Jsr Corporation

Other

Takayoshi Abe

Kouji Tamori

Yong Wang

Masaki Momiyama

Yusuke Okano

Hiroshi Ikeda

Takahiro Kawai

Tetsuo Fukuta

Hiroshi Kawai

Masaaki Miyaji

Satoshi Hyugaji

Toru Kimura

Junichi Takahashi

Tomoki Nagai

Tsutomu Shimokawa

Hirokazu Sakakibara

Gouji Wakamatsu

Takashi Chiba

Tomonori Shiotani

Tomohiro Kakizawa

Kazuhiro Ikkyu

Yuusuke Okano

Provided is a filler for affinity chromatography having a high dynamic binding capacity for proteins and having excellent alkali resistance and storage stability. The filler for affinity chromatography of the present invention comprises a porous particle consisting of a copolymer of 40 parts to 99.5 parts by mass of (M-1) a methacryloyl group-containing vinyl monomer that contains a hydroxyl group and does not contain an epoxy group, 0.5 parts to 30 parts by mass of (M-2) an epoxy group-containing vinyl monomer, 0 parts to 59.5 parts by mass of (M-3) a methacryloyl group-containing vinyl monomer which is other than the monomers (M-1) and (M-2), and 0 parts to 25 parts by mass of (M-4) a vinyl monomer other than the monomers (M-1), (M-2) and (M-3) (with the proviso that the total amount of the contents of (M-1), (M-2), (M-3) and (M-4) is 100 parts by mass); ring-opened epoxy group obtainable by ring-opening of epoxy group that is contained in the copolymer; and ligand that is bound to the porous particle.

Filler for affinity chromatography

Provided is a filler for affinity chromatography which is useful for protein purification and contains porous particles that have a high dynamic binding capacity for proteins and excellent pressure characteristics. The filler for affinity chromatography of the present invention is characterized in that it includes a porous particle consisting of a polymer of vinyl monomer including a cross-linkable vinyl monomer that contains hydroxyl group but does not contain epoxy group and an epoxy group-containing non-cross-linkable vinyl monomer, or a cross-linkable vinyl monomer that contains hydroxyl group and epoxy group, ligands bound to the porous particle, and ring-opened epoxy groups.

Provided are a filler for affinity chromatography which has excellent alkali resistance, and a method for isolating immunoglobulin. The filler for affinity chromatography is a filler in which a protein represented by the following formula (1) is immobilized on a carrier.R&#x2014;R&#x2003;&#x2003;(1) wherein R represents an amino acid sequence consisting of 4 to 300 amino acid residues containing a region consisting of 4 to 20 contiguous histidine residues; and Rrepresents an amino acid sequence capable of binding to immunoglobulin, the amino acid sequence consisting of 50 to 500 amino acid residues containing Z domain of Protein A or a fragment thereof, or a variant thereof, provided that the R binds to C-terminus or N-terminus of the R.

Filler for affinity chromatography and method for isolating immunoglobulin

An affinity chromatography packing material includes porous mother particles that include a copolymer of a monomer mixture including a crosslinkable vinyl monomer and an epoxy group-containing vinyl monomer, a ligand being bound to the porous mother particles, and the porous mother particles including a ring-opening epoxy group produced by ring-opening of the epoxy group included in the porous mother particles.

Packing material for affinity chromatography

A resin composition which, in forming a fine pattern by a heat treatment of a resist pattern formed by using a photoresist, can be applied onto the resist pattern, can cause the resist pattern to smoothly shrink by heat treatment, and can be easily washed away by a treatment with an alkaline aqueous solution, and a method for efficiently forming a fine resist pattern using the resin composition are provided. The resin composition comprises a resin containing a hydroxyl group, a crosslinking component, and an alcohol solvent containing water in an amount of 10 wt % or less for the total solvent, wherein the alcohol in the alcohol solvent is a monovalent alcohol having 1 to 8 carbon atoms.

Resin composition for forming fine pattern and method for forming fine pattern

A pattern forming method includes (1) selectively exposing a first resist layer, and developing the exposed first resist layer to form a first pattern, (2) applying a resin composition containing a hydroxyl group-containing resin and a solvent to the first pattern, baking the applied resin composition, and developing the baked resin composition to form a second pattern, the hydroxyl group-containing resin becoming insoluble or scarcely soluble in a developer when baked, and (3) totally or selectively exposing the second pattern to make the second pattern partly soluble in the developer, and developing the exposed second pattern to form a third pattern in which at least a hole or a groove is formed in the second pattern.

Method for pattern formation and resin composition for use in the method

A resist pattern-forming method includes forming a first resist pattern using a first positive-tone radiation-sensitive resin composition. A resist pattern-miniaturizing resin composition is applied to the first resist pattern. The resist pattern-miniaturizing resin composition applied to the first resist pattern is baked and developed to form a second resist pattern that is miniaturized from the first resist pattern. A resist pattern-insolubilizing resin composition is applied to the second resist pattern. The resist pattern-insolubilizing resin composition applied to the second resist pattern is baked and washed to form a third resist pattern that is insoluble in a developer and a second positive-tone radiation-sensitive resin composition. A second resist layer is formed on the third resist pattern using the second positive-tone radiation-sensitive resin composition. The second resist layer is exposed and developed to form a fourth resist pattern.

Resist pattern-forming method and resist pattern miniaturizing resin composition

Growing community of inventors

Tokyo, Japan

Takayoshi Abe