Other

Asahi Denka Kogyo K.k.

Semiconductor Process Laboratory Co., Ltd.

Canon Sales Co., Inc.

Takayoshi Azumi

Noboru Tokumasu

Kazuo Maeda

Naoki Yamada

Tsuyoshi Watanabe

Toshio Kato

Hiroshi Ikakura

Yoshio Minowa

Kiyotaka Sasaki

Yoichi Shirakawa

Kazuhisa Onozawa

Setsu Suzuki

Naoyasu Kurita

Junichi Hisano

Syunji Nishikawa

Mitsutoshi Sasajima

A film-forming surface reforming method includes the steps of bringing a gas or an aqueous solution containing ammonia, hydrazine, an amine, an amino compound or a derivative thereof into contact with the film-forming surface before an insulating film is formed on the film-forming surface, and bringing a gas or an aqueous solution containing Hydrogen peroxide, ozone, Oxygen, nitric acid, sulfuric acid or a derivative thereof into contact with the film-forming surface.

Film-forming surface reforming method and semiconductor device manufacturing method

Disclosed is a method for modifying a film-forming surface of a substrate, which is capable removing a base surface dependency in forming a film on the film-forming surface of the substrate prior to formation of a film by a thermal CVD method using a reactant gas containing an ozone-containing gas containing ozone (O,) in oxygen (O,) and Tetra-Ethyl-Ortho-Silicate. The method comprises the step of modifying the film-forming surface,of the substrate,by allowing any one of ammonia, hydrazine, an amine, gases thereof and aqueous solutions thereof to contact with the surface of the substrate before forming an insulating film,on the surface,of the substrate,.

Method for modifying a film forming surface of a substrate on which a film is to be formed, and method for manufacturing a semiconductor device using the same

There is provided a semiconductor device manufacturing system capable of carrying out resist stripping or surface pre-treatment of a substrate by use of a gas such as chlorosulfuric acid with high reactivity The manufacturing system comprises a process vessel,formed integrally of a process chamber,for treating respective surfaces of substrates,with a chemical vapor and a chemical storage chamber,for storing chemical for generating the chemical vapor, and a chemical heating means,for heating the chemicals stored in the chemical storage chamber,to evaporation.

Semiconductor device manufacturing system

A method of processing waste gas exhausted from chemical vapor deposition equipment, which entails:

Method for processing waste gas exhausted from chemical vapor and

A process for producing a protein-rich fish meal and a fish oil which comprises treating fish bodies with a protease acting at a relatively low temperature to give a slurry and dividing and drying said slurry at a relatively low temperature. The products thus obtained scarcely undergo thermal denaturation and contain a large amount of partially decomposed protein. Thus they are highly useful as a protein source for, e.g., feeds, baits and pet foods.

Process for producing protein-rich fish meal and fish oil

Growing community of inventors

Tokyo, Japan

Takayoshi Azumi