Tokyo Ohka Kogyo Co., Ltd.

University of Chicago

National Institute of Advanced Industrial Science and Technology

Tokyo Institute of Technology

Takaya Maehashi

Takehiro Seshimo

Tasuku Matsumiya

Masatoshi Arai

Yoshitaka Komuro

Ken Miyagi

Yoshiyuki Utsumi

Takahiro Dazai

Akiya Kawaue

Hitoshi Yamano

Koshi Onishi

Paul Franklin Nealey

Xuanxuan Chen

Tsuyoshi Kurosawa

Daisuke Kawana

Takuya Ikeda

KhanhTin Nguyen

Daiju Shiono

Masahito Yahagi

Akiyoshi Yamazaki

Takashi Nagamine

Issei Suzuki

Teruaki Hayakawa

Rin Odashima

Masahiro Shiosaki

Sho Kataoka

Seina Yamazaki

Kiwamu Sue

Takatoshi Inari

Yusuke Yoshigoe

Organically modified metal oxide nanoparticles containing two or more cores including a plurality of metal atoms and a plurality of oxygen atoms covalently bonded to the plurality of metal atoms; a first modifying group that is a ligand coordinated to each of the cores and selected from the group consisting of a carboxylic acid carboxylate, a sulfonic acid sulfonate, and a phosphonic acid phosphonate; and a second modifying group that is coordinated to each of the cores and is a ligand having a structure different from that of the first modifying group and/or an inorganic anion, in which organically modified metal oxide nanoparticles have a structure in which the cores are crosslinked through a coordinate bond by at least the first modifying group.

Organically modified metal oxide nanoparticles, organically modified metal oxide nanoparticles-containing solution, organically modified metal oxide nanoparticles-containing resist composition, and resist pattern forming method

A resist composition including: a compound including an anion moiety and a cation moiety and represented by the following Formula (bd1); and an organic solvent having a hydroxyl group in which Rxto Rxeach represent a hydrocarbon group or a hydrogen atom, or may be bonded to each other to form a ring structure; Ryand Ryeach independently represent a hydrocarbon group or a hydrogen atom, or may be bonded to each other to form a ring structure; Rzto Rzeach represent a hydrocarbon group or a hydrogen atom, or may be bonded to each other to form a ring structure; at least one of Rxto Rx, Ryand Ryand Rzto Rzhas an anionic group; and Mrepresents an organic cation)

Resist composition and method of forming resist pattern

A block copolymer including a first block consisting of a polymer having a repeating structure of a structural unit (u1) containing no silicon atom, and a second block consisting of a polymer having a repeating structure of a structural unit (u2) containing a silicon atom, the second block containing a block (b21) consisting of a polymer having a repeating structure of a structural unit (u21) represented by general formula (u2-1) shown below, and the volume ratio of the first block, based on all blocks constituting the block copolymer being 42 to 44 vol %:  In which Rrepresents an alkyl group, a halogenated alkyl group, a hydrogen atom, or an organic group having a polar group; and Ris a group derived from a compound represented by formula SHR, wherein Rrepresents a hydrocarbon group having 1 to 5 carbon atoms optionally having a substituent.

Method of producing block copolymer capable of creating specific structure pattern

A resist composition including a base component and an acid generator component, the base component including a resin component having a structural unit (a0) represented by general formula (a0) shown below, and the acid generator component containing at least one of a compound (b-1), a compound (b-2) and a compound (b-3) represented by general formula (b-3) shown below in which Wa represents a divalent aromatic hydrocarbon group; Rarepresents an acid dissociable group; R, Rand Reach independently represents a hydrocarbon group containing an aromatic ring; R, Rand Reach independently represents a cyclic group, a chain alkyl group which may have a substituent or a chain alkenyl group; Rrepresents a fluorine atom or a fluorinated alkyl group of 1 to 5 carbon atoms and M'represents an m-valent onium cation. 

A resist composition including a resin component which exhibits changed solubility in a developing solution under action of acid, the resin component including a structural unit represented by general formula (a0) shown below in which Varepresents a single bond or a divalent linking group; Wa represents a divalent aromatic hydrocarbon group which may have a substituent; Yarepresents a carbon atom; Xarepresents a group which forms a cyclic hydrocarbon group together with Ya; Rarepresents a hydrocarbon group which may have a substituent; provided that at least one of Xaand Rahas a carbon atom constituting a carbon-carbon unsaturated bond at an &#x3b1;-position of Ya. 

Resist composition, method of forming resist pattern, polymeric compound, and compound

A resist composition including a base component which exhibits changed solubility in a developing solution under action of acid, and a compound (B1) having an anion moiety and a cation moiety and being represented by general formula (b1) (wherein Rto Reach independently represents a hydrogen atom or a hydrocarbon group which may have a substituent, or two or more of Rto Rmay be mutually bonded to form a ring structure, provided that at least two of Rto Rare mutually bonded to form a ring structure, and at least one of Rto Rhas an anion group, and the anion moiety as a whole forms an anion having a valency of n; n represents an integer of 1 or more; represents an integer of 1 or more; and Mrepresents an organic cation having a valency of m). 

Resist composition, method of forming resist pattern, compound, and acid generator

A method for preparing a polymer compound including copolymerizing a monomer (m0-1) and a monomer (m0-2) to obtain a first polymer compound and causing the first polymer compound and an acid component to react with each other to obtain a second polymer compound. In the formulae, Rand Rare each a hydrogen atom, an alkyl group having 1 to 5 carbon atoms and a halogenated alkyl group having 1 to 5 carbon atoms, Vais a divalent hydrocarbon group which may have an ether bond, nis an integer of 0 to 2, Rais a tertiary alkyl ester-type acid dissociable group, Vais a divalent linking group containing a heteroatom, or a single bond, Rais a monovalent organic group, nis an integer of 0 to 3, Rais an acid dissociable group, and nis an integer of 1 to 3. 

Method of preparing polymer compound

A resist composition which generates an acid upon exposure and whose solubility on a developing solution changes under the action of the acid, including a polymer compound having units represented by formulas (a0-1), (a0-2), and (a0-3) in an amount of 0 to 10 mol %. In the formulas, R is a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a halogenated alkyl group having 1 to 5 carbon atoms, Vaand Vaare a divalent hydrocarbon group, nand neach are an integer of 0 to 2, Ra&#x2033; is a specific acid dissociable group, Vais a divalent linking group containing a hetero atom or a single bond, Rais a monovalent organic group, nis an integer of 0 to 3, and nis an integer of 1 to 3. 

Resist composition, method for forming resist pattern, and polymer compound

A resin composition for forming a phase-separated structure, including: a block copolymer, and an ion liquid containing a compound (IL) having a cation moiety and an anion moiety, the cation moiety of the compound (IL) having a dipole moment of 3 debye or more.

Resin composition for forming a phase-separated structure, and method of producing structure containing phase-separated structure

A resin composition for forming a phase-separated structure, including: a block copolymer, and an ion liquid containing a compound (IL) having a cation moiety and an anion moiety, the energy of the LUMO of the cation moiety being &#x2212;4.5 eV or more, and the energy difference between the LUMO and the HOMO of the cation moiety being 10.0 ev or more, or the Log P value of the anion moiety being 1 to 3.

A resin composition for forming a phase-separated structure, including a block copolymer, and an ion liquid containing a compound having a cation moiety and an anion moiety, the anion moiety being represented by general formula (a1), (a2) or (a3), in which X&#x2033; represents an alkylene group of 2 to 6 carbon atoms in which at least one hydrogen atom is substituted with a fluorine atom; Y&#x2033; and Z&#x2033; each independently represents an alkyl group of 1 to 10 carbon atoms in which at least one hydrogen atom is substituted with a fluorine atom; R&#x2033; represents an alkyl group of 1 to 5 carbon atoms in which at least one hydrogen atom is optionally substituted with a fluorine atom, m represents an integer of 1 to 6, and n represents an integer of 0 to 5, provided that m+n=6. 

A brush composition used for phase-separation of a layer containing a block copolymer having plural kinds of blocks bonded formed on a substrate, the brush composition including a resin component, the resin component having a structural unit (u1) represented by genera formula (u1-1), and having a hydroxy group on at least one terminal portion of the main chain thereof: in formula (u1-1), R represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms; Rrepresents a halogen atom, or a linear, branched or cyclic hydrocarbon group of 1 to 20 carbon atoms optionally containing an oxygen atom, a halogen atom or a silicon atom, or a combination of the linear, branched or cyclic hydrocarbon group; and p represents an integer of 1 to 5. 

Brush composition, and method of producing structure containing phase-separated structure

A method of producing a structure containing a phase-separated structure, including forming a layer containing a block copolymer on a substrate; applying a top coat material to the layer containing the block copolymer to form a top coat film; and subjecting the layer including the block copolymer having the top coat film formed thereon to annealing treatment so as to conduct a phase separation of the layer, the top coat material including an organic solvent component and a polymeric compound containing a structural unit having either a dicarboxylic acid or a salt of a dicarboxylic acid, and the organic solvent component containing water and an alcohol having 3 or more carbon atoms.

Method of producing structure containing phase-separated structure and method of forming top coat film

An undercoat agent used for phase separating a layer containing a block copolymer having a block of a structural unit derived from an (&#x3b1;-substituted) acrylate ester on a substrate, and which contains a resin component including a structural unit represented by formula (ba0-1), and/or a structural unit represented by formula (ba0-2), and a structural unit (ba0-3) having a substrate interacting group, wherein R represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms, Rand Rrepresent a halogen atom or an organic group of 1 to 20 carbon atoms which may contain an oxygen atom, a halogen atom, or a silicon atom, and n is 1 to 5.

Undercoat agent and method of producing structure containing phase-separated structure

A resist composition including a base component which exhibits changed solubility in a developing solution under action of acid and an acid generator which generates acid upon exposure, the base component containing a polymeric compound containing a structural unit represented by general formula (a0-1) and the acid generator containing a compound represented by general formula (b1). In the formulae, R represents H, an alkyl group of Cor a halogenated alkyl group of C; Yarepresents a single bond or a divalent linking group; Laand Larepresents &#x2014;SO&#x2014; or &#x2014;C(&#x2550;O)&#x2014;; Rarepresents a cyclic group which may have a substituent and the like; nand nrepresents 0 or 1; Rrepresents a cyclic group of Cwhich may have a substituent; Vrepresents a single bond or an alkylene group of C; Lrepresents an ester bond; Yrepresents an alkylene group of Cwhich may have a fluorine atom; m represents an integer of 1 or more; and Mrepresents an organic cation having a valency of m. 

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Kawasaki, Japan

Takaya Maehashi