line formed to cover said first scan line and having said addition capacity electrode as its part, whereby the possibility of pixel defect occurrence is reduced and the production yield of display apparatuses is improved.

Active matrix board

A metallic wiring board includes nitrogen implanted in a surface of a substrate or a protective layer including nitrogen formed on the substrate upon which is formed a metallic film including, as a main component, one of Ta and Nb. An insulating film covering the metallic wiring is formed by anodic oxidation. The nitrogen in the substrate or the protective layer prevents Ta (or Nb) ions from entering the substrate during the anodic oxidation of the metallic wiring. As a result, insulating properties of the substrate are not degraded during the oxidation.

Metallic wiring board

An active matrix substrate comprising picture element electrodes disposed in a matrix on a substrate, each of which is composed of divided electrodes, and an electrically conductive film on which two of said divided electrodes adjacent to each other are superposed in a manner to sandwich an insulating film therebetween so as to form a connection. The connection is irradiated with laser beams from the outside of the display apparatus when one of the divided electrodes brings about a picture element defect, so that both the divided electrodes can be electrically connected to each other, thereby attaining a correction of the picture element defect. A display apparatus using the active matrix substrate is also provided.

Active matrix substrate and active matrix display apparatus

An active matrix substrate has an insulating substrate, a plurality of signal lines and a plurality of scanning lines arranged in a matrix on the insulating substrate and defining a matrix of areas, each area including a pixel electrode and a switching device. The switching device has a connecting electrode for connecting the switching device to the pixel electrode. The connecting electrode includes a rectangular main portion and an extended portion connected to the main portion, and the main portion has a side which is substantially identical in length to the width of the switching device. The main portion and the extended portion are disposed between the pixel electrode and the insulating substrate.

Active matrix substrate including connecting electrode with extended

A matrix-type display device includes a display electrode board that has a plurality of pixel electrodes arranged into a matrix. A set of scan lines extend in parallel in one direction and a set signal lines extend in an orthogonal direction so that these lines are arranged between adjacent pixel electrodes. A spare line intersects at least some of the scan lines and/or said signal lines at each end of said set of lines so as to sandwich an insulating film therebetween, and a lead-out line is connected to one end of the spare line. The lead-out lines are connected to external connecting lines, which are outside of the display electrode board, so that the lead-out lines can be connected to each other through said connecting lines. Line breakdowns can be corrected and the correction of the breakdowns entails little or no increase in load capacity, electrical resistance, and noise with respect to the corrected line.

Matrix-type display device

A method for manufacturing an active matrix display apparatus comprising: forming picture element electrodes disposed in a matrix at the inner surface of either one of a pair of substrates, switching elements electrically connected to the picture element electrodes respectively, spare switching elements disposed close to the picture element electrodes in a non-conductive state respectively, and connections, each including an extension end of each of the spare switching elements and a metal piece electrically connected to one end of each of the picture element electrodes, the extension end and metal piece being disposed opposite to each other in a non-conductive state; applying a drive signal to a display medium via the picture element electrodes and opposite electrodes thereby detecting a defect in the switching element; and irradiating energy onto the connection between the picture element electrode connected to the switching element, the defect of which has been detected, and the spare switching element, thereby electrically connecting the picture element electrode with the spare switching element, whereby the apparatus can be provided with a high yield.

Method for the manufacture of active matrix display apparatuses

An active matrix display apparatus comprising a pair of substrates, at least one of which is translucent, a display medium charged between the substrates and modulated of its optical characteristics in response to applied voltage, picture element electrodes disposed in a matrix at the inner surface of either one of the pair of substrates, switching elements electrically connected to the picture element electrodes respectively, and spare switching elements disposed close to the picture element electrodes in a non-conductive state respectively, the extension end of the spare switching element and one end of the picture element electrode are disposed on a metal piece so as to sandwich an insulating layer therebetween, whereby a picture element defect caused by a malfunction of switching elements can be readily corrected.

Active matrix display apparatus with drain electrode extensions

A matrix display apparatus with a layered structure in which driving wires are layered on repair wires to sandwhich an insulating film therebetween, whereby it is possible to carry out complete driving of the display apparatus so that the location of picture element defects can be identified.

Matrix display apparatus with repair wires

The production of a thin film transistor array device having a gate wiring on an insulated substrate. The gate wiring has an inner gate wiring having a first metal layer formed on the insulated substrate and a second metal layer whose etching speed is faster than that of the first metal layer, the first metal layer and the second metal layer being overlapped so as to constitute a dual structure, and an outer gate wiring covering the inner gate wiring.

Growing community of inventors

Nara, Japan

Takayoshi Nagayasu