Ulvac, Inc.

Takayoshi Hirono

Isao Tada

Nobuhiro Hayashi

Shuji Saito

Shinya Fujimoto

Atsushi Nakatsuka

Tsuyoshi Yoshimoto

Kazuya Saito

Kazuhiko Saitou

Masashi Kikuchi

Hiroaki Kawamura

Kazuhiko Saito

Tomoharu Fujii

Hideyuki Ogata

Togo Hosoya

Masayuki Iijima

Masatoshi Sato

Nobuaki Kakutani

Yixin Yang

Sadatsugu Wakamatsu

Naoki Sunagawa

Yoshiyuki Mitsuhashi

Hiroyuki Hirano

Kenji Nakamori

Kenji Komatsu

Tsunehito Nomura

Provided is a film-forming apparatus capable of cleaning a discharge apparatus under a state in which a film-forming space and a cleaning gas ambience are separated from each other while continuing to form a film on an object to be film-formed having a film-like shape. The film-forming apparatus includes a cleaning chamber configured to be connected to a film-forming space when a shutter is opened, and to be separated from the film-forming space and cause a cleaning gas to be discharged into an internal space when the shutter is closed; means for moving a discharge apparatus between a cleaning position inside the cleaning chamber and a film-forming position closer to a cylindrical member than the cleaning position; and a control apparatus that controls the discharge apparatus to discharge the raw material gas when the discharge apparatus is moved to the film-forming position, and controls the shutter to be closed so as to fill the cleaning chamber with the cleaning gas when the discharge apparatus is moved to the cleaning position.

Film-forming apparatus

Provided is a low-cost vacuum processing apparatus which enables the miniaturization of the apparatus and achieves good productivity. An elongated sheet base material is transported through a vacuum processing chamber, and predetermined processing is performed on the sheet base material in this vacuum processing chamber. The vacuum processing chamber is provided with a single processing unit, and has an auxiliary vacuum chamber provided in continuation with the vacuum processing chamber. The auxiliary vacuum chamber is provided with a feed roller and a take-up roller. The vacuum processing apparatus includes a pair of first roller units provided on opposite sides across the processing unit in the vacuum processing chamber. Each of the first roller units has multiple rollers disposed at regular distances. The rollers are deviated from each other in the axial direction and arranged in such a staggered manner that the sheet base material is helically wound around the rollers.

Vacuum processing apparatus

A take-up vacuum processing apparatus includes a chamber, a roller-shaped first electrode rotatably disposed within the chamber, a gas supply unit including a second electrode, and a third electrode. The first electrode causes the flexible processing target to travel by rotating. The third electrode is connected to an alternating-current source and does not contact the first electrode. An alternating-current voltage of the alternating-current source is applied between the third electrode and the first electrode. The chamber includes a divider plate for separating the chamber into a first room in which the second electrode is arranged and a second room in which the third electrode is arranged. Pressures of the first and second rooms are individually adjusted, such that plasma can be generated between the first electrode and the second electrode, and such that anomalous discharge is not generated between the first electrode and the third electrode.

Take-up vacuum processing apparatus

The object of this invention is to provide a winding type plasma CVD apparatus in which quality of a layer can be made uniform by supplying a reaction gas uniformly to a deposition area of a film, and can perform a self-cleaning process of a deposition portion in the path of deposition onto the film. A film () is supported between a pair of movable rollers () arranged on the upstream side and downstream side of the deposition portion () with regard to the traveling direction of the film, and then the film () is made to travel substantially linearly at the deposition position. Consequently, the distance between a shower plate () and the film () is kept constant, and the quality of the layer is made homogeneous. The film is heated by means of a metal belt () traveling simultaneously on the back side of the film. The moveable rollers () ascend from the deposition position to the self-cleaning position, and the film () can be separated from the shower plate (). Self-cleaning can be carried out in the path of the deposition onto the film by closing the aperture of a mask () with a shutter (), thereby preventing leakage of cleaning gas.

Winding type plasma CVD apparatus

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Chigasaki, Japan

Takayoshi Hirono